Directional Repetitive Control of a Metrological AFM
Atomic force microscopes (AFMs) are used for sample imaging and characterization at nanometer scale. In this work, we consider a metrological AFM, which is used for the calibration of transfer standards for commercial AFMs. The metrological AFM uses a three-degree-of-freedom (DOF) stage to move the...
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| Veröffentlicht in: | IEEE transactions on control systems technology 2011-11, Vol.19 (6), p.1622-1629 |
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| container_title | IEEE transactions on control systems technology |
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| creator | Merry, R. J. E. Ronde, M. J. C. van de Molengraft, R. Koops, K. R. Steinbuch, M. |
| description | Atomic force microscopes (AFMs) are used for sample imaging and characterization at nanometer scale. In this work, we consider a metrological AFM, which is used for the calibration of transfer standards for commercial AFMs. The metrological AFM uses a three-degree-of-freedom (DOF) stage to move the sample with respect to the probe of the AFM. The repetitive sample topography introduces repetitive disturbances in the system. To suppress these disturbances, repetitive control (RC) is applied to the imaging axis. A rotated sample orientation with respect to the actuation axes introduces a nonrepetitiveness in the originally fully repetitive errors and yields a deteriorated performance of RC. Directional repetitive control (DRC) is introduced to align the axes of the scanning movement with the sample orientation under the microscope. Experiments show that the proposed directional repetitive controller significantly reduces the tracking error as compared to standard repetitive control. |
| doi_str_mv | 10.1109/TCST.2010.2091642 |
| format | Article |
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Directional repetitive control (DRC) is introduced to align the axes of the scanning movement with the sample orientation under the microscope. 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A rotated sample orientation with respect to the actuation axes introduces a nonrepetitiveness in the originally fully repetitive errors and yields a deteriorated performance of RC. Directional repetitive control (DRC) is introduced to align the axes of the scanning movement with the sample orientation under the microscope. Experiments show that the proposed directional repetitive controller significantly reduces the tracking error as compared to standard repetitive control.</description><subject>Atomic force microscopes</subject><subject>Atomic force microscopy</subject><subject>Disturbances</subject><subject>Exact sciences and technology</subject><subject>Imaging</subject><subject>Instruments, apparatus, components and techniques common to several branches of physics and astronomy</subject><subject>learning control systems</subject><subject>Metrology</subject><subject>Microscopes</subject><subject>Motion control</subject><subject>Nanotechnology</subject><subject>Orientation</subject><subject>Physics</subject><subject>Piezoelectric devices</subject><subject>Reinforced concrete</subject><subject>Repetitive control</subject><subject>Scanning probe microscopes, components and techniques</subject><issn>1063-6536</issn><issn>1558-0865</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2011</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNpdkE9LAzEQxRdRsFY_gHhZBPG0Nf93cyzVqtAiaD2HbHYiKdtNTbaC396sLR48zRvmNw_ey7JLjCYYI3m3mr2tJgSllSCJBSNH2QhzXhWoEvw4aSRoITgVp9lZjGuEMOOkHGXs3gUwvfOdbvNX2ELvevcF-cx3ffBt7m2u8yUM2n84k6DpfHmenVjdRrg4zHH2Pn9YzZ6Kxcvj82y6KAzlrC8aVrOmrpnkpqm5BI2x0Qi4sIYbK0XDKGjeIK0BicoCNJXQQsiGW1MhSug4u937boP_3EHs1cZFA22rO_C7qCQRlBAkZCKv_5FrvwspU1SVRFRi8muH95AJPsYAVm2D2-jwrTBSQ4tqaFENLapDi-nn5mCsY0pvg-6Mi3-PhJWoFCVN3NWecwDwd-ZClCka_QHQGnor</recordid><startdate>20111101</startdate><enddate>20111101</enddate><creator>Merry, R. 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C.</au><au>van de Molengraft, R.</au><au>Koops, K. R.</au><au>Steinbuch, M.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Directional Repetitive Control of a Metrological AFM</atitle><jtitle>IEEE transactions on control systems technology</jtitle><stitle>TCST</stitle><date>2011-11-01</date><risdate>2011</risdate><volume>19</volume><issue>6</issue><spage>1622</spage><epage>1629</epage><pages>1622-1629</pages><issn>1063-6536</issn><eissn>1558-0865</eissn><coden>IETTE2</coden><abstract>Atomic force microscopes (AFMs) are used for sample imaging and characterization at nanometer scale. In this work, we consider a metrological AFM, which is used for the calibration of transfer standards for commercial AFMs. The metrological AFM uses a three-degree-of-freedom (DOF) stage to move the sample with respect to the probe of the AFM. The repetitive sample topography introduces repetitive disturbances in the system. 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| subjects | Atomic force microscopes Atomic force microscopy Disturbances Exact sciences and technology Imaging Instruments, apparatus, components and techniques common to several branches of physics and astronomy learning control systems Metrology Microscopes Motion control Nanotechnology Orientation Physics Piezoelectric devices Reinforced concrete Repetitive control Scanning probe microscopes, components and techniques |
| title | Directional Repetitive Control of a Metrological AFM |
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