Plasma deposition of n-SiOx nanocrystalline thin film for enhancing the performance of silicon thin film solar cells

In this paper, we firstly optimized the properties of n-SiOx nanocrystalline thin film through tuning deposition parameters by plasma enhanced chemical vapor deposition, so that we can actively control the properties of materials obtained. Secondly, we proposed using n-SiOx/Al as back reflector for...

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Veröffentlicht in:	Thin solid films 2011-11, Vol.520 (2), p.684-688
Hauptverfasser:	ZHANG, X. D, YUE, Q, ZHENG, X. X, GENG, X. H, ZHAO, Y
Format:	Artikel
Sprache:	eng
Schlagworte:	Aluminum Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Density Exact sciences and technology Ion and electron beam-assisted deposition ion plating Materials science Methods of deposition of films and coatings film growth and epitaxy Nanocrystals Nanoscale materials and structures: fabrication and characterization Open circuit voltage Other topics in nanoscale materials and structures Photovoltaic cells Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma applications Plasma-based ion implantation and deposition Reflectors Solar cells Thin films
Online-Zugang:	Volltext
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