Effects of fundamental processing parameters on the durability of sol–gel-derived silica thin films in water
Silica gel films were prepared on Si(100) substrates from Si(OC2H5)4- and Si(OCH3)4-derived sols by dip-coating, and the gel films were heat-treated at 100–700°C. The durability of the films against water was evaluated by measuring the thickness before and after soaking them in 80°C water for 24 h....
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Veröffentlicht in: | Journal of the Ceramic Society of Japan 2011/06/01, Vol.119(1390), pp.434-439 |
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container_title | Journal of the Ceramic Society of Japan |
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creator | KOZUKA, Hiromitsu MICHIHATA, Takahiro UCHIYAMA, Hiroaki |
description | Silica gel films were prepared on Si(100) substrates from Si(OC2H5)4- and Si(OCH3)4-derived sols by dip-coating, and the gel films were heat-treated at 100–700°C. The durability of the films against water was evaluated by measuring the thickness before and after soaking them in 80°C water for 24 h. The durability increased with increasing heat-treatment temperature principally due to the progress of film densification. Higher amounts of water for hydrolyzing Si(OC2H5)4 were greatly effective in achieving higher durability at lower heat-treatment temperatures. Longer sol aging was also effective in improving the durability of the Si(OC2H5)4-derived films. Si(OCH3)4-derived films exhibited much higher durability than Si(OC2H5)4-derived ones. All of these factors, i.e. the larger amounts of water for hydrolysis, the longer sol aging time and the employment of Si(OCH3)4, may provide more dense film structure and more chance to undergo condensation during gel film heat-treatment, leading to the higher durability at lower heat-treatment temperatures. |
doi_str_mv | 10.2109/jcersj2.119.434 |
format | Article |
fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_926282487</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1692409337</sourcerecordid><originalsourceid>FETCH-LOGICAL-c636t-7fea7d0daf122cb2f714af1ac0580444ff54b0ceacb546dd58df7db0988c43893</originalsourceid><addsrcrecordid>eNp9kb9uFDEYxFcoSISQmtYSBTR78d9du0RRAohINKS2vPbni1c-72F7Qel4B96QJ8Gni4KgSOWRv9-MNJque03whhKsLmYLucx0Q4jacMafdaeEcdkPgomTpqWkPR45e9G9LGXGeKCcydMuXXkPtha0eOTX5MwOUjUR7fNioZSQtmhvcvutLR0tCdU7QG7NZgox1PuDrSzx989fW4i9gxy-g0Ol3axpaEjIh7grqIkfpkW86p57EwucP7xn3e311dfLj_3Nlw-fLt_f9HZgQ-1HD2Z02BlPKLUT9SPhTRuLhcScc-8Fn7AFYyfBB-eEdH50E1ZS2lZLsbPu7TG39fi2Qql6F4qFGE2CZS1a0YFKyuXYyHdPkmRQlGPF2AF98x86L2tOrYcmnAs1UiFwoy6OlM1LKRm83uewM_leE6wPS-mHpXRbSrelmuPz0TGXarbwyJtcg43wD0-Ywn9Fcz9S9s5kDYn9ASfypJE</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1445972550</pqid></control><display><type>article</type><title>Effects of fundamental processing parameters on the durability of sol–gel-derived silica thin films in water</title><source>J-STAGE</source><creator>KOZUKA, Hiromitsu ; MICHIHATA, Takahiro ; UCHIYAMA, Hiroaki</creator><creatorcontrib>KOZUKA, Hiromitsu ; MICHIHATA, Takahiro ; UCHIYAMA, Hiroaki</creatorcontrib><description>Silica gel films were prepared on Si(100) substrates from Si(OC2H5)4- and Si(OCH3)4-derived sols by dip-coating, and the gel films were heat-treated at 100–700°C. The durability of the films against water was evaluated by measuring the thickness before and after soaking them in 80°C water for 24 h. The durability increased with increasing heat-treatment temperature principally due to the progress of film densification. Higher amounts of water for hydrolyzing Si(OC2H5)4 were greatly effective in achieving higher durability at lower heat-treatment temperatures. Longer sol aging was also effective in improving the durability of the Si(OC2H5)4-derived films. Si(OCH3)4-derived films exhibited much higher durability than Si(OC2H5)4-derived ones. All of these factors, i.e. the larger amounts of water for hydrolysis, the longer sol aging time and the employment of Si(OCH3)4, may provide more dense film structure and more chance to undergo condensation during gel film heat-treatment, leading to the higher durability at lower heat-treatment temperatures.