Alkaline-developable, chemically amplified, negative-type photosensitive polyimide based on polyhydroxyimide, a crosslinker, and a photoacid generator
A chemically amplified photosensitive polyimide based on polyhydroxyimide (PHI) from cyclobutanetetracarboxylic dianhydride and 4,4'-(hexafluoroisopropylidene)bis(2-aminophenol), 4,4'-methylenebis[2,6-bis(hydroxymethyl)phenol] (MBHP) as a crosslinker, and (5-propylsulfonyloxyimino-5H-thiop...
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| Veröffentlicht in: | Journal of applied polymer science 2009-09, Vol.113 (6), p.3605-3611 |
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| container_issue | 6 |
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| container_title | Journal of applied polymer science |
| container_volume | 113 |
| creator | Saito, Yuta Mizoguchi, Katsuhisa Higashihara, Tomoya Ueda, Mitsuru |
| description | A chemically amplified photosensitive polyimide based on polyhydroxyimide (PHI) from cyclobutanetetracarboxylic dianhydride and 4,4'-(hexafluoroisopropylidene)bis(2-aminophenol), 4,4'-methylenebis[2,6-bis(hydroxymethyl)phenol] (MBHP) as a crosslinker, and (5-propylsulfonyloxyimino-5H-thiophen-2-ylidene)-(2-methylphenyl)acetonitrile (PTMA) as a photoacid generator was developed to obtain the abilities of low temperature patterning, low dielectric constant, and high sensitivity. The chemically amplified photosensitive polyimide, consisting of PHI (70 wt %), MBHP (20 wt %), and PTMA (10 wt %), showed a high sensitivity (D₀.₅) of 5.9 mJ/cm² and a good contrast (γ₀.₅) of 3.9, respectively, producing a clear negative-tone line-and-space pattern with 6-μm resolution. Furthermore, the chemically amplified photosensitive polyimide showed a high transparency in the i-line region and a low dielectric constant of 2.54. |
| doi_str_mv | 10.1002/app.30358 |
| format | Article |
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The chemically amplified photosensitive polyimide, consisting of PHI (70 wt %), MBHP (20 wt %), and PTMA (10 wt %), showed a high sensitivity (D₀.₅) of 5.9 mJ/cm² and a good contrast (γ₀.₅) of 3.9, respectively, producing a clear negative-tone line-and-space pattern with 6-μm resolution. Furthermore, the chemically amplified photosensitive polyimide showed a high transparency in the i-line region and a low dielectric constant of 2.54.</description><identifier>ISSN: 0021-8995</identifier><identifier>ISSN: 1097-4628</identifier><identifier>EISSN: 1097-4628</identifier><identifier>DOI: 10.1002/app.30358</identifier><identifier>CODEN: JAPNAB</identifier><language>eng</language><publisher>Hoboken: Wiley Subscription Services, Inc., A Wiley Company</publisher><subject>Amplification ; Applied sciences ; Crosslinking ; Dianhydrides ; Dielectric constant ; dielectric properties ; Exact sciences and technology ; Generators ; Organic polymers ; Patterning ; photoresists ; Physicochemistry of polymers ; Polyimide resins ; polyimides ; Polymers with particular properties ; Preparation, kinetics, thermodynamics, mechanism and catalysts ; Reproduction</subject><ispartof>Journal of applied polymer science, 2009-09, Vol.113 (6), p.3605-3611</ispartof><rights>Copyright © 2009 Wiley Periodicals, Inc.