Characteristics of ZnO thin film deposited on various metal bottom electrodes
ZnO films for electronic applications were deposited by radio-frequency (rf) sputtering onto various metal bottom electrodes (Pt/Ti, W, Ni) to investigate such structural properties as crystallinity and surface morphology. The crystallinity, surface morphology and composition of the as-deposited fil...
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| Veröffentlicht in: | Metals and materials international 2003-08, Vol.9 (4), p.383-387 |
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| creator | Jeon, Young Ah No, Kwang Soo Kim, Jong Sung Yoon, Young Soo |
| description | ZnO films for electronic applications were deposited by radio-frequency (rf) sputtering onto various metal bottom electrodes (Pt/Ti, W, Ni) to investigate such structural properties as crystallinity and surface morphology. The crystallinity, surface morphology and composition of the as-deposited films were studied using X-ray diffraction (XRD), scanning electron microscopy (SEM) and Rutherford back-scattering spectrometry (RBS), respectively. The preferred orientation and surface morphologies were strongly influenced by the type of bottom electrodes. The ZnO films with (200) texturing deposited on Pt/Ti/SiO2/Si showed a smoother and smaller grain size than those deposited on W and Ni. The ZnO films on Pt and W electrodes exhibited compressive residual stress. |
| doi_str_mv | 10.1007/BF03027192 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_926286994</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2787641250</sourcerecordid><originalsourceid>FETCH-LOGICAL-c347t-a82ca491b7a23b8c9d005dc96af6742282549b2567e16a997749d34c5bf423db3</originalsourceid><addsrcrecordid>eNp90UtLxDAUBeAgCo6jG39BUFAQqslNmsdSB18wMhvduClpmjId2mZMMoL_3sgIgqCru_k4nMtB6JiSS0qIvLq5I4yApBp20AQIKQtOud5FE1pqVWgBbB8dxLgiRFBGYYKeZksTjE0udDF1NmLf4tdxgdOyG3Hb9QNu3NrHLrkG-xG_m9D5TcSDS6bHtU_JD9j1zqbgGxcP0V5r-uiOvu8UvdzdPs8eivni_nF2PS8s4zIVRoE1XNNaGmC1srrJTRurhWmF5AAKSq5rKIV0VBitpeS6YdyWdcuBNTWbovNt7jr4t42LqRq6aF3fm9HlepUGAUpozbM8-1eCVESUmmV48guu_CaM-YtKKS6EFERkdPoXykFScAolyepiq2zwMQbXVuvQDSZ8VJRUXzNVPzOxTzbJgik</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>884667606</pqid></control><display><type>article</type><title>Characteristics of ZnO thin film deposited on various metal bottom electrodes</title><source>SpringerLink Journals - AutoHoldings</source><creator>Jeon, Young Ah ; No, Kwang Soo ; Kim, Jong Sung ; Yoon, Young Soo</creator><creatorcontrib>Jeon, Young Ah ; No, Kwang Soo ; Kim, Jong Sung ; Yoon, Young Soo</creatorcontrib><description>ZnO films for electronic applications were deposited by radio-frequency (rf) sputtering onto various metal bottom electrodes (Pt/Ti, W, Ni) to investigate such structural properties as crystallinity and surface morphology. The crystallinity, surface morphology and composition of the as-deposited films were studied using X-ray diffraction (XRD), scanning electron microscopy (SEM) and Rutherford back-scattering spectrometry (RBS), respectively. The preferred orientation and surface morphologies were strongly influenced by the type of bottom electrodes. The ZnO films with (200) texturing deposited on Pt/Ti/SiO2/Si showed a smoother and smaller grain size than those deposited on W and Ni. The ZnO films on Pt and W electrodes exhibited compressive residual stress.</description><identifier>ISSN: 1598-9623</identifier><identifier>EISSN: 2005-4149</identifier><identifier>DOI: 10.1007/BF03027192</identifier><language>eng</language><publisher>Seoul: Springer Nature B.V</publisher><subject>Compressive properties ; Crystallinity ; Deposition ; Electrodes ; Grain size ; Metallurgy ; Morphology ; Nickel ; Platinum ; Preferred orientation ; Residual stress ; Scanning electron microscopy ; Silicon dioxide ; Texturing ; Thin films ; Titanium ; Zinc oxide</subject><ispartof>Metals and materials international, 2003-08, Vol.9 (4), p.383-387</ispartof><rights>Springer 2003.