Effect of sputtering parameters on structural and photocatalytic properties of N-doped TiO(2) films

Nitrogen-doped titanium oxide (N-TiO(2)) films deposited on unheated glass slides at various flow rates of N(2) in an atmosphere of Ar and O(2) gas mixture by direct current sputtering technique were investigated. The Ti2p, O1s and N1s spectra by X-ray photoelectron spectroscopy (XPS) verified N-sub...

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Veröffentlicht in:Key engineering materials 2011-01, Vol.474-476 (SUPPL.2), p.1321-1325
Hauptverfasser: Wu, Kee-Rong, Yeh, Chung-Wei, Wu, Jiing-Kae
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Sprache:eng
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