Iodine doping in solid precursor-based CVD growth graphene film
Doping of different elements in intrinsic graphene is of great importance to adjust the electrical and chemical properties for realization of different electronic devices. Here, we demonstrate a simple and controllable synthesis process of iodine-doped graphene film using camphor (C10H16O), a solid...
Gespeichert in:
Veröffentlicht in: | Journal of materials chemistry 2011-01, Vol.21 (39), p.15209-15213 |
---|---|
Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | 15213 |
---|---|
container_issue | 39 |
container_start_page | 15209 |
container_title | Journal of materials chemistry |
container_volume | 21 |
creator | Kalita, Golap Wakita, Koichi Takahashi, Makoto Umeno, Masayoshi |
description | Doping of different elements in intrinsic graphene is of great importance to adjust the electrical and chemical properties for realization of different electronic devices. Here, we demonstrate a simple and controllable synthesis process of iodine-doped graphene film using camphor (C10H16O), a solid botanical derivative. In situ doping of iodine in a graphene film has many difficulties in a conventional chemical vapor deposition process using a gas source. In this technique, iodine was mixed with the carbon precursor and simultaneously evaporated to pyrolysis on a metal catalytic substrate. Raman and X-ray photoelectron spectroscopic studies confirm the presence of elemental iodine in the form of triiodide and pentaiodide. Simultaneously, evaporated iodine atoms remains within the few-layers graphene structure and interact with carbon atoms through a charge transfer process. This shows a straightforward technique for iodine doping in graphene and a similar approach can be adopted to deposit iodine-doped graphene on other metal substrates. |
doi_str_mv | 10.1039/C1JM13268G |
format | Article |
fullrecord | <record><control><sourceid>proquest</sourceid><recordid>TN_cdi_proquest_miscellaneous_963908361</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>963908361</sourcerecordid><originalsourceid>FETCH-LOGICAL-p117t-6f98bda319b543efcd67027aaa8060b5082765c91ddbfaf6373763e14cc4f3123</originalsourceid><addsrcrecordid>eNotjr1OwzAYRT2ARCksPIE3poC_fIl_JoQClKKiLoW18m9rlMYhTsTrEwmmM91zDyE3wO6Aobpv4O0dsORydUYWTNWqUFUpL8hlzl-MAQheL8jDOrnYeepSH7sDjR3NqY2O9oO305DTUBidvaPN5xM9DOlnPM7Q_dHPmxDb0xU5D7rN_vqfS_Lx8rxrXovNdrVuHjdFPx-NBQ9KGqcRlKkr9ME6LlgptNaScWZqJss5xypwzgQdOAoUHD1U1lYBocQluf3z9kP6nnwe96eYrW9b3fk05b3iqJhEDvgLm4RJdQ</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>963908361</pqid></control><display><type>article</type><title>Iodine doping in solid precursor-based CVD growth graphene film</title><source>Royal Society Of Chemistry Journals 2008-</source><source>Alma/SFX Local Collection</source><creator>Kalita, Golap ; Wakita, Koichi ; Takahashi, Makoto ; Umeno, Masayoshi</creator><creatorcontrib>Kalita, Golap ; Wakita, Koichi ; Takahashi, Makoto ; Umeno, Masayoshi</creatorcontrib><description>Doping of different elements in intrinsic graphene is of great importance to adjust the electrical and chemical properties for realization of different electronic devices. Here, we demonstrate a simple and controllable synthesis process of iodine-doped graphene film using camphor (C10H16O), a solid botanical derivative. In situ doping of iodine in a graphene film has many difficulties in a conventional chemical vapor deposition process using a gas source. In this technique, iodine was mixed with the carbon precursor and simultaneously evaporated to pyrolysis on a metal catalytic substrate. Raman and X-ray photoelectron spectroscopic studies confirm the presence of elemental iodine in the form of triiodide and pentaiodide. Simultaneously, evaporated iodine atoms remains within the few-layers graphene structure and interact with carbon atoms through a charge transfer process. This shows a straightforward technique for iodine doping in graphene and a similar approach can be adopted to deposit iodine-doped graphene on other metal substrates.</description><identifier>ISSN: 0959-9428</identifier><identifier>DOI: 10.1039/C1JM13268G</identifier><language>eng</language><subject>Atomic structure ; Botanical ; Carbon ; Chemical vapor deposition ; Doping ; Evaporation ; Graphene ; Iodine</subject><ispartof>Journal of materials chemistry, 2011-01, Vol.21 (39), p.15209-15213</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,777,781,27905,27906</link.rule.ids></links><search><creatorcontrib>Kalita, Golap</creatorcontrib><creatorcontrib>Wakita, Koichi</creatorcontrib><creatorcontrib>Takahashi, Makoto</creatorcontrib><creatorcontrib>Umeno, Masayoshi</creatorcontrib><title>Iodine doping in solid precursor-based CVD growth graphene film</title><title>Journal of materials chemistry</title><description>Doping of different elements in intrinsic graphene is of great importance to adjust the electrical and chemical properties for realization of different electronic devices. Here, we demonstrate a simple and controllable synthesis process of iodine-doped graphene film using camphor (C10H16O), a solid botanical derivative. In situ doping of iodine in a graphene film has many difficulties in a conventional chemical vapor deposition process using a gas source. In this technique, iodine was mixed with the carbon precursor and simultaneously evaporated to pyrolysis on a metal catalytic substrate. Raman and X-ray photoelectron spectroscopic studies confirm the presence of elemental iodine in the form of triiodide and pentaiodide. Simultaneously, evaporated iodine atoms remains within the few-layers graphene structure and interact with carbon atoms through a charge transfer process. This shows a straightforward technique for iodine doping in graphene and a similar approach can be adopted to deposit iodine-doped graphene on other metal substrates.