Tribological behavior of radio-frequency sputtering WS2 thin films with vacuum annealing
Thin films of tungsten disulfide (WS2) were deposited on 3Cr13 martensitic stain less steel substrate by radio-frequency (RF) sputtering. The as-deposited films were annealed at 473, 673 and 873K respectively for 2h in 510-4Pa vacuum. Composition of the films was inspected by energy dispersive spect...
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| Veröffentlicht in: | Thin solid films 2011-11, Vol.520 (2), p.849-852 |
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| creator | DU, G. Y BA, D. C TAN, Z LIU, K |
| description | Thin films of tungsten disulfide (WS2) were deposited on 3Cr13 martensitic stain less steel substrate by radio-frequency (RF) sputtering. The as-deposited films were annealed at 473, 673 and 873K respectively for 2h in 510-4Pa vacuum. Composition of the films was inspected by energy dispersive spectroscopy. Surface morphology and structure properties were studied by scanning electron microscopy and X-ray diffraction techniques. Tribological behavior was also examined using tribometer. At 473K, the films exhibited low crystallization structure and no significant improvement in the tribological performance. At 673K, the tribological performance was improved and a transition from non-crystalline to hexagonal structure took in place. When the annealing temperature rose up to 873K, the films cracked and fell off from the substrate. The results suggested that with suitable technical parameters vacuum annealing could promote crystallization and improve tribological performance of RF sputtering WS2 films. |
| doi_str_mv | 10.1016/j.tsf.2011.04.195 |
| format | Article |
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Y ; BA, D. C ; TAN, Z ; LIU, K</creator><creatorcontrib>DU, G. Y ; BA, D. C ; TAN, Z ; LIU, K</creatorcontrib><description>Thin films of tungsten disulfide (WS2) were deposited on 3Cr13 martensitic stain less steel substrate by radio-frequency (RF) sputtering. The as-deposited films were annealed at 473, 673 and 873K respectively for 2h in 510-4Pa vacuum. Composition of the films was inspected by energy dispersive spectroscopy. Surface morphology and structure properties were studied by scanning electron microscopy and X-ray diffraction techniques. Tribological behavior was also examined using tribometer. At 473K, the films exhibited low crystallization structure and no significant improvement in the tribological performance. At 673K, the tribological performance was improved and a transition from non-crystalline to hexagonal structure took in place. When the annealing temperature rose up to 873K, the films cracked and fell off from the substrate. The results suggested that with suitable technical parameters vacuum annealing could promote crystallization and improve tribological performance of RF sputtering WS2 films.</description><identifier>ISSN: 0040-6090</identifier><identifier>EISSN: 1879-2731</identifier><identifier>DOI: 10.1016/j.tsf.2011.04.195</identifier><identifier>CODEN: THSFAP</identifier><language>eng</language><publisher>Amsterdam: Elsevier</publisher><subject>Annealing ; Condensed matter: structure, mechanical and thermal properties ; Crystallization ; Electron, ion, and scanning probe microscopy ; Exact sciences and technology ; Martensitic stainless steels ; Performance enhancement ; Physics ; Radio frequencies ; Sputtering ; Structure and morphology; thickness ; Structure of solids and liquids; crystallography ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) ; Thin film structure and morphology ; Thin films ; Tribology ; Vacuum annealing</subject><ispartof>Thin solid films, 2011-11, Vol.520 (2), p.849-852</ispartof><rights>2015 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c307t-a34ee2fc4677f56e3c624fbfc4f157dddd8cf9ad48acd9c0b493ec4b331b484a3</citedby><cites>FETCH-LOGICAL-c307t-a34ee2fc4677f56e3c624fbfc4f157dddd8cf9ad48acd9c0b493ec4b331b484a3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>309,310,314,776,780,785,786,23909,23910,25118,27901,27902</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=25512238$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>DU, G. 