Characterization of chromium thin films by sputter deposition

► XPS results confirmed the presence of a 12 nm oxide layer in the bare Cr-film due to absorption. ► A film with Cr film 130 nm and CrO x film 40 nm in thickness qualified for use in anti-reflection BM. ► They reported a transmission of zero, a reflection of 3.82% and an optical density of 4.04. In...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Journal of alloys and compounds 2011-10, Vol.509 (41), p.10110-10114
Hauptverfasser:	Wang, Sea-Fue, Lin, Hsui-Chi, Bor, Hui-Yun, Tsai, Yi-Lung, Wei, Chao-Nan
Format:	Artikel
Sprache:	eng
Schlagworte:	Chromium Chromium thin films Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Deposition Deposition by sputtering Exact sciences and technology Film thickness Materials science Methods of deposition of films and coatings film growth and epitaxy Optical density Optical properties Oxides Physics Reflection Sputtering Structure and morphology thickness Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology Thin films Vapor phase epitaxy growth from vapor phase X-ray photoelectron spectroscopy
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Schreiben Sie den ersten Kommentar!