A novel approach to radiographic image resolution gauge fabrication
A resolution gauge was fabricated for measuring the spatial resolution of radiographic imaging systems. Silicon wafers, 100 mm 〈1 0 0〉, were patterned using standard contact lithography and the patterned features were etched using deep reactive ion etching (DRIE). The smallest features were 5 μm wid...
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| Veröffentlicht in: | Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment Accelerators, spectrometers, detectors and associated equipment, 2011-08, Vol.646 (1), p.135-141 |
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| container_title | Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment |
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| creator | Trivelpiece, C.L. Babcox, B.L. Brenizer, J.S. Wolfe, D.E. Adair, J.H. |
| description | A resolution gauge was fabricated for measuring the spatial resolution of radiographic imaging systems. Silicon wafers, 100
mm 〈1
0
0〉, were patterned using standard contact lithography and the patterned features were etched using deep reactive ion etching (DRIE). The smallest features were 5
μm wide line pairs. The resulting etched trenches included aspect ratios of up to 10:1 and were 40.6±0.2
μm deep. The etch rate was 2.7
μm/min for the reported etch depth. A Gd
2O
3 nanopowder was dispersed into a slurry using Darvan C and water as the dispersant and solvent, respectively. A rapid infiltration method was used to fill the etched trenches with the slurry. Neutron and X-ray radiographs of the resolution gauge and the results demonstrate that the prototype gauge would be a suitable standard for measuring the spatial resolution of both X-ray and neutron radiography systems.
► We describe a method for producing radiographic image spatial resolution gauges. ► Gauge features sizes range from 2
mm to 5
μm. ► The production method yields deep features with nearly perfectly square edges. ► Gadolinium oxide nanopowder was the radiation attenuating medium. ► Results show that the device is suitable for X-ray and neutron radiography systems. |
| doi_str_mv | 10.1016/j.nima.2011.04.039 |
| format | Article |
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mm 〈1
0
0〉, were patterned using standard contact lithography and the patterned features were etched using deep reactive ion etching (DRIE). The smallest features were 5
μm wide line pairs. The resulting etched trenches included aspect ratios of up to 10:1 and were 40.6±0.2
μm deep. The etch rate was 2.7
μm/min for the reported etch depth. A Gd
2O
3 nanopowder was dispersed into a slurry using Darvan C and water as the dispersant and solvent, respectively. A rapid infiltration method was used to fill the etched trenches with the slurry. Neutron and X-ray radiographs of the resolution gauge and the results demonstrate that the prototype gauge would be a suitable standard for measuring the spatial resolution of both X-ray and neutron radiography systems.
► We describe a method for producing radiographic image spatial resolution gauges. ► Gauge features sizes range from 2
mm to 5
μm. ► The production method yields deep features with nearly perfectly square edges. ► Gadolinium oxide nanopowder was the radiation attenuating medium. ► Results show that the device is suitable for X-ray and neutron radiography systems.</description><identifier>ISSN: 0168-9002</identifier><identifier>EISSN: 1872-9576</identifier><identifier>DOI: 10.1016/j.nima.2011.04.039</identifier><language>eng</language><publisher>Elsevier B.V</publisher><subject>Etching ; Gages ; Gauges ; Image resolution ; Image unsharpness ; Nanostructure ; Neutron imaging ; Radiographic ; Radiography ; Rapid-infiltration ; Slurries ; Spatial resolution ; Trenches ; X-ray imaging</subject><ispartof>Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment, 2011-08, Vol.646 (1), p.135-141</ispartof><rights>2011 Elsevier B.V.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c283t-b482e64be87c5f472ca9469651355ef1cd98603ecb32d81df76c6c661917e85d3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.nima.2011.04.039$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,780,784,3550,27924,27925,45995</link.rule.ids></links><search><creatorcontrib>Trivelpiece, C.L.</creatorcontrib><creatorcontrib>Babcox, B.L.</creatorcontrib><creatorcontrib>Brenizer, J.S.</creatorcontrib><creatorcontrib>Wolfe, D.E.</creatorcontrib><creatorcontrib>Adair, J.H.</creatorcontrib><title>A novel approach to radiographic image resolution gauge fabrication</title><title>Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment</title><description>A resolution gauge was fabricated for measuring the spatial resolution of radiographic imaging systems. Silicon wafers, 100
mm 〈1
0
0〉, were patterned using standard contact lithography and the patterned features were etched using deep reactive ion etching (DRIE). The smallest features were 5
μm wide line pairs. The resulting etched trenches included aspect ratios of up to 10:1 and were 40.6±0.2
μm deep. The etch rate was 2.7
μm/min for the reported etch depth. A Gd
2O
3 nanopowder was dispersed into a slurry using Darvan C and water as the dispersant and solvent, respectively. A rapid infiltration method was used to fill the etched trenches with the slurry. Neutron and X-ray radiographs of the resolution gauge and the results demonstrate that the prototype gauge would be a suitable standard for measuring the spatial resolution of both X-ray and neutron radiography systems.
