Thin film silicon n–i–p solar cells deposited by VHF PECVD at 100 °C substrate temperature

The applicability of the very high frequency (VHF) plasma-enhanced chemical vapor deposition (PECVD) technique to the fabrication of solar cells in an n–i–p configuration at 100 °C substrate temperature is being investigated. Amorphous and microcrystalline silicon cells are made with the absorber la...

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Veröffentlicht in:	Solar energy materials and solar cells 2009-06, Vol.93 (6), p.680-683
Hauptverfasser:	Brinza, M., Rath, J.K., Schropp, R.E.I.
Format:	Artikel
Sprache:	eng
Schlagworte:	Amorphous Applied sciences Efficiency Energy Exact sciences and technology Low temperature Microcrystalline Natural energy PECVD Photovoltaic conversion Q1 Silicon Solar cell solar cells Solar cells. Photoelectrochemical cells Solar energy Steel Temperature Thin film Vapors
Online-Zugang:	Volltext
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