Effects of fundamental processing parameters on the durability of sol–gel-derived silica thin films in water

Silica gel films were prepared on Si(100) substrates from Si(OC2H5)4- and Si(OCH3)4-derived sols by dip-coating, and the gel films were heat-treated at 100–700°C. The durability of the films against water was evaluated by measuring the thickness before and after soaking them in 80°C water for 24 h....

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Veröffentlicht in:Journal of the Ceramic Society of Japan 2011/06/01, Vol.119(1390), pp.434-439
Hauptverfasser: KOZUKA, Hiromitsu, MICHIHATA, Takahiro, UCHIYAMA, Hiroaki
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container_end_page 439
container_issue 1390
container_start_page 434
container_title Journal of the Ceramic Society of Japan
container_volume 119
creator KOZUKA, Hiromitsu
MICHIHATA, Takahiro
UCHIYAMA, Hiroaki
description Silica gel films were prepared on Si(100) substrates from Si(OC2H5)4- and Si(OCH3)4-derived sols by dip-coating, and the gel films were heat-treated at 100–700°C. The durability of the films against water was evaluated by measuring the thickness before and after soaking them in 80°C water for 24 h. The durability increased with increasing heat-treatment temperature principally due to the progress of film densification. Higher amounts of water for hydrolyzing Si(OC2H5)4 were greatly effective in achieving higher durability at lower heat-treatment temperatures. Longer sol aging was also effective in improving the durability of the Si(OC2H5)4-derived films. Si(OCH3)4-derived films exhibited much higher durability than Si(OC2H5)4-derived ones. All of these factors, i.e. the larger amounts of water for hydrolysis, the longer sol aging time and the employment of Si(OCH3)4, may provide more dense film structure and more chance to undergo condensation during gel film heat-treatment, leading to the higher durability at lower heat-treatment temperatures.
doi_str_mv 10.2109/jcersj2.119.434
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_926282487</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1692409337</sourcerecordid><originalsourceid>FETCH-LOGICAL-c636t-7fea7d0daf122cb2f714af1ac0580444ff54b0ceacb546dd58df7db0988c43893</originalsourceid><addsrcrecordid>eNp9kb9uFDEYxFcoSISQmtYSBTR78d9du0RRAohINKS2vPbni1c-72F7Qel4B96QJ8Gni4KgSOWRv9-MNJque03whhKsLmYLucx0Q4jacMafdaeEcdkPgomTpqWkPR45e9G9LGXGeKCcydMuXXkPtha0eOTX5MwOUjUR7fNioZSQtmhvcvutLR0tCdU7QG7NZgox1PuDrSzx989fW4i9gxy-g0Ol3axpaEjIh7grqIkfpkW86p57EwucP7xn3e311dfLj_3Nlw-fLt_f9HZgQ-1HD2Z02BlPKLUT9SPhTRuLhcScc-8Fn7AFYyfBB-eEdH50E1ZS2lZLsbPu7TG39fi2Qql6F4qFGE2CZS1a0YFKyuXYyHdPkmRQlGPF2AF98x86L2tOrYcmnAs1UiFwoy6OlM1LKRm83uewM_leE6wPS-mHpXRbSrelmuPz0TGXarbwyJtcg43wD0-Ywn9Fcz9S9s5kDYn9ASfypJE</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1445972550</pqid></control><display><type>article</type><title>Effects of fundamental processing parameters on the durability of sol–gel-derived silica thin films in water</title><source>J-STAGE</source><creator>KOZUKA, Hiromitsu ; MICHIHATA, Takahiro ; UCHIYAMA, Hiroaki</creator><creatorcontrib>KOZUKA, Hiromitsu ; MICHIHATA, Takahiro ; UCHIYAMA, Hiroaki</creatorcontrib><description>Silica gel films were prepared on Si(100) substrates from Si(OC2H5)4- and Si(OCH3)4-derived sols by dip-coating, and the gel films were heat-treated at 100–700°C. The durability of the films against water was evaluated by measuring the thickness before and after soaking them in 80°C water for 24 h. The durability increased with increasing heat-treatment temperature principally due to the progress of film densification. Higher amounts of water for hydrolyzing Si(OC2H5)4 were greatly effective in achieving higher durability at lower heat-treatment temperatures. Longer sol aging was also effective in improving the durability of the Si(OC2H5)4-derived films. Si(OCH3)4-derived films exhibited much higher durability than Si(OC2H5)4-derived ones. All of these factors, i.e. the larger amounts of water for hydrolysis, the longer sol aging time and the employment of Si(OCH3)4, may provide more dense film structure and more chance to undergo condensation during gel film heat-treatment, leading to the higher durability at lower heat-treatment temperatures.