Cross-sectional transmission electron microscopy of GaAs quantum dots fabricated by filling of droplet-etched nanoholes

We investigate strain-free GaAs quantum dots (QDs) fabricated by filling of nanoholes in semiconductor surfaces. The nanoholes are created in a self-organized fashion by local droplet etching with Al droplets as etchants. High resolution transmission electron microscopy (TEM) demonstrates that the q...

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Veröffentlicht in:Journal of crystal growth 2011-11, Vol.335 (1), p.58-61
Hauptverfasser: Nemcsics, Á., Heyn, Ch, Tóth, L., Dobos, L., Stemmann, A., Hansen, W.
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container_end_page 61
container_issue 1
container_start_page 58
container_title Journal of crystal growth
container_volume 335
creator Nemcsics, Á.
Heyn, Ch
Tóth, L.
Dobos, L.
Stemmann, A.
Hansen, W.
description We investigate strain-free GaAs quantum dots (QDs) fabricated by filling of nanoholes in semiconductor surfaces. The nanoholes are created in a self-organized fashion by local droplet etching with Al droplets as etchants. High resolution transmission electron microscopy (TEM) demonstrates that the quantum dots are free of extended defects. Elemental mapping using local electron energy loss spectroscopy (EELS) shows that the walls surrounding the nanohole openings consist of AlAs. This result confirms that the walls are optically inactive. ► High-resolution TEM images of strain-free GaAs QDs dots are shown. ► The QDs are fabricated by filling of self-organized nanoholes. ► The QDs are free of extended defects. ► EELS elemental mapping was performed.
doi_str_mv 10.1016/j.jcrysgro.2011.09.005
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subjects A1. Etching
A1. Nanostructures
A3. Molecular beam epitaxy
B2. Semiconducting III-V materials
Droplets
Gallium arsenide
Gallium arsenides
Nanocomposites
Nanomaterials
Nanostructure
Quantum dots
Semiconductors
title Cross-sectional transmission electron microscopy of GaAs quantum dots fabricated by filling of droplet-etched nanoholes
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