The effect of geometry and post-annealing on surface acoustic wave characteristics of AlN thin films prepared by magnetron sputtering
► AlN thin films by reactive magnetron sputtering. ► Effects of geometry on SAW resonators. ► Effects of post-annealing on AlN film quality. ► Effects of post-annealing on SAW properties. This paper describes experimental relationship between surface acoustic wave (SAW) properties of two-port SAW re...
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| Veröffentlicht in: | Applied surface science 2011-08, Vol.257 (20), p.8696-8701 |
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| creator | Phan, Duy-Thach Chung, Gwiy-Sang |
| description | ► AlN thin films by reactive magnetron sputtering. ► Effects of geometry on SAW resonators. ► Effects of post-annealing on AlN film quality. ► Effects of post-annealing on SAW properties.
This paper describes experimental relationship between surface acoustic wave (SAW) properties of two-port SAW resonators based on polycrystalline aluminum nitride (AlN) thin films grown on Si substrates by using a pulsed reactive magnetron sputtering system and their geometry's parameters. Moreover, the influence of post-deposition heat treatment on SAW properties of AlN thin films was investigated at different annealing temperature (600
°C and 900
°C). The measurement results show the number of the inter-digital transducers (IDT) finger pairs (
N), the number of reflectors grating pairs (
R) and the IDT center-to-center distance (
L) related to insertion loss of SAW resonators. The best result of insertion loss was 15.6
dB for SAW resonators with
R
=
160 pair,
N
=
5 pair and
L
=
750
μm. At the same geometry parameters, the SAW velocity and insertion loss were improved slightly after annealing at 600
°C and were worse for the films annealed at 900
°C by changes in the surface morphology and stress on the film. |
| doi_str_mv | 10.1016/j.apsusc.2011.05.050 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_907946075</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0169433211007525</els_id><sourcerecordid>907946075</sourcerecordid><originalsourceid>FETCH-LOGICAL-c368t-ce0c219fb4276c901729839f6ec92756a97ee83d73ff0e05c5319e5b0fd9fb403</originalsourceid><addsrcrecordid>eNp9Uc2KFDEQDqLguPoGHnIRTz0mnU535yIsi3-w6GU9h5rqykyG7nSbpFfmAXxv08ziUSgIVL6fqq8YeyvFXgrZfjjvYUlrwn0tpNwLXUo8YzvZd6rSum-es12BmapRqn7JXqV0FkLW5XfH_jyciJNzhJnPjh9pnijHC4cw8GVOuYIQCEYfjnwOPK3RARIHnNeUPfLf8EgcTxABM0W_9dKmczt-5_nkA3d-nBJfIi0QaeCHC5_gGIrFpraseWOF42v2wsGY6M3Te8N-fv70cPe1uv_x5dvd7X2Fqu1zhSSwlsYdmrpr0QjZ1aZXxrWEpu50C6Yj6tXQKecECY1aSUP6INywkYS6Ye-vukucf62Usp18QhpHCFQ2skZ0pmlFpwuyuSIxzilFcnaJfoJ4sVLYLXR7ttfQ7Ra6FbrUZvDuyQASwugiBPTpH7duysCm7Qvu4xVHZdtHT9Em9BSQBh_LKeww-_8b_QXJmpx4</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>907946075</pqid></control><display><type>article</type><title>The effect of geometry and post-annealing on surface acoustic wave characteristics of AlN thin films prepared by magnetron sputtering</title><source>Access via ScienceDirect (Elsevier)</source><creator>Phan, Duy-Thach ; Chung, Gwiy-Sang</creator><creatorcontrib>Phan, Duy-Thach ; Chung, Gwiy-Sang</creatorcontrib><description>► AlN thin films by reactive magnetron sputtering. ► Effects of geometry on SAW resonators. ► Effects of post-annealing on AlN film quality. ► Effects of post-annealing on SAW properties.
