A Comparison between Gas and Atomized Liquid Precursor States in the Deposition of Functional Coatings by Pin Corona Plasma
This work directly compares vapour and liquid aerosol states for the deposition of perfluorocarbon coatings using an atmospheric pressure, non‐thermal equilibrium plasma jet system. The objective of the study is to evaluate how the physical state of the precursor (gas or liquid), influences the frag...
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Veröffentlicht in: | Plasma processes and polymers 2011-03, Vol.8 (3), p.230-238 |
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creator | Herbert, Peter Anthony Fry O'Neill, Liam Jaroszyńska-Wolińska, Justyna Stallard, Charlie Patrick Ramamoorthy, Amsarani Dowling, Denis Pius |
description | This work directly compares vapour and liquid aerosol states for the deposition of perfluorocarbon coatings using an atmospheric pressure, non‐thermal equilibrium plasma jet system. The objective of the study is to evaluate how the physical state of the precursor (gas or liquid), influences the fragmentation of the monomer molecules in the plasma and the subsequent coating properties. Specifically the effect of gas or liquid aerosol precursor feed on the ability to achieve a soft plasma polymerization (SPP) is assessed with a view to producing a coating that exhibits minimal fragmentation, while being well cross‐linked. The precursor (perfluoro‐1‐decene) was introduced into a helium plasma and coatings deposited at rates of up to 50 nm · min−1. The deposited coatings were examined using XPS, FTIR, contact angle and ellipsometric measurements. These indicated that a controlled polymerization reaction through the vinyl group of the monomer had taken place in the case of the gas deposited samples with only minor fragmentation of the functional perfluoro chain. Furthermore, a high level of cross‐linking was achieved and the perfluorocarbon coatings were stable to a toluene wash. In contrast, while coatings deposited using the liquid deposition technique showed good retention of monomer molecular structure, they exhibited poor stability when immersed in toluene. This is attributed to lower levels of cross‐linking of the liquid precursor in the plasma, compared with coatings deposited using the gaseous precursor technique.
This work directly compares vapour and liquid aerosol states for the deposition of perfluorocarbon coatings using an atmospheric pressure, non‐thermal equilibrium plasma jet system. The objective of the study is to evaluate how the physical state of the precursor (gas or liquid), influences the fragmentation of the monomer molecules in the plasma and the subsequent coating properties. |
doi_str_mv | 10.1002/ppap.201000119 |
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This work directly compares vapour and liquid aerosol states for the deposition of perfluorocarbon coatings using an atmospheric pressure, non‐thermal equilibrium plasma jet system. The objective of the study is to evaluate how the physical state of the precursor (gas or liquid), influences the fragmentation of the monomer molecules in the plasma and the subsequent coating properties.</description><identifier>ISSN: 1612-8850</identifier><identifier>ISSN: 1612-8869</identifier><identifier>EISSN: 1612-8869</identifier><identifier>DOI: 10.1002/ppap.201000119</identifier><language>eng</language><publisher>Weinheim: WILEY-VCH Verlag</publisher><subject>Applied sciences ; atmospheric pressure plasma ; Coatings ; Crosslinking ; Deposition ; Exact sciences and technology ; Fragmentation ; functional coatings ; gas vs. liquid precursor deposition ; Liquids ; Monomers ; non-equilibrium ; Physicochemistry of polymers ; pin corona ; Polymerization ; Polymers and radiations ; Precursors ; soft plasma polymerization</subject><ispartof>Plasma processes and polymers, 2011-03, Vol.8 (3), p.230-238</ispartof><rights>Copyright © 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim</rights><rights>2015 INIST-CNRS</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c4299-8d82e9734a2eeff8b8dfdd7cc0b0cf5cc50f198fd2d008e772e597fe4a4a52f93</citedby><cites>FETCH-LOGICAL-c4299-8d82e9734a2eeff8b8dfdd7cc0b0cf5cc50f198fd2d008e772e597fe4a4a52f93</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1002%2Fppap.201000119$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1002%2Fppap.201000119$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,780,784,1417,27924,27925,45574,45575</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=24021088$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Herbert, Peter