The influence of diffusion-induced dislocations on high efficiency silicon solar cells

Heavy boron and phosphorus diffusions are used in many high efficiency, monocrystalline silicon solar cell designs to form localized contact diffusions and back surface fields. It is important to cell performance that these diffusion processes do not increase bulk recombination by the introduction o...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:IEEE transactions on electron devices 2006-03, Vol.53 (3), p.457-464
Hauptverfasser: Cousins, P.J., Cotter, J.E.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 464
container_issue 3
container_start_page 457
container_title IEEE transactions on electron devices
container_volume 53
creator Cousins, P.J.
Cotter, J.E.
description Heavy boron and phosphorus diffusions are used in many high efficiency, monocrystalline silicon solar cell designs to form localized contact diffusions and back surface fields. It is important to cell performance that these diffusion processes do not increase bulk recombination by the introduction of lattice defects. This paper investigates the effect of boron and phosphorus misfit dislocation networks on the bulk recombination parameters, and performance of high efficiency silicon solar cells. It demonstrates that the formation of either a boron or phosphorus misfit dislocation network generates bulk asymmetric Shockley-Read-Hall recombination centers, and that these adversely affect the current-voltage curve, local ideality factor, and ultimately the performance of p-type silicon solar cells.
doi_str_mv 10.1109/TED.2005.863535
format Article
fullrecord <record><control><sourceid>proquest_RIE</sourceid><recordid>TN_cdi_proquest_miscellaneous_889398746</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>1597521</ieee_id><sourcerecordid>28104299</sourcerecordid><originalsourceid>FETCH-LOGICAL-c422t-1804c3cfe4e26409b0fff2d4eae197445ac36d73be1fe49a5d7325ea9897b8b73</originalsourceid><addsrcrecordid>eNp9kUtLAzEUhYMoWKtrF24GQV1Nm_ckS6n1AQU31W1IMzc2ZTqpk86i_96UFgQXrpKcfOdwLweha4JHhGA9nk-fRhRjMVKSCSZO0IAIUZVacnmKBhgTVWqm2Dm6SGmVn5JzOkCf8yUUofVND62DIvqiDt73KcS2DG3dO6izkpro7DZrqYhtsQxfywK8Dy5k065IoQku6yk2tiscNE26RGfeNgmujucQfTxP55PXcvb-8jZ5nJWOU7oticLcMeeBA5Uc6wX23tOagwWiK86FdUzWFVsAyYy2It-pAKuVrhZqUbEhejjkbrr43UPamnVI-wlsC7FPRinNtKq4zOT9vyRVBHOqdQZv_4Cr2Hdt3sIoKYiUAu-h8QFyXUypA282XVjbbmcINvs6TK7D7Oswhzqy4-4Ya5Ozje9s60L6tVVCaCJY5m4OXACA32-hK0EJ-wEq2ZL8</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>865166509</pqid></control><display><type>article</type><title>The influence of diffusion-induced dislocations on high efficiency silicon solar cells</title><source>IEEE Electronic Library (IEL)</source><creator>Cousins, P.J. ; Cotter, J.E.</creator><creatorcontrib>Cousins, P.J. ; Cotter, J.E.</creatorcontrib><description>Heavy boron and phosphorus diffusions are used in many high efficiency, monocrystalline silicon solar cell designs to form localized contact diffusions and back surface fields. It is important to cell performance that these diffusion processes do not increase bulk recombination by the introduction of lattice defects. This paper investigates the effect of boron and phosphorus misfit dislocation networks on the bulk recombination parameters, and performance of high efficiency silicon solar cells. It demonstrates that the formation of either a boron or phosphorus misfit dislocation network generates bulk asymmetric Shockley-Read-Hall recombination centers, and that these adversely affect the current-voltage curve, local ideality factor, and ultimately the performance of p-type silicon solar cells.