Ablation of microstructures applying diffractive elements and UV femtosecond laser pulses
A new method for simple and economic fabrication of diffractive optical elements (DOEs) with three and four phase levels, by UV nanosecond (ns) laser ablation is presented. The technique is based on the combination of two sequentially generated complementary 2-level phase elements. During the fabric...
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Veröffentlicht in: | Applied physics. A, Materials science & processing Materials science & processing, 2010-11, Vol.101 (2), p.225-229 |
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description | A new method for simple and economic fabrication of diffractive optical elements (DOEs) with three and four phase levels, by UV nanosecond (ns) laser ablation is presented. The technique is based on the combination of two sequentially generated complementary 2-level phase elements. During the fabrication, complete ablative removal of a highly absorbing silicon suboxide layer by pixelated backside illumination ensures the necessary high precision and optical quality. Full functionality of the new DOEs is demonstrated by fabricating micro-structures using UV femtosecond pulses. |
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Full functionality of the new DOEs is demonstrated by fabricating micro-structures using UV femtosecond pulses.</description><subject>Ablation</subject><subject>Characterization and Evaluation of Materials</subject><subject>Condensed Matter Physics</subject><subject>Diffraction</subject><subject>Economics</subject><subject>Femtosecond</subject><subject>Lasers</subject><subject>Machines</subject><subject>Manufacturing</subject><subject>Nanocomposites</subject><subject>Nanomaterials</subject><subject>Nanostructure</subject><subject>Nanotechnology</subject><subject>Optical and Electronic Materials</subject><subject>Physics</subject><subject>Physics and Astronomy</subject><subject>Processes</subject><subject>Surfaces and Interfaces</subject><subject>Thin Films</subject><issn>0947-8396</issn><issn>1432-0630</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><sourceid>C6C</sourceid><recordid>eNp9kE1LxDAQhoMouK7-AG-5eapOkjadHpfFL1jw4gqeQpImS5d-mbSC_94s9excZoZ534H3IeSWwT0DKB8igBBVBgyyAnme4RlZsVzwDKSAc7KCKi8zFJW8JFcxHiFVzvmKfG5Mq6dm6OngadfYMMQpzHaag4tUj2P70_QHWjfeB22n5ttR17rO9VO69jXdf1DvummIzg5pbXV0gY5zG128Jhdep-Hmr6_J_unxffuS7d6eX7ebXWaFFFOGttKFFwjMIZbeW8C6YJiD4RprUxmsS-mhsLkujDSu5oYxyasKa18INGJN7pa_Yxi-Zhcn1TXRurbVvRvmqBBBFrxAmZRsUZ5SxuC8GkPT6fCjGKgTRbVQVImiOlFUmDx88cSk7Q8uqOMwhz4F-sf0C_-hdqg</recordid><startdate>20101101</startdate><enddate>20101101</enddate><creator>Kaakkunen, J. 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J.</au><au>Bekesi, J.</au><au>Ihlemann, J.</au><au>Simon, P.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Ablation of microstructures applying diffractive elements and UV femtosecond laser pulses</atitle><jtitle>Applied physics. A, Materials science & processing</jtitle><stitle>Appl. Phys. A</stitle><date>2010-11-01</date><risdate>2010</risdate><volume>101</volume><issue>2</issue><spage>225</spage><epage>229</epage><pages>225-229</pages><issn>0947-8396</issn><eissn>1432-0630</eissn><abstract>A new method for simple and economic fabrication of diffractive optical elements (DOEs) with three and four phase levels, by UV nanosecond (ns) laser ablation is presented. The technique is based on the combination of two sequentially generated complementary 2-level phase elements. 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subjects | Ablation Characterization and Evaluation of Materials Condensed Matter Physics Diffraction Economics Femtosecond Lasers Machines Manufacturing Nanocomposites Nanomaterials Nanostructure Nanotechnology Optical and Electronic Materials Physics Physics and Astronomy Processes Surfaces and Interfaces Thin Films |
title | Ablation of microstructures applying diffractive elements and UV femtosecond laser pulses |
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