High impact resistance plastic hard disk using plasma-based ion-implantation
A new technique for producing high impact resistance plastic hard disks is introduced. Plasma-based ion-implantation (PBII) using hi-polar high-voltage pulses is applied to the plastic substrate, then magnetic and hard-coat layers are fabricated on the substrate. The PBII-treated plastic hard disk h...
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| Veröffentlicht in: | IEEE transactions on magnetics 2000-09, Vol.36 (5), p.2689-2691 |
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| container_end_page | 2691 |
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| container_issue | 5 |
| container_start_page | 2689 |
| container_title | IEEE transactions on magnetics |
| container_volume | 36 |
| creator | Tonosaki, M. Okita, H. Ohuchi, H. Kobayashi, M. Takino, H. Takei, Y. Chayahara, A. Horino, Y. Tsubouchi, N. |
| description | A new technique for producing high impact resistance plastic hard disks is introduced. Plasma-based ion-implantation (PBII) using hi-polar high-voltage pulses is applied to the plastic substrate, then magnetic and hard-coat layers are fabricated on the substrate. The PBII-treated plastic hard disk had a critical acceleration value of 230 G from an impact test, while an aluminum hard disk had a value of less than 90 G. |
| doi_str_mv | 10.1109/20.908560 |
| format | Article |
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Plasma-based ion-implantation (PBII) using hi-polar high-voltage pulses is applied to the plastic substrate, then magnetic and hard-coat layers are fabricated on the substrate. The PBII-treated plastic hard disk had a critical acceleration value of 230 G from an impact test, while an aluminum hard disk had a value of less than 90 G.</description><identifier>ISSN: 0018-9464</identifier><identifier>EISSN: 1941-0069</identifier><identifier>DOI: 10.1109/20.908560</identifier><identifier>CODEN: IEMGAQ</identifier><language>eng</language><publisher>New York, NY: IEEE</publisher><subject>Acceleration ; Aluminum ; Applied sciences ; Disks ; Electronics ; Exact sciences and technology ; Hard disks ; Impact resistance ; Impact tests ; Ion implantation ; Life estimation ; Magnetic devices ; Magnetism ; Other magnetic recording and storage devices (including tapes, disks, and drums) ; Plasma accelerators ; Plastics ; Pulse transformers ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Surface resistance ; Testing ; Tribology ; Voltage</subject><ispartof>IEEE transactions on magnetics, 2000-09, Vol.36 (5), p.2689-2691</ispartof><rights>2001 INIST-CNRS</rights><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2000</rights><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c426t-273d87bedbc70b600993372f99586a0c2f653ba7187cc397e2225edc751220883</citedby><cites>FETCH-LOGICAL-c426t-273d87bedbc70b600993372f99586a0c2f653ba7187cc397e2225edc751220883</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/908560$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,314,776,780,785,786,792,23910,23911,25119,27903,27904,54737</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/908560$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=945350$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Tonosaki, M.</creatorcontrib><creatorcontrib>Okita, H.</creatorcontrib><creatorcontrib>Ohuchi, H.</creatorcontrib><creatorcontrib>Kobayashi, M.</creatorcontrib><creatorcontrib>Takino, H.</creatorcontrib><creatorcontrib>Takei, Y.</creatorcontrib><creatorcontrib>Chayahara, A.</creatorcontrib><creatorcontrib>Horino, Y.</creatorcontrib><creatorcontrib>Tsubouchi, N.</creatorcontrib><title>High impact resistance plastic hard disk using plasma-based ion-implantation</title><title>IEEE transactions on magnetics</title><addtitle>TMAG</addtitle><description>A new technique for producing high impact resistance plastic hard disks is introduced. Plasma-based ion-implantation (PBII) using hi-polar high-voltage pulses is applied to the plastic substrate, then magnetic and hard-coat layers are fabricated on the substrate. The PBII-treated plastic hard disk had a critical acceleration value of 230 G from an impact test, while an aluminum hard disk had a value of less than 90 G.