</rights><rights>Springer 2003</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c347t-a82ca491b7a23b8c9d005dc96af6742282549b2567e16a997749d34c5bf423db3</citedby><cites>FETCH-LOGICAL-c347t-a82ca491b7a23b8c9d005dc96af6742282549b2567e16a997749d34c5bf423db3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Jeon, Young Ah</creatorcontrib><creatorcontrib>No, Kwang Soo</creatorcontrib><creatorcontrib>Kim, Jong Sung</creatorcontrib><creatorcontrib>Yoon, Young Soo</creatorcontrib><title>Characteristics of ZnO thin film deposited on various metal bottom electrodes</title><title>Metals and materials international</title><description>ZnO films for electronic applications were deposited by radio-frequency (rf) sputtering onto various metal bottom electrodes (Pt/Ti, W, Ni) to investigate such structural properties as crystallinity and surface morphology. The crystallinity, surface morphology and composition of the as-deposited films were studied using X-ray diffraction (XRD), scanning electron microscopy (SEM) and Rutherford back-scattering spectrometry (RBS), respectively. The preferred orientation and surface morphologies were strongly influenced by the type of bottom electrodes. The ZnO films with (200) texturing deposited on Pt/Ti/SiO2/Si showed a smoother and smaller grain size than those deposited on W and Ni. The ZnO films on Pt and W electrodes exhibited compressive residual stress.</description><subject>Compressive properties</subject><subject>Crystallinity</subject><subject>Deposition</subject><subject>Electrodes</subject><subject>Grain size</subject><subject>Metallurgy</subject><subject>Morphology</subject><subject>Nickel</subject><subject>Platinum</subject><subject>Preferred orientation</subject><subject>Residual stress</subject><subject>Scanning electron microscopy</subject><subject>Silicon dioxide</subject><subject>Texturing</subject><subject>Thin films</subject><subject>Titanium</subject><subject>Zinc oxide</subject><issn>1598-9623</issn><issn>2005-4149</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2003</creationdate><recordtype>article</recordtype><sourceid>AFKRA</sourceid><sourceid>BENPR</sourceid><sourceid>CCPQU</sourceid><sourceid>DWQXO</sourceid><recordid>eNp90UtLxDAUBeAgCo6jG39BUFAQqslNmsdSB18wMhvduClpmjId2mZMMoL_3sgIgqCru_k4nMtB6JiSS0qIvLq5I4yApBp20AQIKQtOud5FE1pqVWgBbB8dxLgiRFBGYYKeZksTjE0udDF1NmLf4tdxgdOyG3Hb9QNu3NrHLrkG-xG_m9D5TcSDS6bHtU_JD9j1zqbgGxcP0V5r-uiOvu8UvdzdPs8eivni_nF2PS8s4zIVRoE1XNNaGmC1srrJTRurhWmF5AAKSq5rKIV0VBitpeS6YdyWdcuBNTWbovNt7jr4t42LqRq6aF3fm9HlepUGAUpozbM8-1eCVESUmmV48guu_CaM-YtKKS6EFERkdPoXykFScAolyepiq2zwMQbXVuvQDSZ8VJRUXzNVPzOxTzbJgik</recordid><startdate>20030801</startdate><enddate>20030801</enddate><creator>Jeon, Young Ah</creator><creator>No, Kwang Soo</creator><creator>Kim, Jong Sung</creator><creator>Yoon, Young Soo</creator><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>8FE</scope><scope>8FG</scope><scope>ABJCF</scope><scope>AFKRA</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>D1I</scope><scope>DWQXO</scope><scope>HCIFZ</scope><scope>KB.