Water-Developable Poly(2-oxazoline)-Based Negative Photoresists

Copoly(2‐oxazoline)‐based photoresists are prepared from pEtOx80Bu=Ox20 and pPhOx80Dc=Ox20, respectively, a tetrathiol, and a photosensitive initiator. It is possible to prepare copoly(2‐oxazoline)s bearing unsaturated side chains in a microwave reactor on a decagram scale in reaction times of 100 m...

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Veröffentlicht in:	Macromolecular rapid communications. 2012-03, Vol.33 (5), p.396-400
Hauptverfasser:	Schenk, Verena, Ellmaier, Lisa, Rossegger, Elisabeth, Edler, Matthias, Griesser, Thomas, Weidinger, Gerald, Wiesbrock, Frank
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences copoly(2-oxazoline)s Exact sciences and technology Molecular Structure Organic polymers Oxazoles - chemistry Photochemistry photolithography photoresists Physicochemistry of polymers Polymers - chemical synthesis Polymers - chemistry Polymers with particular properties Preparation, kinetics, thermodynamics, mechanism and catalysts Ultraviolet Rays
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