</rights><rights>2015 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c5038-c110b6a847ef73d5d2f8c75ec7045f8a8bf6d5eb2802c79385328fa94b587b6b3</citedby><cites>FETCH-LOGICAL-c5038-c110b6a847ef73d5d2f8c75ec7045f8a8bf6d5eb2802c79385328fa94b587b6b3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1002%2Fapp.30358$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1002%2Fapp.30358$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,780,784,1416,27922,27923,45572,45573</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=21747533$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Saito, Yuta</creatorcontrib><creatorcontrib>Mizoguchi, Katsuhisa</creatorcontrib><creatorcontrib>Higashihara, Tomoya</creatorcontrib><creatorcontrib>Ueda, Mitsuru</creatorcontrib><title>Alkaline-developable, chemically amplified, negative-type photosensitive polyimide based on polyhydroxyimide, a crosslinker, and a photoacid generator</title><title>Journal of applied polymer science</title><addtitle>J. Appl. Polym. Sci</addtitle><description>A chemically amplified photosensitive polyimide based on polyhydroxyimide (PHI) from cyclobutanetetracarboxylic dianhydride and 4,4'-(hexafluoroisopropylidene)bis(2-aminophenol), 4,4'-methylenebis[2,6-bis(hydroxymethyl)phenol] (MBHP) as a crosslinker, and (5-propylsulfonyloxyimino-5H-thiophen-2-ylidene)-(2-methylphenyl)acetonitrile (PTMA) as a photoacid generator was developed to obtain the abilities of low temperature patterning, low dielectric constant, and high sensitivity. The chemically amplified photosensitive polyimide, consisting of PHI (70 wt %), MBHP (20 wt %), and PTMA (10 wt %), showed a high sensitivity (D₀.₅) of 5.9 mJ/cm² and a good contrast (γ₀.₅) of 3.9, respectively, producing a clear negative-tone line-and-space pattern with 6-μm resolution. Furthermore, the chemically amplified photosensitive polyimide showed a high transparency in the i-line region and a low dielectric constant of 2.54.</description><subject>Amplification</subject><subject>Applied sciences</subject><subject>Crosslinking</subject><subject>Dianhydrides</subject><subject>Dielectric constant</subject><subject>dielectric properties</subject><subject>Exact sciences and technology</subject><subject>Generators</subject><subject>Organic polymers</subject><subject>Patterning</subject><subject>photoresists</subject><subject>Physicochemistry of polymers</subject><subject>Polyimide resins</subject><subject>polyimides</subject><subject>Polymers with particular properties</subject><subject>Preparation, kinetics, thermodynamics, mechanism and catalysts</subject><subject>Reproduction</subject><issn>0021-8995</issn><issn>1097-4628</issn><issn>1097-4628</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2009</creationdate><recordtype>article</recordtype><recordid>eNp1kM1u1DAUhSMEEkNhwROQDUJIk9Y_cewsh4pOkSqoBFWX1o1zM2PGE6d2WpoX6fPiTkp3rCyf-51j35Nl7yk5poSwExiGY064UC-yBSW1LMqKqZfZIs1ooepavM7exPibEEoFqRbZw8rtwNkeixbv0PkBGofL3Gxxbw04N-WwH5ztLLbLvMcNjPYOi3EaMB-2fvQR-2gftXzwbrJ722LeQMQ29_1B2k5t8PfzZJlDboKPMT24w5CufZukQxAY2-Yb7DHA6MPb7FUHLuK7p_Mouzr7-uv0vLj4sf52uroojCBcFYZS0lSgSomd5K1oWaeMFGgkKUWnQDVd1QpsmCLMyJorwZnqoC4boWRTNfwo-zTnDsHf3GIc9d5Gg85Bj_426prQShKiSCI_z-RhgYCdHoLdQ5g0Jfqxep2q14fqE_vxKRViKrEL0Bsbnw2MylIKzhN3MnN_rMPp_4F6dXn5L7mYHTaOeP_sgLDTleRS6Ovva72-Vues_ML0OvEfZr4Dr2ET0i-ufjJCedqrVBWR_C8CTK4s</recordid><startdate>20090915</startdate><enddate>20090915</enddate><creator>Saito, Yuta</creator><creator>Mizoguchi, Katsuhisa</creator><creator>Higashihara, Tomoya</creator><creator>Ueda, Mitsuru</creator><general>Wiley Subscription Services, Inc., A Wiley Company</general><general>Wiley</general><scope>FBQ</scope><scope>BSCLL</scope><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20090915</creationdate><title>Alkaline-developable, chemically amplified, negative-type photosensitive polyimide based on polyhydroxyimide, a crosslinker, and a photoacid generator</title><author>Saito, Yuta ; Mizoguchi, Katsuhisa ; Higashihara, Tomoya ; Ueda, Mitsuru</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c5038-c110b6a847ef73d5d2f8c75ec7045f8a8bf6d5eb2802c79385328fa94b587b6b3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2009</creationdate><topic>Amplification</topic><topic>Applied sciences</topic><topic>Crosslinking</topic><topic>Dianhydrides</topic><topic>Dielectric constant</topic><topic>dielectric properties</topic><topic>Exact sciences and technology</topic><topic>Generators</topic><topic>Organic polymers</topic><topic>Patterning</topic><topic>photoresists</topic><topic>Physicochemistry of polymers</topic><topic>Polyimide resins</topic><topic>polyimides</topic><topic>Polymers with particular properties</topic><topic>Preparation, kinetics, thermodynamics, mechanism and catalysts</topic><topic>Reproduction</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Saito, Yuta</creatorcontrib><creatorcontrib>Mizoguchi, Katsuhisa</creatorcontrib><creatorcontrib>Higashihara, Tomoya</creatorcontrib><creatorcontrib>Ueda, Mitsuru</creatorcontrib><collection>AGRIS</collection><collection>Istex</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Journal of applied polymer science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Saito, Yuta</au><au>Mizoguchi, Katsuhisa</au><au>Higashihara, Tomoya</au><au>Ueda, Mitsuru</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Alkaline-developable, chemically amplified, negative-type photosensitive polyimide based on polyhydroxyimide, a crosslinker, and a photoacid generator</atitle><jtitle>Journal of applied polymer science</jtitle><addtitle>J. Appl. Polym. Sci</addtitle><date>2009-09-15</date><risdate>2009</risdate><volume>113</volume><issue>6</issue><spage>3605</spage><epage>3611</epage><pages>3605-3611</pages><issn>0021-8995</issn><issn>1097-4628</issn><eissn>1097-4628</eissn><coden>JAPNAB</coden><abstract>A chemically amplified photosensitive polyimide based on polyhydroxyimide (PHI) from cyclobutanetetracarboxylic dianhydride and 4,4'-(hexafluoroisopropylidene)bis(2-aminophenol), 4,4'-methylenebis[2,6-bis(hydroxymethyl)phenol] (MBHP) as a crosslinker, and (5-propylsulfonyloxyimino-5H-thiophen-2-ylidene)-(2-methylphenyl)acetonitrile (PTMA) as a photoacid generator was developed to obtain the abilities of low temperature patterning, low dielectric constant, and high sensitivity. The chemically amplified photosensitive polyimide, consisting of PHI (70 wt %), MBHP (20 wt %), and PTMA (10 wt %), showed a high sensitivity (D₀.₅) of 5.9 mJ/cm² and a good contrast (γ₀.₅) of 3.9, respectively, producing a clear negative-tone line-and-space pattern with 6-μm resolution. Furthermore, the chemically amplified photosensitive polyimide showed a high transparency in the i-line region and a low dielectric constant of 2.54.</abstract><cop>Hoboken</cop><pub>Wiley Subscription Services, Inc., A Wiley Company</pub><doi>10.1002/app.30358</doi><tpages>7</tpages></addata></record> |
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| subjects | Amplification Applied sciences Crosslinking Dianhydrides Dielectric constant dielectric properties Exact sciences and technology Generators Organic polymers Patterning photoresists Physicochemistry of polymers Polyimide resins polyimides Polymers with particular properties Preparation, kinetics, thermodynamics, mechanism and catalysts Reproduction |
| title | Alkaline-developable, chemically amplified, negative-type photosensitive polyimide based on polyhydroxyimide, a crosslinker, and a photoacid generator |
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