► We describe a method for producing radiographic image spatial resolution gauges. ► Gauge features sizes range from 2
mm to 5
μm. ► The production method yields deep features with nearly perfectly square edges. ► Gadolinium oxide nanopowder was the radiation attenuating medium. ► Results show that the device is suitable for X-ray and neutron radiography systems.</description><subject>Etching</subject><subject>Gages</subject><subject>Gauges</subject><subject>Image resolution</subject><subject>Image unsharpness</subject><subject>Nanostructure</subject><subject>Neutron imaging</subject><subject>Radiographic</subject><subject>Radiography</subject><subject>Rapid-infiltration</subject><subject>Slurries</subject><subject>Spatial resolution</subject><subject>Trenches</subject><subject>X-ray imaging</subject><issn>0168-9002</issn><issn>1872-9576</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2011</creationdate><recordtype>article</recordtype><recordid>eNp9UE1LxDAUDKLguvoHPOXmqTVJ23yAl2XxCxa86Dmk6Ws3S7epSbvgvzdlPfve4cEwM7wZhO4pySmh_PGQD-5ockYozUmZk0JdoBWVgmWqEvwSrRJJZooQdo1uYjyQNErIFdpu8OBP0GMzjsEbu8eTx8E0znfBjHtncfLtAAeIvp8n5wfcmTkBramDs2ZBbtFVa_oId393jb5enj-3b9nu4_V9u9lllsliyupSMuBlDVLYqi0Fs0aVXPGKFlUFLbWNkpwUYOuCNZI2reA2LaeKCpBVU6zRw9k3ffo9Q5z00UULfW8G8HPUUnFGS0GrxGRnpg0-xgCtHkPKEX40JXopTB_0UpheCtOk1KmwJHo6iyBlODkIOloHg4XGBbCTbrz7T_4L_xp0Gw</recordid><startdate>20110801</startdate><enddate>20110801</enddate><creator>Trivelpiece, C.L.</creator><creator>Babcox, B.L.</creator><creator>Brenizer, J.S.</creator><creator>Wolfe, D.E.</creator><creator>Adair, J.H.</creator><general>Elsevier B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7U5</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope></search><sort><creationdate>20110801</creationdate><title>A novel approach to radiographic image resolution gauge fabrication</title><author>Trivelpiece, C.L. ; Babcox, B.L. ; Brenizer, J.S. ; Wolfe, D.E. ; Adair, J.H.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c283t-b482e64be87c5f472ca9469651355ef1cd98603ecb32d81df76c6c661917e85d3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2011</creationdate><topic>Etching</topic><topic>Gages</topic><topic>Gauges</topic><topic>Image resolution</topic><topic>Image unsharpness</topic><topic>Nanostructure</topic><topic>Neutron imaging</topic><topic>Radiographic</topic><topic>Radiography</topic><topic>Rapid-infiltration</topic><topic>Slurries</topic><topic>Spatial resolution</topic><topic>Trenches</topic><topic>X-ray imaging</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Trivelpiece, C.L.</creatorcontrib><creatorcontrib>Babcox, B.L.</creatorcontrib><creatorcontrib>Brenizer, J.S.</creatorcontrib><creatorcontrib>Wolfe, D.E.</creatorcontrib><creatorcontrib>Adair, J.H.</creatorcontrib><collection>CrossRef</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Trivelpiece, C.L.</au><au>Babcox, B.L.</au><au>Brenizer, J.S.</au><au>Wolfe, D.E.</au><au>Adair, J.H.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>A novel approach to radiographic image resolution gauge fabrication</atitle><jtitle>Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment</jtitle><date>2011-08-01</date><risdate>2011</risdate><volume>646</volume><issue>1</issue><spage>135</spage><epage>141</epage><pages>135-141</pages><issn>0168-9002</issn><eissn>1872-9576</eissn><abstract>A resolution gauge was fabricated for measuring the spatial resolution of radiographic imaging systems. Silicon wafers, 100
mm 〈1
0
0〉, were patterned using standard contact lithography and the patterned features were etched using deep reactive ion etching (DRIE). The smallest features were 5
μm wide line pairs. The resulting etched trenches included aspect ratios of up to 10:1 and were 40.6±0.2
μm deep. The etch rate was 2.7
μm/min for the reported etch depth. A Gd
2O
3 nanopowder was dispersed into a slurry using Darvan C and water as the dispersant and solvent, respectively. A rapid infiltration method was used to fill the etched trenches with the slurry. Neutron and X-ray radiographs of the resolution gauge and the results demonstrate that the prototype gauge would be a suitable standard for measuring the spatial resolution of both X-ray and neutron radiography systems.
► We describe a method for producing radiographic image spatial resolution gauges. ► Gauge features sizes range from 2
mm to 5
μm. ► The production method yields deep features with nearly perfectly square edges. ► Gadolinium oxide nanopowder was the radiation attenuating medium. ► Results show that the device is suitable for X-ray and neutron radiography systems.</abstract><pub>Elsevier B.V</pub><doi>10.1016/j.nima.2011.04.039</doi><tpages>7</tpages></addata></record> |
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| identifier | ISSN: 0168-9002 |
| ispartof | Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment, 2011-08, Vol.646 (1), p.135-141 |
| issn | 0168-9002 1872-9576 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_896214715 |
| source | Access via ScienceDirect (Elsevier) |
| subjects | Etching Gages Gauges Image resolution Image unsharpness Nanostructure Neutron imaging Radiographic Radiography Rapid-infiltration Slurries Spatial resolution Trenches X-ray imaging |
| title | A novel approach to radiographic image resolution gauge fabrication |
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