Effect of crystallographic orientation of nanocrystalline TiN on structural, electrical and mechanical properties of TiN/NiTi thin films
Nanocrystalline TiN/NiTi thin films have been grown on silicon substrate by dc magnetron sputtering to improve the surface and mechanical properties of NiTi based shape memory alloys without sacrificing the phase transformation effect. Interestingly, the preferential orientation of the TiN films was...
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Veröffentlicht in: | Journal of alloys and compounds 2009-06, Vol.479 (1), p.166-172 |
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creator | Kumar, Ashvani Singh, Devendra Kumar, Ravi Kaur, Davinder |
description | Nanocrystalline TiN/NiTi thin films have been grown on silicon substrate by dc magnetron sputtering to improve the surface and mechanical properties of NiTi based shape memory alloys without sacrificing the phase transformation effect. Interestingly, the preferential orientation of the TiN films was observed to change from (1
1
1) to (2
0
0) with change in nature of sputtering gas from 70% Ar
+
30% N
2 to 100% N
2. In present study the influence of crystallographic orientation of TiN on structural, electrical and mechanical properties of TiN/NiTi thin films was investigated systematically. A series of nanoindentations was made on NiTi and TiN/NiTi thin films at millinewton loads with a Berkovich indenter at different temperatures. TiN(2
0
0)/NiTi films were found to exhibit high hardness, high elastic modulus, and thereby better wear resistance as compared to pure NiTi and TiN(1
1
1)/NiTi films. In addition the presence of TiN(2
0
0) improves the top surface quality of NiTi films while retaining the phase transformation effect. |
doi_str_mv | 10.1016/j.jallcom.2008.12.116 |
format | Article |
fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_903616300</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0925838808023311</els_id><sourcerecordid>903616300</sourcerecordid><originalsourceid>FETCH-LOGICAL-c402t-8845d9818f3df7ab9431b43b76d31cecb1821e1fcbec3b36681ef918e916d9763</originalsourceid><addsrcrecordid>eNqFkc1uEzEUhS0EEqHtIyB5A2yYqe944tgrhKryI1Vlk64tj-eaOJqxg-0g9Q14bDwksKQry7rfOffqHEJeA2uBgbjet3szTTbObceYbKFrAcQzsgK54U0vhHpOVkx160ZyKV-SVznvGWOgOKzIr1vn0BYaHbXpMZdqFL8nc9h5S2PyGIopPoZlHkyIfxkfkG79Pa2TXNLRlmMy03uKU_VK3pqJmjDSGe3OhD_fQ4oHTMVjXqyq9Prebz0tOx-o89OcL8kLZ6aMV-f3gjx8ut3efGnuvn3-evPxrrE960ojZb8elQTp-Og2ZlA9h6Hnw0aMHCzaAWQHCM4OaPnAhZCAToFEBWJUG8EvyLuTb73oxxFz0bPPFqfJBIzHrBXjAgRnrJJv_0vyvu-UYFDB9Qm0Keac0OlD8rNJjxqYXhrSe31uSC8Naeh0bajq3pwXmFwzcskE6_M_cQdrznm3-H84cVhz-ekx6WxrMxZHn2reeoz-iU2_ARjXrAs</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>34429601</pqid></control><display><type>article</type><title>Effect of crystallographic orientation of nanocrystalline TiN on structural, electrical and mechanical properties of TiN/NiTi thin films</title><source>Elsevier ScienceDirect Journals</source><creator>Kumar, Ashvani ; Singh, Devendra ; Kumar, Ravi ; Kaur, Davinder</creator><creatorcontrib>Kumar, Ashvani ; Singh, Devendra ; Kumar, Ravi ; Kaur, Davinder</creatorcontrib><description>Nanocrystalline TiN/NiTi thin films have been grown on silicon substrate by dc magnetron sputtering to improve the surface and mechanical properties of NiTi based shape memory alloys without sacrificing the phase transformation effect. Interestingly, the preferential orientation of the TiN films was observed to change from (1
1
1) to (2
0
0) with change in nature of sputtering gas from 70% Ar
+
30% N
2 to 100% N
2. In present study the influence of crystallographic orientation of TiN on structural, electrical and mechanical properties of TiN/NiTi thin films was investigated systematically. A series of nanoindentations was made on NiTi and TiN/NiTi thin films at millinewton loads with a Berkovich indenter at different temperatures. TiN(2
0
0)/NiTi films were found to exhibit high hardness, high elastic modulus, and thereby better wear resistance as compared to pure NiTi and TiN(1
1
1)/NiTi films. In addition the presence of TiN(2
0