Anthony Fry</creatorcontrib><creatorcontrib>O'Neill, Liam</creatorcontrib><creatorcontrib>Jaroszyńska-Wolińska, Justyna</creatorcontrib><creatorcontrib>Stallard, Charlie Patrick</creatorcontrib><creatorcontrib>Ramamoorthy, Amsarani</creatorcontrib><creatorcontrib>Dowling, Denis Pius</creatorcontrib><title>A Comparison between Gas and Atomized Liquid Precursor States in the Deposition of Functional Coatings by Pin Corona Plasma</title><title>Plasma processes and polymers</title><addtitle>Plasma Processes Polym</addtitle><description>This work directly compares vapour and liquid aerosol states for the deposition of perfluorocarbon coatings using an atmospheric pressure, non‐thermal equilibrium plasma jet system. The objective of the study is to evaluate how the physical state of the precursor (gas or liquid), influences the fragmentation of the monomer molecules in the plasma and the subsequent coating properties. Specifically the effect of gas or liquid aerosol precursor feed on the ability to achieve a soft plasma polymerization (SPP) is assessed with a view to producing a coating that exhibits minimal fragmentation, while being well cross‐linked. The precursor (perfluoro‐1‐decene) was introduced into a helium plasma and coatings deposited at rates of up to 50 nm · min−1. The deposited coatings were examined using XPS, FTIR, contact angle and ellipsometric measurements. These indicated that a controlled polymerization reaction through the vinyl group of the monomer had taken place in the case of the gas deposited samples with only minor fragmentation of the functional perfluoro chain. Furthermore, a high level of cross‐linking was achieved and the perfluorocarbon coatings were stable to a toluene wash. In contrast, while coatings deposited using the liquid deposition technique showed good retention of monomer molecular structure, they exhibited poor stability when immersed in toluene. This is attributed to lower levels of cross‐linking of the liquid precursor in the plasma, compared with coatings deposited using the gaseous precursor technique.
This work directly compares vapour and liquid aerosol states for the deposition of perfluorocarbon coatings using an atmospheric pressure, non‐thermal equilibrium plasma jet system. The objective of the study is to evaluate how the physical state of the precursor (gas or liquid), influences the fragmentation of the monomer molecules in the plasma and the subsequent coating properties.</description><subject>Applied sciences</subject><subject>atmospheric pressure plasma</subject><subject>Coatings</subject><subject>Crosslinking</subject><subject>Deposition</subject><subject>Exact sciences and technology</subject><subject>Fragmentation</subject><subject>functional coatings</subject><subject>gas vs. liquid precursor deposition</subject><subject>Liquids</subject><subject>Monomers</subject><subject>non-equilibrium</subject><subject>Physicochemistry of polymers</subject><subject>pin corona</subject><subject>Polymerization</subject><subject>Polymers and radiations</subject><subject>Precursors</subject><subject>soft plasma polymerization</subject><issn>1612-8850</issn><issn>1612-8869</issn><issn>1612-8869</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2011</creationdate><recordtype>article</recordtype><recordid>eNqFkE1v1DAURSMEEqVly9obxCrDi_NlL0cDnUJHJRpawc564zyDIYlT21EZ-PNkNNWIHStfWeeeJ90keZXBIgPgb8cRxwWHOUOWySfJWVZlPBWikk9PuYTnyYsQfgDkUAo4S_4s2cr1I3ob3MB2FB-IBrbGwHBo2TK63v6mlm3s_WRb1njSkw_Os88RIwVmBxa_E3tHows22lnhDLucBn3I2M1ujHb4Fthuz5oZXjk__7Omw9DjRfLMYBfo5eN7ntxdvr9dXaWbT-sPq-Um1QWXMhWt4CTrvEBOZIzYida0ba017ECbUusSTCaFaXkLIKiuOZWyNlRggSU3Mj9P3hy9o3f3E4Woehs0dR0O5KaghICqLIoKZnJxJLV3IXgyavS2R79XGajDyOowsjqNPBdeP6oxaOyMx0HbcGrxAngGQsycPHIPtqP9f6yqaZbNvzfSY9eGSL9OXfQ_VVXndam-3KzVx6_b7fWWX6t1_hf0zp8K</recordid><startdate>20110322</startdate><enddate>20110322</enddate><creator>Herbert, Peter Anthony Fry</creator><creator>O'Neill, Liam</creator><creator>Jaroszyńska-Wolińska, Justyna</creator><creator>Stallard, Charlie Patrick</creator><creator>Ramamoorthy, Amsarani</creator><creator>Dowling, Denis Pius</creator><general>WILEY-VCH Verlag</general><general>WILEY‐VCH Verlag</general><general>Wiley-VCH</general><scope>BSCLL</scope><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20110322</creationdate><title>A Comparison between Gas and Atomized Liquid Precursor States in the Deposition of Functional Coatings by Pin Corona Plasma</title><author>Herbert, Peter Anthony Fry ; O'Neill, Liam ; Jaroszyńska-Wolińska, Justyna ; Stallard, Charlie Patrick ; Ramamoorthy, Amsarani ; Dowling, Denis