</description><identifier>ISSN: 1882-0743</identifier><identifier>EISSN: 1348-6535</identifier><identifier>DOI: 10.2109/jcersj2.119.434</identifier><language>eng</language><publisher>Tokyo: The Ceramic Society of Japan</publisher><subject>Aging ; Ceramics ; Coating ; Densification ; Dip coatings ; Durability ; Heat treatment ; Silica ; Silica gel ; Sol–gel method ; Thin film ; Thin films ; Water</subject><ispartof>Journal of the Ceramic Society of Japan, 2011/06/01, Vol.119(1390), pp.434-439</ispartof><rights>2011 The Ceramic Society of Japan</rights><rights>Copyright Japan Science and Technology Agency 2011</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c636t-7fea7d0daf122cb2f714af1ac0580444ff54b0ceacb546dd58df7db0988c43893</citedby><cites>FETCH-LOGICAL-c636t-7fea7d0daf122cb2f714af1ac0580444ff54b0ceacb546dd58df7db0988c43893</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,1883,4024,27923,27924,27925</link.rule.ids></links><search><creatorcontrib>KOZUKA, Hiromitsu</creatorcontrib><creatorcontrib>MICHIHATA, Takahiro</creatorcontrib><creatorcontrib>UCHIYAMA, Hiroaki</creatorcontrib><title>Effects of fundamental processing parameters on the durability of sol–gel-derived silica thin films in water</title><title>Journal of the Ceramic Society of Japan</title><addtitle>J. Ceram. Soc. Japan</addtitle><description>Silica gel films were prepared on Si(100) substrates from Si(OC2H5)4- and Si(OCH3)4-derived sols by dip-coating, and the gel films were heat-treated at 100–700°C. The durability of the films against water was evaluated by measuring the thickness before and after soaking them in 80°C water for 24 h. The durability increased with increasing heat-treatment temperature principally due to the progress of film densification. Higher amounts of water for hydrolyzing Si(OC2H5)4 were greatly effective in achieving higher durability at lower heat-treatment temperatures. Longer sol aging was also effective in improving the durability of the Si(OC2H5)4-derived films. Si(OCH3)4-derived films exhibited much higher durability than Si(OC2H5)4-derived ones. All of these factors, i.e. the larger amounts of water for hydrolysis, the longer sol aging time and the employment of Si(OCH3)4, may provide more dense film structure and more chance to undergo condensation during gel film heat-treatment, leading to the higher durability at lower heat-treatment temperatures.</description><subject>Aging</subject><subject>Ceramics</subject><subject>Coating</subject><subject>Densification</subject><subject>Dip coatings</subject><subject>Durability</subject><subject>Heat treatment</subject><subject>Silica</subject><subject>Silica gel</subject><subject>Sol–gel method</subject><subject>Thin film</subject><subject>Thin films</subject><subject>Water</subject><issn>1882-0743</issn><issn>1348-6535</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2011</creationdate><recordtype>article</recordtype><recordid>eNp9kb9uFDEYxFcoSISQmtYSBTR78d9du0RRAohINKS2vPbni1c-72F7Qel4B96QJ8Gni4KgSOWRv9-MNJque03whhKsLmYLucx0Q4jacMafdaeEcdkPgomTpqWkPR45e9G9LGXGeKCcydMuXXkPtha0eOTX5MwOUjUR7fNioZSQtmhvcvutLR0tCdU7QG7NZgox1PuDrSzx989fW4i9gxy-g0Ol3axpaEjIh7grqIkfpkW86p57EwucP7xn3e311dfLj_3Nlw-fLt_f9HZgQ-1HD2Z02BlPKLUT9SPhTRuLhcScc-8Fn7AFYyfBB-eEdH50E1ZS2lZLsbPu7TG39fi2Qql6F4qFGE2CZS1a0YFKyuXYyHdPkmRQlGPF2AF98x86L2tOrYcmnAs1UiFwoy6OlM1LKRm83uewM_leE6wPS-mHpXRbSrelmuPz0TGXarbwyJtcg43wD0-Ywn9Fcz9S9s5kDYn9ASfypJE</recordid><startdate>2011</startdate><enddate>2011</enddate><creator>KOZUKA, Hiromitsu</creator><creator>MICHIHATA, Takahiro</creator><creator>UCHIYAMA, Hiroaki</creator><general>The