0) improves the top surface quality of NiTi films while retaining the phase transformation effect.</description><identifier>ISSN: 0925-8388</identifier><identifier>EISSN: 1873-4669</identifier><identifier>DOI: 10.1016/j.jallcom.2008.12.116</identifier><language>eng</language><publisher>Kidlington: Elsevier B.V</publisher><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Condensed matter: structure, mechanical and thermal properties ; Cross-disciplinary physics: materials science; rheology ; Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures ; Electronic transport in multilayers, nanoscale materials and structures ; Exact sciences and technology ; Materials science ; Mechanical and acoustical properties of condensed matter ; Mechanical properties of nanoscale materials ; Nanocrystalline ; Nanocrystalline materials ; Nanoindentation ; Nanoscale materials and structures: fabrication and characterization ; Physics ; TiN/NiTi thin films</subject><ispartof>Journal of alloys and compounds, 2009-06, Vol.479 (1), p.166-172</ispartof><rights>2009 Elsevier B.V.</rights><rights>2015 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c402t-8845d9818f3df7ab9431b43b76d31cecb1821e1fcbec3b36681ef918e916d9763</citedby><cites>FETCH-LOGICAL-c402t-8845d9818f3df7ab9431b43b76d31cecb1821e1fcbec3b36681ef918e916d9763</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.jallcom.2008.12.116$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,777,781,3537,27905,27906,45976</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=21533321$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Kumar, Ashvani</creatorcontrib><creatorcontrib>Singh, Devendra</creatorcontrib><creatorcontrib>Kumar, Ravi</creatorcontrib><creatorcontrib>Kaur, Davinder</creatorcontrib><title>Effect of crystallographic orientation of nanocrystalline TiN on structural, electrical and mechanical properties of TiN/NiTi thin films</title><title>Journal of alloys and compounds</title><description>Nanocrystalline TiN/NiTi thin films have been grown on silicon substrate by dc magnetron sputtering to improve the surface and mechanical properties of NiTi based shape memory alloys without sacrificing the phase transformation effect. Interestingly, the preferential orientation of the TiN films was observed to change from (1
1
1) to (2
0
0) with change in nature of sputtering gas from 70% Ar
+
30% N
2 to 100% N
2. In present study the influence of crystallographic orientation of TiN on structural, electrical and mechanical properties of TiN/NiTi thin films was investigated systematically. A series of nanoindentations was made on NiTi and TiN/NiTi thin films at millinewton loads with a Berkovich indenter at different temperatures. TiN(2
0
0)/NiTi films were found to exhibit high hardness, high elastic modulus, and thereby better wear resistance as compared to pure NiTi and TiN(1
1
1)/NiTi films. In addition the presence of TiN(2
0
0) improves the top surface quality of NiTi films while retaining the phase transformation effect.</description><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures</subject><subject>Electronic transport in multilayers, nanoscale materials and structures</subject><subject>Exact sciences and technology</subject><subject>Materials science</subject><subject>Mechanical and acoustical properties of condensed matter</subject><subject>Mechanical properties of nanoscale materials</subject><subject>Nanocrystalline</subject><subject>Nanocrystalline materials</subject><subject>Nanoindentation</subject><subject>Nanoscale materials and structures: fabrication and characterization</subject><subject>Physics</subject><subject>TiN/NiTi thin films</subject><issn>0925-8388</issn><issn>1873-4669</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2009</creationdate><recordtype>article</recordtype><recordid>eNqFkc1uEzEUhS0EEqHtIyB5A2yYqe944tgrhKryI1Vlk64tj-eaOJqxg-0g9Q14bDwksKQry7rfOffqHEJeA2uBgbjet3szTTbObceYbKFrAcQzsgK54U0vhHpOVkx160ZyKV-SVznvGWOgOKzIr1vn0BYaHbXpMZdqFL8nc9h5S2PyGIopPoZlHkyIfxkfkG79Pa2TXNLRlmMy03uKU_VK3pqJmjDSGe3OhD_fQ4oHTMVjXqyq9Prebz0tOx-o89OcL8kLZ6aMV-f3gjx8ut3efGnuvn3-evPxrrE960ojZb8elQTp-Og2ZlA9h6Hnw0aMHCzaAWQHCM4OaPnAhZCAToFEBWJUG8EvyLuTb73oxxFz0bPPFqfJBIzHrBXjAgRnrJJv_0vyvu-UYFDB9Qm0Keac0OlD8rNJjxqYXhrSe31uSC8Naeh0bajq3pwXmFwzcskE6_M_cQdrznm3-H84cVhz-ekx6WxrMxZHn2reeoz-iU2_ARjXrAs</recordid><startdate>20090601</startdate><enddate>20090601</enddate><creator>Kumar, Ashvani</creator><creator>Singh, Devendra</creator><creator>Kumar, Ravi</creator><creator>Kaur, Davinder</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20090601</creationdate><title>Effect of crystallographic orientation