Nanoporous TiO2 and WO3 Films by Anodization of Titanium and Tungsten Substrates:  Influence of Process Variables on Morphology and Photoelectrochemical Response

The photoelectrochemical response of nanoporous films, obtained by anodization of Ti and W substrates in a variety of corrosive media and at preselected voltages in the range from 10 to 60 V, was studied. The as-deposited films were subjected to thermal anneal and characterized by scanning electron...

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Veröffentlicht in:The journal of physical chemistry. B 2006-12, Vol.110 (50), p.25347-25355
Hauptverfasser: de Tacconi, N. R, Chenthamarakshan, C. R, Yogeeswaran, G, Watcharenwong, A, de Zoysa, R. S, Basit, N. A, Rajeshwar, K
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Sprache:eng
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