Characterization of a new cobalt precursor for focused beam deposition of magnetic nanostructures
The electrical and magnetic properties of nanowires deposited from cobalt tricarbonyl nitrosyl (Co(CO)3NO) precursor by focused electron beam- and focused ion beam-induced deposition (FEBID and FIBID) have been investigated. As-deposited nanowires have similar Co content, around 50–55at.%, but diffe...
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| Veröffentlicht in: | Microelectronic engineering 2011-08, Vol.88 (8), p.1955-1958 |
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| container_issue | 8 |
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| container_title | Microelectronic engineering |
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| creator | Gazzadi, G.C. Mulders, J.J.L. Trompenaars, P. Ghirri, A. Rota, A. Affronte, M. Frabboni, S. |
| description | The electrical and magnetic properties of nanowires deposited from cobalt tricarbonyl nitrosyl (Co(CO)3NO) precursor by focused electron beam- and focused ion beam-induced deposition (FEBID and FIBID) have been investigated. As-deposited nanowires have similar Co content, around 50–55at.%, but different electrical behaviour: FEBID nanowire is highly resistive (6.3mΩcm at RT) and non-metallic at low T, while the FIBID one has much lower resistivity (189μΩcm at RT) and it is metallic. The magnetic properties, tested with magnetoresistance measurements, reveal a non-magnetic behaviour for both nanowires. After 400°C annealing in vacuum FEBID wire is much less resistive (62μΩcm at RT) and recovers the metallic behaviour at low T, and both FEBID and FIBID wires display ferromagnetic behaviour. Structural analysis by low energy-scanning transmission electron microscopy (LE-STEM) suggests that coarsening and interconnection of the Co nanograins are responsible for the improvement in electrical and magnetic properties. |
| doi_str_mv | 10.1016/j.mee.2010.12.031 |
| format | Article |
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As-deposited nanowires have similar Co content, around 50–55at.%, but different electrical behaviour: FEBID nanowire is highly resistive (6.3mΩcm at RT) and non-metallic at low T, while the FIBID one has much lower resistivity (189μΩcm at RT) and it is metallic. The magnetic properties, tested with magnetoresistance measurements, reveal a non-magnetic behaviour for both nanowires. After 400°C annealing in vacuum FEBID wire is much less resistive (62μΩcm at RT) and recovers the metallic behaviour at low T, and both FEBID and FIBID wires display ferromagnetic behaviour. Structural analysis by low energy-scanning transmission electron microscopy (LE-STEM) suggests that coarsening and interconnection of the Co nanograins are responsible for the improvement in electrical and magnetic properties.</description><identifier>ISSN: 0167-9317</identifier><identifier>EISSN: 1873-5568</identifier><identifier>DOI: 10.1016/j.mee.2010.12.031</identifier><identifier>CODEN: MIENEF</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Applied sciences ; Co precursor ; Cobalt ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Cross-disciplinary physics: materials science; rheology ; Deposition ; Electronics ; Exact sciences and technology ; Focused beam-induced deposition ; Magnetic nanostructures ; Magnetic properties ; Magnetic properties and materials ; Magnetic properties of nanostructures ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Microelectronic fabrication (materials and surfaces technology) ; Molecular, atomic, ion, and chemical beam epitaxy ; Nanocomposites ; Nanolithography ; Nanomaterials ; Nanoscale materials and structures: fabrication and characterization ; Nanostructure ; Nanowires ; Physics ; Precursors ; Quantum wires ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><ispartof>Microelectronic engineering, 2011-08, Vol.88 (8), p.1955-1958</ispartof><rights>2011 Elsevier B.V.