</scope><scope>PDBOC</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope><scope>7SP</scope><scope>7U5</scope><scope>L7M</scope></search><sort><creationdate>20030801</creationdate><title>Characteristics of ZnO thin film deposited on various metal bottom electrodes</title><author>Jeon, Young Ah ; No, Kwang Soo ; Kim, Jong Sung ; Yoon, Young Soo</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c347t-a82ca491b7a23b8c9d005dc96af6742282549b2567e16a997749d34c5bf423db3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2003</creationdate><topic>Compressive properties</topic><topic>Crystallinity</topic><topic>Deposition</topic><topic>Electrodes</topic><topic>Grain size</topic><topic>Metallurgy</topic><topic>Morphology</topic><topic>Nickel</topic><topic>Platinum</topic><topic>Preferred orientation</topic><topic>Residual stress</topic><topic>Scanning electron microscopy</topic><topic>Silicon dioxide</topic><topic>Texturing</topic><topic>Thin films</topic><topic>Titanium</topic><topic>Zinc oxide</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Jeon, Young Ah</creatorcontrib><creatorcontrib>No, Kwang Soo</creatorcontrib><creatorcontrib>Kim, Jong Sung</creatorcontrib><creatorcontrib>Yoon, Young Soo</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>Materials Science & Engineering Collection</collection><collection>ProQuest Central UK/Ireland</collection><collection>ProQuest Central</collection><collection>Technology Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Materials Science Collection</collection><collection>ProQuest Central Korea</collection><collection>SciTech Premium Collection</collection><collection>Materials Science Database</collection><collection>Materials Science Collection</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central China</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Metals and materials international</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Jeon, Young Ah</au><au>No, Kwang Soo</au><au>Kim, Jong Sung</au><au>Yoon, Young Soo</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Characteristics of ZnO thin film deposited on various metal bottom electrodes</atitle><jtitle>Metals and materials international</jtitle><date>2003-08-01</date><risdate>2003</risdate><volume>9</volume><issue>4</issue><spage>383</spage><epage>387</epage><pages>383-387</pages><issn>1598-9623</issn><eissn>2005-4149</eissn><abstract>ZnO films for electronic applications were deposited by radio-frequency (rf) sputtering onto various metal bottom electrodes (Pt/Ti, W, Ni) to investigate such structural properties as crystallinity and surface morphology. The crystallinity, surface morphology and composition of the as-deposited films were studied using X-ray diffraction (XRD), scanning electron microscopy (SEM) and Rutherford back-scattering spectrometry (RBS), respectively. The preferred orientation and surface morphologies were strongly influenced by the type of bottom electrodes. The ZnO films with (200) texturing deposited on Pt/Ti/SiO2/Si showed a smoother and smaller grain size than those deposited on W and Ni. The ZnO films on Pt and W electrodes exhibited compressive residual stress.</abstract><cop>Seoul</cop><pub>Springer Nature B.V</pub><doi>10.1007/BF03027192</doi><tpages>5</tpages></addata></record> |
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| subjects | Compressive properties Crystallinity Deposition Electrodes Grain size Metallurgy Morphology Nickel Platinum Preferred orientation Residual stress Scanning electron microscopy Silicon dioxide Texturing Thin films Titanium Zinc oxide |
| title | Characteristics of ZnO thin film deposited on various metal bottom electrodes |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-23T20%3A08%3A54IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Characteristics%20of%20ZnO%20thin%20film%20deposited%20on%20various%20metal%20bottom%20electrodes&rft.jtitle=Metals%20and%20materials%20international&rft.au=Jeon,%20Young%20Ah&rft.date=2003-08-01&rft.volume=9&rft.issue=4&rft.spage=383&rft.epage=387&rft.pages=383-387&rft.issn=1598-9623&rft.eissn=2005-4149&rft_id=info:doi/10.1007/BF03027192&rft_dat=%3Cproquest_cross%3E2787641250%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=884667606&rft_id=info:pmid/&rfr_iscdi=true |