Impact of Environmental Air Pressures on Ion Implant Particle Performance

Numerous methodologies are available to evaluate particle performance for batch implanters. In this case, a single control wafer used to measure sheet resistance for varying dopant species is also monitored for particle adders using the KLA SP1 metrology tool with a frequency of three times per week...

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Veröffentlicht in:	Semiconductor International 2005-03, Vol.28 (3), p.75
Hauptverfasser:	Beatty, Timothy E, Flatch, Phillip, Santiesteban, Ramon S
Format:	Magazinearticle
Sprache:	eng
Schlagworte:	Case studies Electronics industry Failure Ion implantation Semiconductor doping Semiconductor research Transplants & implants
Online-Zugang:	Volltext
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