</description><subject>Atomic structure</subject><subject>Botanical</subject><subject>Carbon</subject><subject>Chemical vapor deposition</subject><subject>Doping</subject><subject>Evaporation</subject><subject>Graphene</subject><subject>Iodine</subject><issn>0959-9428</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2011</creationdate><recordtype>article</recordtype><recordid>eNotjr1OwzAYRT2ARCksPIE3poC_fIl_JoQClKKiLoW18m9rlMYhTsTrEwmmM91zDyE3wO6Aobpv4O0dsORydUYWTNWqUFUpL8hlzl-MAQheL8jDOrnYeepSH7sDjR3NqY2O9oO305DTUBidvaPN5xM9DOlnPM7Q_dHPmxDb0xU5D7rN_vqfS_Lx8rxrXovNdrVuHjdFPx-NBQ9KGqcRlKkr9ME6LlgptNaScWZqJss5xypwzgQdOAoUHD1U1lYBocQluf3z9kP6nnwe96eYrW9b3fk05b3iqJhEDvgLm4RJdQ</recordid><startdate>20110101</startdate><enddate>20110101</enddate><creator>Kalita, Golap</creator><creator>Wakita, Koichi</creator><creator>Takahashi, Makoto</creator><creator>Umeno, Masayoshi</creator><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20110101</creationdate><title>Iodine doping in solid precursor-based CVD growth graphene film</title><author>Kalita, Golap ; Wakita, Koichi ; Takahashi, Makoto ; Umeno, Masayoshi</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-p117t-6f98bda319b543efcd67027aaa8060b5082765c91ddbfaf6373763e14cc4f3123</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2011</creationdate><topic>Atomic structure</topic><topic>Botanical</topic><topic>Carbon</topic><topic>Chemical vapor deposition</topic><topic>Doping</topic><topic>Evaporation</topic><topic>Graphene</topic><topic>Iodine</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kalita, Golap</creatorcontrib><creatorcontrib>Wakita, Koichi</creatorcontrib><creatorcontrib>Takahashi, Makoto</creatorcontrib><creatorcontrib>Umeno, Masayoshi</creatorcontrib><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of materials chemistry</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kalita, Golap</au><au>Wakita, Koichi</au><au>Takahashi, Makoto</au><au>Umeno, Masayoshi</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Iodine doping in solid precursor-based CVD growth graphene film</atitle><jtitle>Journal of materials chemistry</jtitle><date>2011-01-01</date><risdate>2011</risdate><volume>21</volume><issue>39</issue><spage>15209</spage><epage>15213</epage><pages>15209-15213</pages><issn>0959-9428</issn><abstract>Doping of different elements in intrinsic graphene is of great importance to adjust the electrical and chemical properties for realization of different electronic devices. Here, we demonstrate a simple and controllable synthesis process of iodine-doped graphene film using camphor (C10H16O), a solid botanical derivative. In situ doping of iodine in a graphene film has many difficulties in a conventional chemical vapor deposition process using a gas source. In this technique, iodine was mixed with the carbon precursor and simultaneously evaporated to pyrolysis on a metal catalytic substrate. Raman and X-ray photoelectron spectroscopic studies confirm the presence of elemental iodine in the form of triiodide and pentaiodide. Simultaneously, evaporated iodine atoms remains within the few-layers graphene structure and interact with carbon atoms through a charge transfer process. This shows a straightforward technique for iodine doping in graphene and a similar approach can be adopted to deposit iodine-doped graphene on other metal substrates.</abstract><doi>10.1039/C1JM13268G</doi><tpages>5</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0959-9428 |
ispartof | Journal of materials chemistry, 2011-01, Vol.21 (39), p.15209-15213 |
issn | 0959-9428 |
language | eng |
recordid | cdi_proquest_miscellaneous_963908361 |
source | Royal Society Of Chemistry Journals 2008-; Alma/SFX Local Collection |
subjects | Atomic structure Botanical Carbon Chemical vapor deposition Doping Evaporation Graphene Iodine |
title | Iodine doping in solid precursor-based CVD growth graphene film |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-20T23%3A28%3A38IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Iodine%20doping%20in%20solid%20precursor-based%20CVD%20growth%20graphene%20film&rft.jtitle=Journal%20of%20materials%20chemistry&rft.au=Kalita,%20Golap&rft.date=2011-01-01&rft.volume=21&rft.issue=39&rft.spage=15209&rft.epage=15213&rft.pages=15209-15213&rft.issn=0959-9428&rft_id=info:doi/10.1039/C1JM13268G&rft_dat=%3Cproquest%3E963908361%3C/proquest%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=963908361&rft_id=info:pmid/&rfr_iscdi=true |