</description><subject>Acceleration</subject><subject>Aluminum</subject><subject>Applied sciences</subject><subject>Disks</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Hard disks</subject><subject>Impact resistance</subject><subject>Impact tests</subject><subject>Ion implantation</subject><subject>Life estimation</subject><subject>Magnetic devices</subject><subject>Magnetism</subject><subject>Other magnetic recording and storage devices (including tapes, disks, and drums)</subject><subject>Plasma accelerators</subject><subject>Plastics</subject><subject>Pulse transformers</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Surface resistance</subject><subject>Testing</subject><subject>Tribology</subject><subject>Voltage</subject><issn>0018-9464</issn><issn>1941-0069</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2000</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNqN0c9r2zAUB3BRNliW7bBrT6aDjR2cPT39PpayNYVAL-3ZyLKcKHXsVHIO---r1KWFHrqexJM-7_HQl5BvFBaUgvmNsDCghYQTMqOG0xJAmg9kBkB1abjkn8jnlLa55ILCjKyWYb0pwm5v3VhEn0Iabe98se9sGoMrNjY2RRPSXXFIoV8_3u9sWdvkmyIMfZlbO9uPdszFF_KxtV3yX5_OObn9--fmYlmuri-vLs5XpeMoxxIVa7SqfVM7BbUEMIYxha0xQksLDlspWG0V1co5ZpRHROEbpwRFBK3ZnPyc5u7jcH_waax2ITnf5UX8cEiVoVwyjhqy_PGmRC0NB87eARkKJc3_odBGCokZnr2C2-EQ-_wvldYCkWJeck5-TcjFIaXo22ofw87GfxWF6hhohVBNgWb7_WmgTc52bcxBhfTcYLhg4qhOJxW89y-P04gHmOykoA</recordid><startdate>20000901</startdate><enddate>20000901</enddate><creator>Tonosaki, M.</creator><creator>Okita, H.</creator><creator>Ohuchi, H.</creator><creator>Kobayashi, M.</creator><creator>Takino, H.</creator><creator>Takei, Y.</creator><creator>Chayahara, A.</creator><creator>Horino, Y.</creator><creator>Tsubouchi, N.</creator><general>IEEE</general><general>Institute of Electrical and Electronics Engineers</general><general>The Institute of Electrical and Electronics Engineers, Inc. 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Microelectronics. Optoelectronics. Solid state devices</topic><topic>Surface resistance</topic><topic>Testing</topic><topic>Tribology</topic><topic>Voltage</topic><toplevel>online_resources</toplevel><creatorcontrib>Tonosaki, M.</creatorcontrib><creatorcontrib>Okita, H.</creatorcontrib><creatorcontrib>Ohuchi, H.</creatorcontrib><creatorcontrib>Kobayashi, M.</creatorcontrib><creatorcontrib>Takino, H.</creatorcontrib><creatorcontrib>Takei, Y.</creatorcontrib><creatorcontrib>Chayahara, A.</creatorcontrib><creatorcontrib>Horino, Y.</creatorcontrib><creatorcontrib>Tsubouchi, N.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Aluminium Industry Abstracts</collection><collection>ANTE: Abstracts in New Technology & Engineering</collection><collection>Engineering Research Database</collection><jtitle>IEEE transactions on magnetics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Tonosaki, M.</au><au>Okita, H.</au><au>Ohuchi, H.</au><au>Kobayashi, M.</au><au>Takino, H.</au><au>Takei, Y.</au><au>Chayahara, A.</au><au>Horino, Y.</au><au>Tsubouchi, N.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>High impact resistance plastic hard disk using plasma-based ion-implantation</atitle><jtitle>IEEE transactions on magnetics</jtitle><stitle>TMAG</stitle><date>2000-09-01</date><risdate>2000</risdate><volume>36</volume><issue>5</issue><spage>2689</spage><epage>2691</epage><pages>2689-2691</pages><issn>0018-9464</issn><eissn>1941-0069</eissn><coden>IEMGAQ</coden><abstract>A new technique for producing high impact resistance plastic hard disks is introduced. Plasma-based ion-implantation (PBII) using hi-polar high-voltage pulses is applied to the plastic substrate, then magnetic and hard-coat layers are fabricated on the substrate. The PBII-treated plastic hard disk had a critical acceleration value of 230 G from an impact test, while an aluminum hard disk had a value of less than 90 G.</abstract><cop>New York, NY</cop><pub>IEEE</pub><doi>10.1109/20.908560</doi><tpages>3</tpages></addata></record> |
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| identifier | ISSN: 0018-9464 |
| ispartof | IEEE transactions on magnetics, 2000-09, Vol.36 (5), p.2689-2691 |
| issn | 0018-9464 1941-0069 |
| language | eng |
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| source | IEEE Electronic Library (IEL) |
| subjects | Acceleration Aluminum Applied sciences Disks Electronics Exact sciences and technology Hard disks Impact resistance Impact tests Ion implantation Life estimation Magnetic devices Magnetism Other magnetic recording and storage devices (including tapes, disks, and drums) Plasma accelerators Plastics Pulse transformers Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Surface resistance Testing Tribology Voltage |
| title | High impact resistance plastic hard disk using plasma-based ion-implantation |
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