Depth profile of mechanical properties of plasma-polymerized tetravinylsilane films evaluated by cyclic nanoindentation

Plasma-polymerized tetravinylsilane films deposited on silicon wafers by PECVD at different powers using pulsed plasma were analyzed by both typical conventional depth sensing and by cyclic nanoindentation. A comparative study of the two methods was carried out under reduced system drift. It was fou...

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Veröffentlicht in:Surface & coatings technology 2011-07, Vol.205, p.S470-S474
Hauptverfasser: Trivedi, R., Hoferek, L., Cech, V.
Format: Artikel
Sprache:eng
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