</rights><rights>2015 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c359t-98802949bfbd86d246a12040f24babe300dcdefa603e73be98f876963e9eb5033</citedby><cites>FETCH-LOGICAL-c359t-98802949bfbd86d246a12040f24babe300dcdefa603e73be98f876963e9eb5033</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.mee.2010.12.031$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>309,310,314,780,784,789,790,3550,23930,23931,25140,27924,27925,45995</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=24458673$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Gazzadi, G.C.</creatorcontrib><creatorcontrib>Mulders, J.J.L.</creatorcontrib><creatorcontrib>Trompenaars, P.</creatorcontrib><creatorcontrib>Ghirri, A.</creatorcontrib><creatorcontrib>Rota, A.</creatorcontrib><creatorcontrib>Affronte, M.</creatorcontrib><creatorcontrib>Frabboni, S.</creatorcontrib><title>Characterization of a new cobalt precursor for focused beam deposition of magnetic nanostructures</title><title>Microelectronic engineering</title><description>The electrical and magnetic properties of nanowires deposited from cobalt tricarbonyl nitrosyl (Co(CO)3NO) precursor by focused electron beam- and focused ion beam-induced deposition (FEBID and FIBID) have been investigated. As-deposited nanowires have similar Co content, around 50–55at.%, but different electrical behaviour: FEBID nanowire is highly resistive (6.3mΩcm at RT) and non-metallic at low T, while the FIBID one has much lower resistivity (189μΩcm at RT) and it is metallic. The magnetic properties, tested with magnetoresistance measurements, reveal a non-magnetic behaviour for both nanowires. After 400°C annealing in vacuum FEBID wire is much less resistive (62μΩcm at RT) and recovers the metallic behaviour at low T, and both FEBID and FIBID wires display ferromagnetic behaviour. Structural analysis by low energy-scanning transmission electron microscopy (LE-STEM) suggests that coarsening and interconnection of the Co nanograins are responsible for the improvement in electrical and magnetic properties.</description><subject>Applied sciences</subject><subject>Co precursor</subject><subject>Cobalt</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Deposition</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Focused beam-induced deposition</subject><subject>Magnetic nanostructures</subject><subject>Magnetic properties</subject><subject>Magnetic properties and materials</subject><subject>Magnetic properties of nanostructures</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Microelectronic fabrication (materials and surfaces technology)</subject><subject>Molecular, atomic, ion, and chemical beam epitaxy</subject><subject>Nanocomposites</subject><subject>Nanolithography</subject><subject>Nanomaterials</subject><subject>Nanoscale materials and structures: fabrication and characterization</subject><subject>Nanostructure</subject><subject>Nanowires</subject><subject>Physics</subject><subject>Precursors</subject><subject>Quantum wires</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><issn>0167-9317</issn><issn>1873-5568</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2011</creationdate><recordtype>article</recordtype><recordid>eNp9kE9P3DAQxa2qlbqFfgBuvlScsvhP4tjihFYFKiFxgbM1ccbUqyRebAcEn54sS3vkMBqN9N6bmR8hJ5ytOePqbLseEdeC7WexZpJ_ISuuW1k1jdJfyWrRtJWRvP1OfuS8ZctcM70isPkLCVzBFF6hhDjR6CnQCZ-pix0Mhe4SujnlmKh_Lzdn7GmHMNIedzGHf64RHiYswdEJpphLml2ZE-Zj8s3DkPHnRz8i95e_7zbX1c3t1Z_NxU3lZGNKZbRmwtSm812vVS9qBVywmnlRd9ChZKx3PXpQTGIrOzTa61YZJdFg1zApj8jpIXeX4uOMudgxZIfDABPGOVvDeMulYGpR8oPSpZhzQm93KYyQXixndk_Tbu1C0-5pWi7sQnPx_PpIh-xg8AkmF_J_o6jrRqt2f8X5QYfLq08Bk80u4OSwDwvHYvsYPtnyBniWi3g</recordid><startdate>20110801</startdate><enddate>20110801</enddate><creator>Gazzadi, G.C.</creator><creator>Mulders, J.J.L.</creator><creator>Trompenaars, P.</creator><creator>Ghirri, A.</creator><creator>Rota, A.</creator><creator>Affronte, M.</creator><creator>Frabboni, S.</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>20110801</creationdate><title>Characterization of a new cobalt precursor for focused beam deposition of magnetic nanostructures</title><author>Gazzadi, G.C. ; Mulders, J.J.L. ; Trompenaars, P. ; Ghirri, A. ; Rota, A. ; Affronte, M. ; Frabboni, S.