Microstructural characterizations and hardness evaluation of d.c. reactive magnetron sputtered CrN thin films on stainless steel substrate

Chromium nitride (CrN) thin films were deposited on stainless steel (grade: SA304) substrate by using d.c. reactive magnetron sputtering and the influence of process parameters such as substrate temperature, pressure, and power on their microstructural characteristics were investigated in the presen...

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Veröffentlicht in:	Bulletin of materials science 2010-04, Vol.33 (2), p.103-110
Hauptverfasser:	Shah, Hetal N., Chawla, Vipin, Jayaganthan, R., Kaur, Davinder
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemistry and Materials Science Chromium nitride Engineering Grain size Hardness Magnetron sputtering Materials Science Microscopy Microstructure Preferred orientation Pressure effects Process parameters Residual stress Sputtering Stainless steel Stainless steels Substrates Texture Thin films
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