Ceramic Society of Japan</general><general>Japan Science and Technology Agency</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7QQ</scope><scope>7SR</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>2011</creationdate><title>Effects of fundamental processing parameters on the durability of sol–gel-derived silica thin films in water</title><author>KOZUKA, Hiromitsu ; MICHIHATA, Takahiro ; UCHIYAMA, Hiroaki</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c636t-7fea7d0daf122cb2f714af1ac0580444ff54b0ceacb546dd58df7db0988c43893</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2011</creationdate><topic>Aging</topic><topic>Ceramics</topic><topic>Coating</topic><topic>Densification</topic><topic>Dip coatings</topic><topic>Durability</topic><topic>Heat treatment</topic><topic>Silica</topic><topic>Silica gel</topic><topic>Sol–gel method</topic><topic>Thin film</topic><topic>Thin films</topic><topic>Water</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>KOZUKA, Hiromitsu</creatorcontrib><creatorcontrib>MICHIHATA, Takahiro</creatorcontrib><creatorcontrib>UCHIYAMA, Hiroaki</creatorcontrib><collection>CrossRef</collection><collection>Ceramic Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Journal of the Ceramic Society of Japan</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>KOZUKA, Hiromitsu</au><au>MICHIHATA, Takahiro</au><au>UCHIYAMA, Hiroaki</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effects of fundamental processing parameters on the durability of sol–gel-derived silica thin films in water</atitle><jtitle>Journal of the Ceramic Society of Japan</jtitle><addtitle>J. Ceram. Soc. Japan</addtitle><date>2011</date><risdate>2011</risdate><volume>119</volume><issue>1390</issue><spage>434</spage><epage>439</epage><pages>434-439</pages><issn>1882-0743</issn><eissn>1348-6535</eissn><abstract>Silica gel films were prepared on Si(100) substrates from Si(OC2H5)4- and Si(OCH3)4-derived sols by dip-coating, and the gel films were heat-treated at 100–700°C. The durability of the films against water was evaluated by measuring the thickness before and after soaking them in 80°C water for 24 h. The durability increased with increasing heat-treatment temperature principally due to the progress of film densification. Higher amounts of water for hydrolyzing Si(OC2H5)4 were greatly effective in achieving higher durability at lower heat-treatment temperatures. Longer sol aging was also effective in improving the durability of the Si(OC2H5)4-derived films. Si(OCH3)4-derived films exhibited much higher durability than Si(OC2H5)4-derived ones. All of these factors, i.e. the larger amounts of water for hydrolysis, the longer sol aging time and the employment of Si(OCH3)4, may provide more dense film structure and more chance to undergo condensation during gel film heat-treatment, leading to the higher durability at lower heat-treatment temperatures.</abstract><cop>Tokyo</cop><pub>The Ceramic Society of Japan</pub><doi>10.2109/jcersj2.119.434</doi><tpages>6</tpages><oa>free_for_read</oa></addata></record> |
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language | eng |
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source | J-STAGE |
subjects | Aging Ceramics Coating Densification Dip coatings Durability Heat treatment Silica Silica gel Sol–gel method Thin film Thin films Water |
title | Effects of fundamental processing parameters on the durability of sol–gel-derived silica thin films in water |
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