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c359t-98802949bfbd86d246a12040f24babe300dcdefa603e73be98f876963e9eb5033</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2011</creationdate><topic>Applied sciences</topic><topic>Co precursor</topic><topic>Cobalt</topic><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Deposition</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Focused beam-induced deposition</topic><topic>Magnetic nanostructures</topic><topic>Magnetic properties</topic><topic>Magnetic properties and materials</topic><topic>Magnetic properties of nanostructures</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Microelectronic fabrication (materials and surfaces technology)</topic><topic>Molecular, atomic, ion, and chemical beam epitaxy</topic><topic>Nanocomposites</topic><topic>Nanolithography</topic><topic>Nanomaterials</topic><topic>Nanoscale materials and structures: fabrication and characterization</topic><topic>Nanostructure</topic><topic>Nanowires</topic><topic>Physics</topic><topic>Precursors</topic><topic>Quantum wires</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Gazzadi, G.C.</creatorcontrib><creatorcontrib>Mulders, J.J.L.</creatorcontrib><creatorcontrib>Trompenaars, P.</creatorcontrib><creatorcontrib>Ghirri, A.</creatorcontrib><creatorcontrib>Rota, A.</creatorcontrib><creatorcontrib>Affronte, M.</creatorcontrib><creatorcontrib>Frabboni, S.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Microelectronic engineering</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Gazzadi, G.C.</au><au>Mulders, J.J.L.</au><au>Trompenaars, P.</au><au>Ghirri, A.</au><au>Rota, A.</au><au>Affronte, M.</au><au>Frabboni, S.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Characterization of a new cobalt precursor for focused beam deposition of magnetic nanostructures</atitle><jtitle>Microelectronic engineering</jtitle><date>2011-08-01</date><risdate>2011</risdate><volume>88</volume><issue>8</issue><spage>1955</spage><epage>1958</epage><pages>1955-1958</pages><issn>0167-9317</issn><eissn>1873-5568</eissn><coden>MIENEF</coden><abstract>The electrical and magnetic properties of nanowires deposited from cobalt tricarbonyl nitrosyl (Co(CO)3NO) precursor by focused electron beam- and focused ion beam-induced deposition (FEBID and FIBID) have been investigated. As-deposited nanowires have similar Co content, around 50–55at.%, but different electrical behaviour: FEBID nanowire is highly resistive (6.3mΩcm at RT) and non-metallic at low T, while the FIBID one has much lower resistivity (189μΩcm at RT) and it is metallic. The magnetic properties, tested with magnetoresistance measurements, reveal a non-magnetic behaviour for both nanowires. After 400°C annealing in vacuum FEBID wire is much less resistive (62μΩcm at RT) and recovers the metallic behaviour at low T, and both FEBID and FIBID wires display ferromagnetic behaviour. Structural analysis by low energy-scanning transmission electron microscopy (LE-STEM) suggests that coarsening and interconnection of the Co nanograins are responsible for the improvement in electrical and magnetic properties.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.mee.2010.12.031</doi><tpages>4</tpages></addata></record> |
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| subjects | Applied sciences Co precursor Cobalt Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Deposition Electronics Exact sciences and technology Focused beam-induced deposition Magnetic nanostructures Magnetic properties Magnetic properties and materials Magnetic properties of nanostructures Materials science Methods of deposition of films and coatings film growth and epitaxy Microelectronic fabrication (materials and surfaces technology) Molecular, atomic, ion, and chemical beam epitaxy Nanocomposites Nanolithography Nanomaterials Nanoscale materials and structures: fabrication and characterization Nanostructure Nanowires Physics Precursors Quantum wires Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices |
| title | Characterization of a new cobalt precursor for focused beam deposition of magnetic nanostructures |
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