</description><identifier>ISSN: 0018-9383</identifier><identifier>EISSN: 1557-9646</identifier><identifier>DOI: 10.1109/TED.2005.863535</identifier><identifier>CODEN: IETDAI</identifier><language>eng</language><publisher>New York, NY: IEEE</publisher><subject>Applied sciences ; Boron ; Charge carrier lifetime ; Circuit analysis ; Diffusion ; Diffusion processes ; Dislocations ; Electric, optical and optoelectronic circuits ; Electronics ; Exact sciences and technology ; losses ; Networks ; Optoelectronic devices ; Phosphorus ; Photovoltaic cells ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Silicon ; Solar cells ; Theoretical study. Circuits analysis and design</subject><ispartof>IEEE transactions on electron devices, 2006-03, Vol.53 (3), p.457-464</ispartof><rights>2006 INIST-CNRS</rights><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2006</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c422t-1804c3cfe4e26409b0fff2d4eae197445ac36d73be1fe49a5d7325ea9897b8b73</citedby><cites>FETCH-LOGICAL-c422t-1804c3cfe4e26409b0fff2d4eae197445ac36d73be1fe49a5d7325ea9897b8b73</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/1597521$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,780,784,796,27924,27925,54758</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/1597521$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=17559153$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Cousins, P.J.</creatorcontrib><creatorcontrib>Cotter, J.E.</creatorcontrib><title>The influence of diffusion-induced dislocations on high efficiency silicon solar cells</title><title>IEEE transactions on electron devices</title><addtitle>TED</addtitle><description>Heavy boron and phosphorus diffusions are used in many high efficiency, monocrystalline silicon solar cell designs to form localized contact diffusions and back surface fields. It is important to cell performance that these diffusion processes do not increase bulk recombination by the introduction of lattice defects. This paper investigates the effect of boron and phosphorus misfit dislocation networks on the bulk recombination parameters, and performance of high efficiency silicon solar cells. It demonstrates that the formation of either a boron or phosphorus misfit dislocation network generates bulk asymmetric Shockley-Read-Hall recombination centers, and that these adversely affect the current-voltage curve, local ideality factor, and ultimately the performance of p-type silicon solar cells.</description><subject>Applied sciences</subject><subject>Boron</subject><subject>Charge carrier lifetime</subject><subject>Circuit analysis</subject><subject>Diffusion</subject><subject>Diffusion processes</subject><subject>Dislocations</subject><subject>Electric, optical and optoelectronic circuits</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>losses</subject><subject>Networks</subject><subject>Optoelectronic devices</subject><subject>Phosphorus</subject><subject>Photovoltaic cells</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Silicon</subject><subject>Solar cells</subject><subject>Theoretical study. Circuits analysis and design</subject><issn>0018-9383</issn><issn>1557-9646</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2006</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNp9kUtLAzEUhYMoWKtrF24GQV1Nm_ckS6n1AQU31W1IMzc2ZTqpk86i_96UFgQXrpKcfOdwLweha4JHhGA9nk-fRhRjMVKSCSZO0IAIUZVacnmKBhgTVWqm2Dm6SGmVn5JzOkCf8yUUofVND62DIvqiDt73KcS2DG3dO6izkpro7DZrqYhtsQxfywK8Dy5k065IoQku6yk2tiscNE26RGfeNgmujucQfTxP55PXcvb-8jZ5nJWOU7oticLcMeeBA5Uc6wX23tOagwWiK86FdUzWFVsAyYy2It-pAKuVrhZqUbEhejjkbrr43UPamnVI-wlsC7FPRinNtKq4zOT9vyRVBHOqdQZv_4Cr2Hdt3sIoKYiUAu-h8QFyXUypA282XVjbbmcINvs6TK7D7Oswhzqy4-4Ya5Ozje9s60L6tVVCaCJY5m4OXACA32-hK0EJ-wEq2ZL8</recordid><startdate>20060301</startdate><enddate>20060301</enddate><creator>Cousins, P.J.</creator><creator>Cotter, J.E.</creator><general>IEEE</general><general>Institute of Electrical and Electronics Engineers</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope><scope>F28</scope><scope>FR3</scope></search><sort><creationdate>20060301</creationdate><title>The influence of diffusion-induced dislocations on high efficiency silicon solar cells</title><author>Cousins, P.J. ; Cotter, J.E.