Sacrificial layers for air gaps in NEMS using alucone molecular layer deposition

A molecular layer deposition approach is reported that produces a new class of hybrid organic-inorganic thin films. These films have very low densities, and display typical atomic layer deposition characteristics: controllable linear growth, conformality, low roughness, and uniform composition. Beca...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Sensors and actuators. A. Physical. 2009-10, Vol.155 (1), p.8-15
Hauptverfasser:	Seghete, D., Davidson, B.D., Hall, R.A., Chang, Y.J., Bright, V.M., George, S.M.
Format:	Artikel
Sprache:	eng
Schlagworte:	Air gaps Density Deposition Etching Molecular structure Nanoelectromechanical systems Nanostructure Roughness
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!