</description><identifier>ISSN: 1882-0743</identifier><identifier>EISSN: 1348-6535</identifier><identifier>DOI: 10.2109/jcersj2.119.434</identifier><language>eng</language><publisher>Tokyo: The Ceramic Society of Japan</publisher><subject>Aging ; Ceramics ; Coating ; Densification ; Dip coatings ; Durability ; Heat treatment ; Silica ; Silica gel ; Sol–gel method ; Thin film ; Thin films ; Water</subject><ispartof>Journal of the Ceramic Society of Japan, 2011/06/01, Vol.119(1390), pp.434-439</ispartof><rights>2011 The Ceramic Society of Japan</rights><rights>Copyright Japan Science and Technology Agency 2011</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c636t-7fea7d0daf122cb2f714af1ac0580444ff54b0ceacb546dd58df7db0988c43893</citedby><cites>FETCH-LOGICAL-c636t-7fea7d0daf122cb2f714af1ac0580444ff54b0ceacb546dd58df7db0988c43893</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,1883,4024,27923,27924,27925</link.rule.ids></links><search><creatorcontrib>KOZUKA, Hiromitsu</creatorcontrib><creatorcontrib>MICHIHATA, Takahiro</creatorcontrib><creatorcontrib>UCHIYAMA, Hiroaki</creatorcontrib><title>Effects of fundamental processing parameters on the durability of sol–gel-derived silica thin films in water</title><title>Journal of the Ceramic Society of Japan</title><addtitle>J. Ceram. Soc. Japan</addtitle><description>Silica gel films were prepared on Si(100) substrates from Si(OC2H5)4- and Si(OCH3)4-derived sols by dip-coating, and the gel films were heat-treated at 100–700°C. The durability of the films against water was evaluated by measuring the thickness before and after soaking them in 80°C water for 24 h. The durability increased with increasing heat-treatment temperature principally due to the progress of film densification. Higher amounts of water for hydrolyzing Si(OC2H5)4 were greatly effective in achieving higher durability at lower heat-treatment temperatures. Longer sol aging was also effective in improving the durability of the Si(OC2H5)4-derived films. Si(OCH3)4-derived films exhibited much higher durability than Si(OC2H5)4-derived ones. All of these factors, i.e. the larger amounts of water for hydrolysis, the longer sol aging time and the employment of Si(OCH3)4, may provide more dense film structure and more chance to undergo condensation during gel film heat-treatment, leading to the higher durability at lower heat-treatment temperatures.</description><subject>Aging</subject><subject>Ceramics</subject><subject>Coating</subject><subject>Densification</subject><subject>Dip coatings</subject><subject>Durability</subject><subject>Heat treatment</subject><subject>Silica</subject><subject>Silica gel</subject><subject>Sol–gel method</subject><subject>Thin film</subject><subject>Thin films</subject><subject>Water</subject><issn>1882-0743</issn><issn>1348-6535</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2011</creationdate><recordtype>article</recordtype><recordid>eNp9kb9uFDEYxFcoSISQmtYSBTR78d9du0RRAohINKS2vPbni1c-72F7Qel4B96QJ8Gni4KgSOWRv9-MNJque03whhKsLmYLucx0Q4jacMafdaeEcdkPgomTpqWkPR45e9G9LGXGeKCcydMuXXkPtha0eOTX5MwOUjUR7fNioZSQtmhvcvutLR0tCdU7QG7NZgox1PuDrSzx989fW4i9gxy-g0Ol3axpaEjIh7grqIkfpkW86p57EwucP7xn3e311dfLj_3Nlw-fLt_f9HZgQ-1HD2Z02BlPKLUT9SPhTRuLhcScc-8Fn7AFYyfBB-eEdH50E1ZS2lZLsbPu7TG39fi2Qql6F4qFGE2CZS1a0YFKyuXYyHdPkmRQlGPF2AF98x86L2tOrYcmnAs1UiFwoy6OlM1LKRm83uewM_leE6wPS-mHpXRbSrelmuPz0TGXarbwyJtcg43wD0-Ywn9Fcz9S9s5kDYn9ASfypJE</recordid><startdate>2011</startdate><enddate>2011</enddate><creator>KOZUKA, Hiromitsu</creator><creator>MICHIHATA, Takahiro</creator><creator>UCHIYAMA, Hiroaki</creator><general>The Ceramic Society of Japan</general><general>Japan Science and Technology