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c422t-1804c3cfe4e26409b0fff2d4eae197445ac36d73be1fe49a5d7325ea9897b8b73</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2006</creationdate><topic>Applied sciences</topic><topic>Boron</topic><topic>Charge carrier lifetime</topic><topic>Circuit analysis</topic><topic>Diffusion</topic><topic>Diffusion processes</topic><topic>Dislocations</topic><topic>Electric, optical and optoelectronic circuits</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>losses</topic><topic>Networks</topic><topic>Optoelectronic devices</topic><topic>Phosphorus</topic><topic>Photovoltaic cells</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Silicon</topic><topic>Solar cells</topic><topic>Theoretical study. Circuits analysis and design</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Cousins, P.J.</creatorcontrib><creatorcontrib>Cotter, J.E.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics &amp; Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>ANTE: Abstracts in New Technology &amp; Engineering</collection><collection>Engineering Research Database</collection><jtitle>IEEE transactions on electron devices</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Cousins, P.J.</au><au>Cotter, J.E.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>The influence of diffusion-induced dislocations on high efficiency silicon solar cells</atitle><jtitle>IEEE transactions on electron devices</jtitle><stitle>TED</stitle><date>2006-03-01</date><risdate>2006</risdate><volume>53</volume><issue>3</issue><spage>457</spage><epage>464</epage><pages>457-464</pages><issn>0018-9383</issn><eissn>1557-9646</eissn><coden>IETDAI</coden><abstract>Heavy boron and phosphorus diffusions are used in many high efficiency, monocrystalline silicon solar cell designs to form localized contact diffusions and back surface fields. It is important to cell performance that these diffusion processes do not increase bulk recombination by the introduction of lattice defects. This paper investigates the effect of boron and phosphorus misfit dislocation networks on the bulk recombination parameters, and performance of high efficiency silicon solar cells. It demonstrates that the formation of either a boron or phosphorus misfit dislocation network generates bulk asymmetric Shockley-Read-Hall recombination centers, and that these adversely affect the current-voltage curve, local ideality factor, and ultimately the performance of p-type silicon solar cells.</abstract><cop>New York, NY</cop><pub>IEEE</pub><doi>10.1109/TED.2005.863535</doi><tpages>8</tpages></addata></record>
fulltext fulltext_linktorsrc
identifier ISSN: 0018-9383
ispartof IEEE transactions on electron devices, 2006-03, Vol.53 (3), p.457-464
issn 0018-9383
1557-9646
language eng
recordid cdi_proquest_miscellaneous_889398746
source IEEE Electronic Library (IEL)
subjects Applied sciences
Boron
Charge carrier lifetime
Circuit analysis
Diffusion
Diffusion processes
Dislocations
Electric, optical and optoelectronic circuits
Electronics
Exact sciences and technology
losses
Networks
Optoelectronic devices
Phosphorus
Photovoltaic cells
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Silicon
Solar cells
Theoretical study. Circuits analysis and design
title The influence of diffusion-induced dislocations on high efficiency silicon solar cells
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-24T06%3A23%3A48IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_RIE&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=The%20influence%20of%20diffusion-induced%20dislocations%20on%20high%20efficiency%20silicon%20solar%20cells&rft.jtitle=IEEE%20transactions%20on%20electron%20devices&rft.au=Cousins,%20P.J.&rft.date=2006-03-01&rft.volume=53&rft.issue=3&rft.spage=457&rft.epage=464&rft.pages=457-464&rft.issn=0018-9383&rft.eissn=1557-9646&rft.coden=IETDAI&rft_id=info:doi/10.1109/TED.2005.863535&rft_dat=%3Cproquest_RIE%3E28104299%3C/proquest_RIE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=865166509&rft_id=info:pmid/&rft_ieee_id=1597521&rfr_iscdi=true