Structural and physical properties of Ni and Al co-doped ZnO films grown on glass by direct current magnetron co-sputtering

About 200 nm-thick Ni and Al co-doped ZnO films were deposited on glass substrates at 300 and 573 K by co-sputtering ZnO:Al and Ni targets. When the sputtering power applied to the Ni target was adjusted to 11 and 18 W, the Zn 0.87Al 0.04Ni 0.09O film and the Zn 0.85Al 0.04Ni 0.11O film were obtaine...

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