of nanocrystalline TiN on structural, electrical and mechanical properties of TiN/NiTi thin films</title><author>Kumar, Ashvani ; Singh, Devendra ; Kumar, Ravi ; Kaur, Davinder</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c402t-8845d9818f3df7ab9431b43b76d31cecb1821e1fcbec3b36681ef918e916d9763</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2009</creationdate><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures</topic><topic>Electronic transport in multilayers, nanoscale materials and structures</topic><topic>Exact sciences and technology</topic><topic>Materials science</topic><topic>Mechanical and acoustical properties of condensed matter</topic><topic>Mechanical properties of nanoscale materials</topic><topic>Nanocrystalline</topic><topic>Nanocrystalline materials</topic><topic>Nanoindentation</topic><topic>Nanoscale materials and structures: fabrication and characterization</topic><topic>Physics</topic><topic>TiN/NiTi thin films</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kumar, Ashvani</creatorcontrib><creatorcontrib>Singh, Devendra</creatorcontrib><creatorcontrib>Kumar, Ravi</creatorcontrib><creatorcontrib>Kaur, Davinder</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Journal of alloys and compounds</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kumar, Ashvani</au><au>Singh, Devendra</au><au>Kumar, Ravi</au><au>Kaur, Davinder</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effect of crystallographic orientation of nanocrystalline TiN on structural, electrical and mechanical properties of TiN/NiTi thin films</atitle><jtitle>Journal of alloys and compounds</jtitle><date>2009-06-01</date><risdate>2009</risdate><volume>479</volume><issue>1</issue><spage>166</spage><epage>172</epage><pages>166-172</pages><issn>0925-8388</issn><eissn>1873-4669</eissn><abstract>Nanocrystalline TiN/NiTi thin films have been grown on silicon substrate by dc magnetron sputtering to improve the surface and mechanical properties of NiTi based shape memory alloys without sacrificing the phase transformation effect. Interestingly, the preferential orientation of the TiN films was observed to change from (1
1
1) to (2
0
0) with change in nature of sputtering gas from 70% Ar
+
30% N
2 to 100% N
2. In present study the influence of crystallographic orientation of TiN on structural, electrical and mechanical properties of TiN/NiTi thin films was investigated systematically. A series of nanoindentations was made on NiTi and TiN/NiTi thin films at millinewton loads with a Berkovich indenter at different temperatures. TiN(2
0
0)/NiTi films were found to exhibit high hardness, high elastic modulus, and thereby better wear resistance as compared to pure NiTi and TiN(1
1
1)/NiTi films. In addition the presence of TiN(2
0
0) improves the top surface quality of NiTi films while retaining the phase transformation effect.</abstract><cop>Kidlington</cop><pub>Elsevier B.V</pub><doi>10.1016/j.jallcom.2008.12.116</doi><tpages>7</tpages></addata></record> |
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subjects | Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures Electronic transport in multilayers, nanoscale materials and structures Exact sciences and technology Materials science Mechanical and acoustical properties of condensed matter Mechanical properties of nanoscale materials Nanocrystalline Nanocrystalline materials Nanoindentation Nanoscale materials and structures: fabrication and characterization Physics TiN/NiTi thin films |
title | Effect of crystallographic orientation of nanocrystalline TiN on structural, electrical and mechanical properties of TiN/NiTi thin films |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-18T06%3A17%3A50IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Effect%20of%20crystallographic%20orientation%20of%20nanocrystalline%20TiN%20on%20structural,%20electrical%20and%20mechanical%20properties%20of%20TiN/NiTi%20thin%20films&rft.jtitle=Journal%20of%20alloys%20and%20compounds&rft.au=Kumar,%20Ashvani&rft.date=2009-06-01&rft.volume=479&rft.issue=1&rft.spage=166&rft.epage=172&rft.pages=166-172&rft.issn=0925-8388&rft.eissn=1873-4669&rft_id=info:doi/10.1016/j.jallcom.2008.12.116&rft_dat=%3Cproquest_cross%3E903616300%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=34429601&rft_id=info:pmid/&rft_els_id=S0925838808023311&rfr_iscdi=true |