This paper describes experimental relationship between surface acoustic wave (SAW) properties of two-port SAW resonators based on polycrystalline aluminum nitride (AlN) thin films grown on Si substrates by using a pulsed reactive magnetron sputtering system and their geometry's parameters. Moreover, the influence of post-deposition heat treatment on SAW properties of AlN thin films was investigated at different annealing temperature (600
°C and 900
°C). The measurement results show the number of the inter-digital transducers (IDT) finger pairs (
N), the number of reflectors grating pairs (
R) and the IDT center-to-center distance (
L) related to insertion loss of SAW resonators. The best result of insertion loss was 15.6
dB for SAW resonators with
R
=
160 pair,
N
=
5 pair and
L
=
750
μm. At the same geometry parameters, the SAW velocity and insertion loss were improved slightly after annealing at 600
°C and were worse for the films annealed at 900
°C by changes in the surface morphology and stress on the film.</description><identifier>ISSN: 0169-4332</identifier><identifier>EISSN: 1873-5584</identifier><identifier>DOI: 10.1016/j.apsusc.2011.05.050</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>AlN films ; Aluminum nitride ; Annealing ; Cold working, work hardening; annealing, post-deformation annealing, quenching, tempering recovery, and crystallization ; Cold working, work hardening; annealing, quenching, tempering, recovery, and recrystallization; textures ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Condensed matter: structure, mechanical and thermal properties ; Cross-disciplinary physics: materials science; rheology ; Deposition by sputtering ; Exact sciences and technology ; Geometry ; Insertion loss ; Magnetron sputtering ; Materials science ; Mechanical and acoustical properties; adhesion ; Methods of deposition of films and coatings; film growth and epitaxy ; Physics ; Post-annealing ; Resonators ; SAW resonator ; Silicon substrates ; Solid surfaces and solid-solid interfaces ; Surface acoustic waves ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) ; Thin films ; Treatment of materials and its effects on microstructure and properties</subject><ispartof>Applied surface science, 2011-08, Vol.257 (20), p.8696-8701</ispartof><rights>2011 Elsevier B.V.</rights><rights>2015 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c368t-ce0c219fb4276c901729839f6ec92756a97ee83d73ff0e05c5319e5b0fd9fb403</citedby><cites>FETCH-LOGICAL-c368t-ce0c219fb4276c901729839f6ec92756a97ee83d73ff0e05c5319e5b0fd9fb403</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.apsusc.2011.05.050$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,780,784,3550,27924,27925,45995</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=24298968$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Phan, Duy-Thach</creatorcontrib><creatorcontrib>Chung, Gwiy-Sang</creatorcontrib><title>The effect of geometry and post-annealing on surface acoustic wave characteristics of AlN thin films prepared by magnetron sputtering</title><title>Applied surface science</title><description>► AlN thin films by reactive magnetron sputtering. ► Effects of geometry on SAW resonators. ► Effects of post-annealing on AlN film quality. ► Effects of post-annealing on SAW properties.
This paper describes experimental relationship between surface acoustic wave (SAW) properties of two-port SAW resonators based on polycrystalline aluminum nitride (AlN) thin films grown on Si substrates by using a pulsed reactive magnetron sputtering system and their geometry's parameters. Moreover, the influence of post-deposition heat treatment on SAW properties of AlN thin films was investigated at different annealing temperature (600
°C and 900
°C). The measurement results show the number of the inter-digital transducers (IDT) finger pairs (
N), the number of reflectors grating pairs (
R) and the IDT center-to-center distance (
L) related to insertion loss of SAW resonators. The best result of insertion loss was 15.6
dB for SAW resonators with
R
=
160 pair,
N
=
5 pair and
L
=
750
μm. At the same geometry parameters, the SAW velocity and insertion loss were improved slightly after annealing at 600
°C and were worse for the films annealed at 900
°C by changes in the surface morphology and stress on the film.</description><subject>AlN films</subject><subject>Aluminum nitride</subject><subject>Annealing</subject><subject>Cold working, work hardening; annealing, post-deformation annealing, quenching, tempering recovery, and crystallization</subject><subject>Cold working, work hardening; annealing, quenching, tempering, recovery, and recrystallization; textures</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Deposition by sputtering</subject><subject>Exact sciences and technology</subject><subject>Geometry</subject><subject>Insertion loss</subject><subject>Magnetron sputtering</subject><subject>Materials science</subject><subject>Mechanical and acoustical properties; adhesion</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Physics</subject><subject>Post-annealing</subject><subject>Resonators</subject><subject>SAW resonator</subject><subject>Silicon substrates</subject><subject>Solid surfaces and solid-solid interfaces</subject><subject>Surface acoustic waves</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><subject>Thin films</subject><subject>Treatment of materials and its effects on microstructure and