Ablation of microstructures applying diffractive elements and UV femtosecond laser pulses

A new method for simple and economic fabrication of diffractive optical elements (DOEs) with three and four phase levels, by UV nanosecond (ns) laser ablation is presented. The technique is based on the combination of two sequentially generated complementary 2-level phase elements. During the fabric...

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Veröffentlicht in:Applied physics. A, Materials science & processing Materials science & processing, 2010-11, Vol.101 (2), p.225-229
Hauptverfasser: Kaakkunen, J. J. J., Bekesi, J., Ihlemann, J., Simon, P.
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Bekesi, J.
Ihlemann, J.
Simon, P.
description A new method for simple and economic fabrication of diffractive optical elements (DOEs) with three and four phase levels, by UV nanosecond (ns) laser ablation is presented. The technique is based on the combination of two sequentially generated complementary 2-level phase elements. During the fabrication, complete ablative removal of a highly absorbing silicon suboxide layer by pixelated backside illumination ensures the necessary high precision and optical quality. Full functionality of the new DOEs is demonstrated by fabricating micro-structures using UV femtosecond pulses.
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_880652586</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>880652586</sourcerecordid><originalsourceid>FETCH-LOGICAL-c363t-8c9a5f3801e887ffc08d51840b2a8db9b8d76f05c4a5b6bed2b1162998df538b3</originalsourceid><addsrcrecordid>eNp9kE1LxDAQhoMouK7-AG-5eapOkjadHpfFL1jw4gqeQpImS5d-mbSC_94s9excZoZ534H3IeSWwT0DKB8igBBVBgyyAnme4RlZsVzwDKSAc7KCKi8zFJW8JFcxHiFVzvmKfG5Mq6dm6OngadfYMMQpzHaag4tUj2P70_QHWjfeB22n5ttR17rO9VO69jXdf1DvummIzg5pbXV0gY5zG128Jhdep-Hmr6_J_unxffuS7d6eX7ebXWaFFFOGttKFFwjMIZbeW8C6YJiD4RprUxmsS-mhsLkujDSu5oYxyasKa18INGJN7pa_Yxi-Zhcn1TXRurbVvRvmqBBBFrxAmZRsUZ5SxuC8GkPT6fCjGKgTRbVQVImiOlFUmDx88cSk7Q8uqOMwhz4F-sf0C_-hdqg</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>880652586</pqid></control><display><type>article</type><title>Ablation of microstructures applying diffractive elements and UV femtosecond laser pulses</title><source>Springer Nature - Complete Springer Journals</source><creator>Kaakkunen, J. J. J. ; Bekesi, J. ; Ihlemann, J. ; Simon, P.</creator><creatorcontrib>Kaakkunen, J. J. J. ; Bekesi, J. ; Ihlemann, J. ; Simon, P.</creatorcontrib><description>A new method for simple and economic fabrication of diffractive optical elements (DOEs) with three and four phase levels, by UV nanosecond (ns) laser ablation is presented. The technique is based on the combination of two sequentially generated complementary 2-level phase elements. During the fabrication, complete ablative removal of a highly absorbing silicon suboxide layer by pixelated backside illumination ensures the necessary high precision and optical quality. Full functionality of the new DOEs is demonstrated by fabricating micro-structures using UV femtosecond pulses.</description><identifier>ISSN: 0947-8396</identifier><identifier>EISSN: 1432-0630</identifier><identifier>DOI: 10.1007/s00339-010-5824-8</identifier><language>eng</language><publisher>Berlin/Heidelberg: Springer-Verlag</publisher><subject>Ablation ; Characterization and Evaluation of Materials ; Condensed Matter Physics ; Diffraction ; Economics ; Femtosecond ; Lasers ; Machines ; Manufacturing ; Nanocomposites ; Nanomaterials ; Nanostructure ; Nanotechnology ; Optical and Electronic Materials ; Physics ; Physics and Astronomy ; Processes ; Surfaces and Interfaces ; Thin Films</subject><ispartof>Applied physics. A, Materials science &amp; processing, 2010-11, Vol.101 (2), p.225-229</ispartof><rights>Springer-Verlag 2010</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c363t-8c9a5f3801e887ffc08d51840b2a8db9b8d76f05c4a5b6bed2b1162998df538b3</citedby><cites>FETCH-LOGICAL-c363t-8c9a5f3801e887ffc08d51840b2a8db9b8d76f05c4a5b6bed2b1162998df538b3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1007/s00339-010-5824-8$$EPDF$$P50$$Gspringer$$Hfree_for_read</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1007/s00339-010-5824-8$$EHTML$$P50$$Gspringer$$Hfree_for_read</linktohtml><link.rule.ids>314,776,780,27903,27904,41467,42536,51297</link.rule.ids></links><search><creatorcontrib>Kaakkunen, J. J. J.</creatorcontrib><creatorcontrib>Bekesi, J.</creatorcontrib><creatorcontrib>Ihlemann, J.</creatorcontrib><creatorcontrib>Simon, P.</creatorcontrib><title>Ablation of microstructures applying diffractive elements and UV femtosecond laser pulses</title><title>Applied physics. A, Materials science &amp; processing</title><addtitle>Appl. Phys. A</addtitle><description>A new method for simple and economic fabrication of diffractive optical elements (DOEs) with three and four phase levels, by UV nanosecond (ns) laser ablation is presented. The technique is based on the combination of two sequentially generated complementary 2-level phase elements. During the fabrication, complete ablative removal of a highly absorbing silicon suboxide layer by pixelated backside illumination ensures the necessary high precision and optical quality. Full functionality of the new DOEs is demonstrated by fabricating micro-structures using UV femtosecond pulses.