Nanoscale friction of partially oxidized silicon nitride thin films
The nanoscale friction of partially oxidized silicon nitride thin films deposited by reactive magnetron sputtering was investigated. Post deposition thermal annealing in O2, trying to simulate the oxidation by atmospheric oxygen in working conditions, formed a partially oxidized layer at the surface...
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| Veröffentlicht in: | Surface & coatings technology 2011-06, Vol.205 (19), p.4528-4531 |
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| container_issue | 19 |
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| container_title | Surface & coatings technology |
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| creator | Filla, J. Aguzzoli, C. Sonda, V. Farias, M.C.M. Soares, G.V. Baumvol, I.J.R. Figueroa, C.A. |
| description | The nanoscale friction of partially oxidized silicon nitride thin films deposited by reactive magnetron sputtering was investigated. Post deposition thermal annealing in O2, trying to simulate the oxidation by atmospheric oxygen in working conditions, formed a partially oxidized layer at the surface with maximum thickness around 10nm. Unidirectional sliding tests showed a decrease of the low-load friction coefficients of the sliding pair for the samples annealed in oxygen as compared to the non-annealed ones. The results are discussed on the lights of our extension of the crystal chemistry model, which establishes a relationship between ionic potential and friction coefficient.
► The nanoscale friction behavior of partially oxidized Si3N4 thin films is studied. ► A modification of the crystal chemistry model for tribology is suggested. ► Ultra-low friction coefficients for SiOxNy are observed. |
| doi_str_mv | 10.1016/j.surfcoat.2011.03.111 |
| format | Article |
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► The nanoscale friction behavior of partially oxidized Si3N4 thin films is studied. ► A modification of the crystal chemistry model for tribology is suggested. ► Ultra-low friction coefficients for SiOxNy are observed.</description><subject>Annealing</subject><subject>Applied sciences</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Deposition</subject><subject>Exact sciences and technology</subject><subject>Friction</subject><subject>Ionic potential</subject><subject>Materials science</subject><subject>Mechanical properties and methods of testing. Rheology. Fracture mechanics. Tribology</subject><subject>Metals. Metallurgy</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Nanocomposites</subject><subject>Nanomaterials</subject><subject>Nanoscale friction</subject><subject>Nanostructure</subject><subject>Physics</subject><subject>Silicon nitride</subject><subject>Silicon oxide</subject><subject>Surface treatments</subject><subject>Thin films</subject><issn>0257-8972</issn><issn>1879-3347</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2011</creationdate><recordtype>article</recordtype><recordid>eNqFkUuLGzEQhEXYQLyPv7DMJSSXmaglWY9bgskLluSydyH3SKTNeORI45DdXx8Zb3LMnhq6v-qCKsZugQ_AQb_bDfVYEuawDIIDDFwOAPCCrcAa10upzAVbcbE2vXVGvGKXte4452CcWrHNtzDnimGKXSqEC-W5y6k7hLJQmKaHLv-mkR7j2FWaCNt1pqXQGLvlB81domlfr9nLFKYab57mFbv_9PF-86W_-_756-bDXY_KmqXfJicFriOX4JCL0SqJcSvbWotgHWCSgMJIjWMj1mI01mydDUnZKEHKK_bm_PZQ8s9jrIvfU8U4TWGO-Vi9dRqsVgKeJ62Tdm3ANfLtf0nQTiiuAXRD9RnFkmstMflDoX0oDx64PxXhd_5vEf5UhOfStyKa8PWTRzgFnUqYkeo_tVCCO65E496fudgy_EWx-IoUZ4wjlYiLHzM9Z_UHgVOhTw</recordid><startdate>20110625</startdate><enddate>20110625</enddate><creator>Filla, J.</creator><creator>Aguzzoli, C.</creator><creator>Sonda, V.</creator><creator>Farias, M.C.M.</creator><creator>Soares, G.V.</creator><creator>Baumvol, I.J.R.</creator><creator>Figueroa, C.A.</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>6I.</scope><scope>AAFTH</scope><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20110625</creationdate><title>Nanoscale friction of partially oxidized silicon nitride thin films</title><author>Filla, J. ; Aguzzoli, C. ; Sonda, V. ; Farias, M.C.M. ; Soares, G.V. ; Baumvol, I.J.R. ; Figueroa, C.A.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c487t-bf932c5e0319c02d843ceb3bf962a891cf31c2736cd31952d787b98af48e3133</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2011</creationdate><topic>Annealing</topic><topic>Applied sciences</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Deposition</topic><topic>Exact sciences and technology</topic><topic>Friction</topic><topic>Ionic potential</topic><topic>Materials science</topic><topic>Mechanical properties and methods of testing. Rheology. Fracture mechanics. Tribology</topic><topic>Metals. Metallurgy</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Nanocomposites</topic><topic>Nanomaterials</topic><topic>Nanoscale friction</topic><topic>Nanostructure</topic><topic>Physics</topic><topic>Silicon nitride</topic><topic>Silicon oxide</topic><topic>Surface treatments</topic><topic>Thin films</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Filla, J.</creatorcontrib><creatorcontrib>Aguzzoli, C.</creatorcontrib><creatorcontrib>Sonda, V.</creatorcontrib><creatorcontrib>Farias, M.C.M.</creatorcontrib><creatorcontrib>Soares, G.V.</creatorcontrib><creatorcontrib>Baumvol, I.J.R.</creatorcontrib><creatorcontrib>Figueroa, C.A.</creatorcontrib><collection>ScienceDirect Open Access Titles</collection><collection>Elsevier:ScienceDirect:Open Access</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Surface & coatings technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Filla, J.</au><au>Aguzzoli, C.</au><au>Sonda, V.</au><au>Farias, M.C.M.</au><au>Soares, G.V.</au><au>Baumvol, I.J.R.</au><au>Figueroa, C.A.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Nanoscale friction of partially oxidized silicon nitride thin films</atitle><jtitle>Surface & coatings technology</jtitle><date>2011-06-25</date><risdate>2011</risdate><volume>205</volume><issue>19</issue><spage>4528</spage><epage>4531</epage><pages>4528-4531</pages><issn>0257-8972</issn><eissn>1879-3347</eissn><coden>SCTEEJ</coden><abstract>The nanoscale friction of partially oxidized silicon nitride thin films deposited by reactive magnetron sputtering was investigated. Post deposition thermal annealing in O2, trying to simulate the oxidation by atmospheric oxygen in working conditions, formed a partially oxidized layer at the surface with maximum thickness around 10nm. Unidirectional sliding tests showed a decrease of the low-load friction coefficients of the sliding pair for the samples annealed in oxygen as compared to the non-annealed ones. The results are discussed on the lights of our extension of the crystal chemistry model, which establishes a relationship between ionic potential and friction coefficient.
► The nanoscale friction behavior of partially oxidized Si3N4 thin films is studied. ► A modification of the crystal chemistry model for tribology is suggested. ► Ultra-low friction coefficients for SiOxNy are observed.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.surfcoat.2011.03.111</doi><tpages>4</tpages><oa>free_for_read</oa></addata></record> |
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| subjects | Annealing Applied sciences Cross-disciplinary physics: materials science rheology Deposition Exact sciences and technology Friction Ionic potential Materials science Mechanical properties and methods of testing. Rheology. Fracture mechanics. Tribology Metals. Metallurgy Methods of deposition of films and coatings film growth and epitaxy Nanocomposites Nanomaterials Nanoscale friction Nanostructure Physics Silicon nitride Silicon oxide Surface treatments Thin films |
| title | Nanoscale friction of partially oxidized silicon nitride thin films |
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