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At 673K, the tribological performance was improved and a transition from non-crystalline to hexagonal structure took in place. When the annealing temperature rose up to 873K, the films cracked and fell off from the substrate. The results suggested that with suitable technical parameters vacuum annealing could promote crystallization and improve tribological performance of RF sputtering WS2 films.</description><subject>Annealing</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Crystallization</subject><subject>Electron, ion, and scanning probe microscopy</subject><subject>Exact sciences and technology</subject><subject>Martensitic stainless steels</subject><subject>Performance enhancement</subject><subject>Physics</subject><subject>Radio frequencies</subject><subject>Sputtering</subject><subject>Structure and morphology; thickness</subject><subject>Structure of solids and liquids; crystallography</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><subject>Thin film structure and morphology</subject><subject>Thin films</subject><subject>Tribology</subject><subject>Vacuum annealing</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2011</creationdate><recordtype>article</recordtype><recordid>eNo9kEtLAzEUhYMoWKs_wF024mrGm8c8spTiCwourOguZDJJmzKd1GSm0n9vSot3c-FyzuGeD6FbAjkBUj6s8yHanAIhOfCciOIMTUhdiYxWjJyjCQCHrAQBl-gqxjUAEErZBH0vgmt855dOqw43ZqV2zgfsLQ6qdT6zwfyMptd7HLfjMJjg-iX--qB4WLkeW9dtIv51wwrvlB7HDVZ9b1SXRNfowqoumpvTnqLP56fF7DWbv7-8zR7nmWZQDZli3BhqNS-ryhalYbqk3DbpYElRtWlqbYVqea10KzQ0XDCjecMYaXjNFZui-2PuNvj0aRzkxkVtuk71xo9RipKJ1LYWSUmOSh18jMFYuQ1uo8JeEpAHiHItE0R5gCiBywQxee5O6SomQDaoXrv4b6RFccBYsz-3mXU5</recordid><startdate>20111101</startdate><enddate>20111101</enddate><creator>DU, G. 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Y</creatorcontrib><creatorcontrib>BA, D. C</creatorcontrib><creatorcontrib>TAN, Z</creatorcontrib><creatorcontrib>LIU, K</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>DU, G. Y</au><au>BA, D. C</au><au>TAN, Z</au><au>LIU, K</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Tribological behavior of radio-frequency sputtering WS2 thin films with vacuum annealing</atitle><jtitle>Thin solid films</jtitle><date>2011-11-01</date><risdate>2011</risdate><volume>520</volume><issue>2</issue><spage>849</spage><epage>852</epage><pages>849-852</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><coden>THSFAP</coden><abstract>Thin films of tungsten disulfide (WS2) were deposited on 3Cr13 martensitic stain less steel substrate by radio-frequency (RF) sputtering. The as-deposited films were annealed at 473, 673 and 873K respectively for 2h in 510-4Pa vacuum. Composition of the films was inspected by energy dispersive spectroscopy. Surface morphology and structure properties were studied by scanning electron microscopy and X-ray diffraction techniques. Tribological behavior was also examined using tribometer. At 473K, the films exhibited low crystallization structure and no significant improvement in the tribological performance. At 673K, the tribological performance was improved and a transition from non-crystalline to hexagonal structure took in place. When the annealing temperature rose up to 873K, the films cracked and fell off from the substrate. The results suggested that with suitable technical parameters vacuum annealing could promote crystallization and improve tribological performance of RF sputtering WS2 films.</abstract><cop>Amsterdam</cop><pub>Elsevier</pub><doi>10.1016/j.tsf.2011.04.195</doi><tpages>4</tpages></addata></record> |
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| subjects | Annealing Condensed matter: structure, mechanical and thermal properties Crystallization Electron, ion, and scanning probe microscopy Exact sciences and technology Martensitic stainless steels Performance enhancement Physics Radio frequencies Sputtering Structure and morphology thickness Structure of solids and liquids crystallography Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology Thin films Tribology Vacuum annealing |
| title | Tribological behavior of radio-frequency sputtering WS2 thin films with vacuum annealing |
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