</description><subject>Ablation</subject><subject>Characterization and Evaluation of Materials</subject><subject>Condensed Matter Physics</subject><subject>Diffraction</subject><subject>Economics</subject><subject>Femtosecond</subject><subject>Lasers</subject><subject>Machines</subject><subject>Manufacturing</subject><subject>Nanocomposites</subject><subject>Nanomaterials</subject><subject>Nanostructure</subject><subject>Nanotechnology</subject><subject>Optical and Electronic Materials</subject><subject>Physics</subject><subject>Physics and Astronomy</subject><subject>Processes</subject><subject>Surfaces and Interfaces</subject><subject>Thin Films</subject><issn>0947-8396</issn><issn>1432-0630</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><sourceid>C6C</sourceid><recordid>eNp9kE1LxDAQhoMouK7-AG-5eapOkjadHpfFL1jw4gqeQpImS5d-mbSC_94s9excZoZ534H3IeSWwT0DKB8igBBVBgyyAnme4RlZsVzwDKSAc7KCKi8zFJW8JFcxHiFVzvmKfG5Mq6dm6OngadfYMMQpzHaag4tUj2P70_QHWjfeB22n5ttR17rO9VO69jXdf1DvummIzg5pbXV0gY5zG128Jhdep-Hmr6_J_unxffuS7d6eX7ebXWaFFFOGttKFFwjMIZbeW8C6YJiD4RprUxmsS-mhsLkujDSu5oYxyasKa18INGJN7pa_Yxi-Zhcn1TXRurbVvRvmqBBBFrxAmZRsUZ5SxuC8GkPT6fCjGKgTRbVQVImiOlFUmDx88cSk7Q8uqOMwhz4F-sf0C_-hdqg</recordid><startdate>20101101</startdate><enddate>20101101</enddate><creator>Kaakkunen, J. J. J.</creator><creator>Bekesi, J.</creator><creator>Ihlemann, J.</creator><creator>Simon, P.</creator><general>Springer-Verlag</general><scope>C6C</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>H8D</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20101101</creationdate><title>Ablation of microstructures applying diffractive elements and UV femtosecond laser pulses</title><author>Kaakkunen, J. J. J. ; Bekesi, J. ; Ihlemann, J. ; Simon, P.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c363t-8c9a5f3801e887ffc08d51840b2a8db9b8d76f05c4a5b6bed2b1162998df538b3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2010</creationdate><topic>Ablation</topic><topic>Characterization and Evaluation of Materials</topic><topic>Condensed Matter Physics</topic><topic>Diffraction</topic><topic>Economics</topic><topic>Femtosecond</topic><topic>Lasers</topic><topic>Machines</topic><topic>Manufacturing</topic><topic>Nanocomposites</topic><topic>Nanomaterials</topic><topic>Nanostructure</topic><topic>Nanotechnology</topic><topic>Optical and Electronic Materials</topic><topic>Physics</topic><topic>Physics and Astronomy</topic><topic>Processes</topic><topic>Surfaces and Interfaces</topic><topic>Thin Films</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kaakkunen, J. J. J.</creatorcontrib><creatorcontrib>Bekesi, J.</creatorcontrib><creatorcontrib>Ihlemann, J.</creatorcontrib><creatorcontrib>Simon, P.</creatorcontrib><collection>Springer Nature OA Free Journals</collection><collection>CrossRef</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Applied physics. A, Materials science &amp; processing</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kaakkunen, J. J. J.</au><au>Bekesi, J.</au><au>Ihlemann, J.</au><au>Simon, P.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Ablation of microstructures applying diffractive elements and UV femtosecond laser pulses</atitle><jtitle>Applied physics. A, Materials science &amp; processing</jtitle><stitle>Appl. Phys. A</stitle><date>2010-11-01</date><risdate>2010</risdate><volume>101</volume><issue>2</issue><spage>225</spage><epage>229</epage><pages>225-229</pages><issn>0947-8396</issn><eissn>1432-0630</eissn><abstract>A new method for simple and economic fabrication of diffractive optical elements (DOEs) with three and four phase levels, by UV nanosecond (ns) laser ablation is presented. The technique is based on the combination of two sequentially generated complementary 2-level phase elements. During the fabrication, complete ablative removal of a highly absorbing silicon suboxide layer by pixelated backside illumination ensures the necessary high precision and optical quality. Full functionality of the new DOEs is demonstrated by fabricating micro-structures using UV femtosecond pulses.</abstract><cop>Berlin/Heidelberg</cop><pub>Springer-Verlag</pub><doi>10.1007/s00339-010-5824-8</doi><tpages>5</tpages><oa>free_for_read</oa></addata></record>
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subjects Ablation
Characterization and Evaluation of Materials
Condensed Matter Physics
Diffraction
Economics
Femtosecond
Lasers
Machines
Manufacturing
Nanocomposites
Nanomaterials
Nanostructure
Nanotechnology
Optical and Electronic Materials
Physics
Physics and Astronomy
Processes
Surfaces and Interfaces
Thin Films
title Ablation of microstructures applying diffractive elements and UV femtosecond laser pulses
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-24T00%3A26%3A54IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Ablation%20of%20microstructures%20applying%20diffractive%20elements%20and%20UV%20femtosecond%20laser%20pulses&rft.jtitle=Applied%20physics.%20A,%20Materials%20science%20&%20processing&rft.au=Kaakkunen,%20J.%20J.%20J.&rft.date=2010-11-01&rft.volume=101&rft.issue=2&rft.spage=225&rft.epage=229&rft.pages=225-229&rft.issn=0947-8396&rft.eissn=1432-0630&rft_id=info:doi/10.1007/s00339-010-5824-8&rft_dat=%3Cproquest_cross%3E880652586%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=880652586&rft_id=info:pmid/&rfr_iscdi=true