Pius</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c4299-8d82e9734a2eeff8b8dfdd7cc0b0cf5cc50f198fd2d008e772e597fe4a4a52f93</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2011</creationdate><topic>Applied sciences</topic><topic>atmospheric pressure plasma</topic><topic>Coatings</topic><topic>Crosslinking</topic><topic>Deposition</topic><topic>Exact sciences and technology</topic><topic>Fragmentation</topic><topic>functional coatings</topic><topic>gas vs. liquid precursor deposition</topic><topic>Liquids</topic><topic>Monomers</topic><topic>non-equilibrium</topic><topic>Physicochemistry of polymers</topic><topic>pin corona</topic><topic>Polymerization</topic><topic>Polymers and radiations</topic><topic>Precursors</topic><topic>soft plasma polymerization</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Herbert, Peter Anthony Fry</creatorcontrib><creatorcontrib>O'Neill, Liam</creatorcontrib><creatorcontrib>Jaroszyńska-Wolińska, Justyna</creatorcontrib><creatorcontrib>Stallard, Charlie Patrick</creatorcontrib><creatorcontrib>Ramamoorthy, Amsarani</creatorcontrib><creatorcontrib>Dowling, Denis Pius</creatorcontrib><collection>Istex</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Plasma processes and polymers</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Herbert, Peter Anthony Fry</au><au>O'Neill, Liam</au><au>Jaroszyńska-Wolińska, Justyna</au><au>Stallard, Charlie Patrick</au><au>Ramamoorthy, Amsarani</au><au>Dowling, Denis Pius</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>A Comparison between Gas and Atomized Liquid Precursor States in the Deposition of Functional Coatings by Pin Corona Plasma</atitle><jtitle>Plasma processes and polymers</jtitle><addtitle>Plasma Processes Polym</addtitle><date>2011-03-22</date><risdate>2011</risdate><volume>8</volume><issue>3</issue><spage>230</spage><epage>238</epage><pages>230-238</pages><issn>1612-8850</issn><issn>1612-8869</issn><eissn>1612-8869</eissn><abstract>This work directly compares vapour and liquid aerosol states for the deposition of perfluorocarbon coatings using an atmospheric pressure, non‐thermal equilibrium plasma jet system. The objective of the study is to evaluate how the physical state of the precursor (gas or liquid), influences the fragmentation of the monomer molecules in the plasma and the subsequent coating properties. Specifically the effect of gas or liquid aerosol precursor feed on the ability to achieve a soft plasma polymerization (SPP) is assessed with a view to producing a coating that exhibits minimal fragmentation, while being well cross‐linked. The precursor (perfluoro‐1‐decene) was introduced into a helium plasma and coatings deposited at rates of up to 50 nm · min−1. The deposited coatings were examined using XPS, FTIR, contact angle and ellipsometric measurements. These indicated that a controlled polymerization reaction through the vinyl group of the monomer had taken place in the case of the gas deposited samples with only minor fragmentation of the functional perfluoro chain. Furthermore, a high level of cross‐linking was achieved and the perfluorocarbon coatings were stable to a toluene wash. In contrast, while coatings deposited using the liquid deposition technique showed good retention of monomer molecular structure, they exhibited poor stability when immersed in toluene. This is attributed to lower levels of cross‐linking of the liquid precursor in the plasma, compared with coatings deposited using the gaseous precursor technique.
This work directly compares vapour and liquid aerosol states for the deposition of perfluorocarbon coatings using an atmospheric pressure, non‐thermal equilibrium plasma jet system. The objective of the study is to evaluate how the physical state of the precursor (gas or liquid), influences the fragmentation of the monomer molecules in the plasma and the subsequent coating properties.</abstract><cop>Weinheim</cop><pub>WILEY-VCH Verlag</pub><doi>10.1002/ppap.201000119</doi><tpages>9</tpages><oa>free_for_read</oa></addata></record> |
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subjects | Applied sciences atmospheric pressure plasma Coatings Crosslinking Deposition Exact sciences and technology Fragmentation functional coatings gas vs. liquid precursor deposition Liquids Monomers non-equilibrium Physicochemistry of polymers pin corona Polymerization Polymers and radiations Precursors soft plasma polymerization |
title | A Comparison between Gas and Atomized Liquid Precursor States in the Deposition of Functional Coatings by Pin Corona Plasma |
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