properties</subject><issn>0169-4332</issn><issn>1873-5584</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2011</creationdate><recordtype>article</recordtype><recordid>eNp9Uc2KFDEQDqLguPoGHnIRTz0mnU535yIsi3-w6GU9h5rqykyG7nSbpFfmAXxv08ziUSgIVL6fqq8YeyvFXgrZfjjvYUlrwn0tpNwLXUo8YzvZd6rSum-es12BmapRqn7JXqV0FkLW5XfH_jyciJNzhJnPjh9pnijHC4cw8GVOuYIQCEYfjnwOPK3RARIHnNeUPfLf8EgcTxABM0W_9dKmczt-5_nkA3d-nBJfIi0QaeCHC5_gGIrFpraseWOF42v2wsGY6M3Te8N-fv70cPe1uv_x5dvd7X2Fqu1zhSSwlsYdmrpr0QjZ1aZXxrWEpu50C6Yj6tXQKecECY1aSUP6INywkYS6Ye-vukucf62Usp18QhpHCFQ2skZ0pmlFpwuyuSIxzilFcnaJfoJ4sVLYLXR7ttfQ7Ra6FbrUZvDuyQASwugiBPTpH7duysCm7Qvu4xVHZdtHT9Em9BSQBh_LKeww-_8b_QXJmpx4</recordid><startdate>20110801</startdate><enddate>20110801</enddate><creator>Phan, Duy-Thach</creator><creator>Chung, Gwiy-Sang</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7QF</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20110801</creationdate><title>The effect of geometry and post-annealing on surface acoustic wave characteristics of AlN thin films prepared by magnetron sputtering</title><author>Phan, Duy-Thach ; Chung, Gwiy-Sang</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c368t-ce0c219fb4276c901729839f6ec92756a97ee83d73ff0e05c5319e5b0fd9fb403</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2011</creationdate><topic>AlN films</topic><topic>Aluminum nitride</topic><topic>Annealing</topic><topic>Cold working, work hardening; annealing, post-deformation annealing, quenching, tempering recovery, and crystallization</topic><topic>Cold working, work hardening; annealing, quenching, tempering, recovery, and recrystallization; textures</topic><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Deposition by sputtering</topic><topic>Exact sciences and technology</topic><topic>Geometry</topic><topic>Insertion loss</topic><topic>Magnetron sputtering</topic><topic>Materials science</topic><topic>Mechanical and acoustical properties; adhesion</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Physics</topic><topic>Post-annealing</topic><topic>Resonators</topic><topic>SAW resonator</topic><topic>Silicon substrates</topic><topic>Solid surfaces and solid-solid interfaces</topic><topic>Surface acoustic waves</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><topic>Thin films</topic><topic>Treatment of materials and its effects on microstructure and properties</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Phan, Duy-Thach</creatorcontrib><creatorcontrib>Chung, Gwiy-Sang</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Aluminium Industry Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Applied surface science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Phan, Duy-Thach</au><au>Chung, Gwiy-Sang</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>The effect of geometry and post-annealing on surface acoustic wave characteristics of AlN thin films prepared by magnetron sputtering</atitle><jtitle>Applied surface science</jtitle><date>2011-08-01</date><risdate>2011</risdate><volume>257</volume><issue>20</issue><spage>8696</spage><epage>8701</epage><pages>8696-8701</pages><issn>0169-4332</issn><eissn>1873-5584</eissn><abstract>► AlN thin films by reactive magnetron sputtering. ► Effects of geometry on SAW resonators. ► Effects of post-annealing on AlN film quality. ► Effects of post-annealing on SAW properties.
This paper describes experimental relationship between surface acoustic wave (SAW) properties of two-port SAW resonators based on polycrystalline aluminum nitride (AlN) thin films grown on Si substrates by using a pulsed reactive magnetron sputtering system and their geometry's parameters. Moreover, the influence of post-deposition heat treatment on SAW properties of AlN thin films was investigated at different annealing temperature (600
°C and 900
°C). The measurement results show the number of the inter-digital transducers (IDT) finger pairs (
N), the number of reflectors grating pairs (
R) and the IDT center-to-center distance (
L) related to insertion loss of SAW resonators. The best result of insertion loss was 15.6
dB for SAW resonators with
R
=
160 pair,
N
=
5 pair and
L
=
750
μm. At the same geometry parameters, the SAW velocity and insertion loss were improved slightly after annealing at 600
°C and were worse for the films annealed at 900
°C by changes in the surface morphology and stress on the film.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.apsusc.2011.05.050</doi><tpages>6</tpages></addata></record> |
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| subjects | AlN films Aluminum nitride Annealing Cold working, work hardening annealing, post-deformation annealing, quenching, tempering recovery, and crystallization Cold working, work hardening annealing, quenching, tempering, recovery, and recrystallization textures Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Deposition by sputtering Exact sciences and technology Geometry Insertion loss Magnetron sputtering Materials science Mechanical and acoustical properties adhesion Methods of deposition of films and coatings film growth and epitaxy Physics Post-annealing Resonators SAW resonator Silicon substrates Solid surfaces and solid-solid interfaces Surface acoustic waves Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin films Treatment of materials and its effects on microstructure and properties |
| title | The effect of geometry and post-annealing on surface acoustic wave characteristics of AlN thin films prepared by magnetron sputtering |
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