Agency</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7QQ</scope><scope>7SR</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>2011</creationdate><title>Effects of fundamental processing parameters on the durability of sol–gel-derived silica thin films in water</title><author>KOZUKA, Hiromitsu ; MICHIHATA, Takahiro ; UCHIYAMA, Hiroaki</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c636t-7fea7d0daf122cb2f714af1ac0580444ff54b0ceacb546dd58df7db0988c43893</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2011</creationdate><topic>Aging</topic><topic>Ceramics</topic><topic>Coating</topic><topic>Densification</topic><topic>Dip coatings</topic><topic>Durability</topic><topic>Heat treatment</topic><topic>Silica</topic><topic>Silica gel</topic><topic>Sol–gel method</topic><topic>Thin film</topic><topic>Thin films</topic><topic>Water</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>KOZUKA, Hiromitsu</creatorcontrib><creatorcontrib>MICHIHATA, Takahiro</creatorcontrib><creatorcontrib>UCHIYAMA, Hiroaki</creatorcontrib><collection>CrossRef</collection><collection>Ceramic Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Journal of the Ceramic Society of Japan</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>KOZUKA, Hiromitsu</au><au>MICHIHATA, Takahiro</au><au>UCHIYAMA, Hiroaki</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effects of fundamental processing parameters on the durability of sol–gel-derived silica thin films in water</atitle><jtitle>Journal of the Ceramic Society of Japan</jtitle><addtitle>J. Ceram. Soc. Japan</addtitle><date>2011</date><risdate>2011</risdate><volume>119</volume><issue>1390</issue><spage>434</spage><epage>439</epage><pages>434-439</pages><issn>1882-0743</issn><eissn>1348-6535</eissn><abstract>Silica gel films were prepared on Si(100) substrates from Si(OC2H5)4- and Si(OCH3)4-derived sols by dip-coating, and the gel films were heat-treated at 100–700°C. The durability of the films against water was evaluated by measuring the thickness before and after soaking them in 80°C water for 24 h. The durability increased with increasing heat-treatment temperature principally due to the progress of film densification. Higher amounts of water for hydrolyzing Si(OC2H5)4 were greatly effective in achieving higher durability at lower heat-treatment temperatures. Longer sol aging was also effective in improving the durability of the Si(OC2H5)4-derived films. Si(OCH3)4-derived films exhibited much higher durability than Si(OC2H5)4-derived ones. All of these factors, i.e. the larger amounts of water for hydrolysis, the longer sol aging time and the employment of Si(OCH3)4, may provide more dense film structure and more chance to undergo condensation during gel film heat-treatment, leading to the higher durability at lower heat-treatment temperatures.</abstract><cop>Tokyo</cop><pub>The Ceramic Society of Japan</pub><doi>10.2109/jcersj2.119.434</doi><tpages>6</tpages><oa>free_for_read</oa></addata></record>
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1348-6535
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source J-STAGE
subjects Aging
Ceramics
Coating
Densification
Dip coatings
Durability
Heat treatment
Silica
Silica gel
Sol–gel method
Thin film
Thin films
Water
title Effects of fundamental processing parameters on the durability of sol–gel-derived silica thin films in water
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-07T20%3A00%3A32IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Effects%20of%20fundamental%20processing%20parameters%20on%20the%20durability%20of%20sol%E2%80%93gel-derived%20silica%20thin%20films%20in%20water&rft.jtitle=Journal%20of%20the%20Ceramic%20Society%20of%20Japan&rft.au=KOZUKA,%20Hiromitsu&rft.date=2011&rft.volume=119&rft.issue=1390&rft.spage=434&rft.epage=439&rft.pages=434-439&rft.issn=1882-0743&rft.eissn=1348-6535&rft_id=info:doi/10.2109/jcersj2.119.434&rft_dat=%3Cproquest_cross%3E1692409337%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1445972550&rft_id=info:pmid/&rfr_iscdi=true