High resolution patterning of sapphire by F2-laser ablation

The ablation behavior of single crystalline sapphire with nanosecond laser pulses at 157 nm wavelength is investigated. Ablation rates of about 10 to 100 nm/pulse are obtained at fluences ranging from 1 to 9 J/cm 2 . At moderate fluences, incubation behavior is observed, i.e. ablation starts after m...

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Veröffentlicht in:	Applied physics. A, Materials science & processing Materials science & processing, 2011-04, Vol.103 (1), p.51-58
Hauptverfasser:	Wiesner, Markus, Ihlemann, Jürgen
Format:	Artikel
Sprache:	eng
Schlagworte:	Ablation Characterization and Evaluation of Materials Condensed Matter Physics Cross-disciplinary physics: materials science rheology Diffraction gratings Exact sciences and technology Fundamental areas of phenomenology (including applications) Gratings (spectra) High resolution Lasers Machines Manufacturing Materials science Nanostructure Nanotechnology Optical and Electronic Materials Optical elements, devices, and systems Optics Physics Physics and Astronomy Processes Sapphire Surface treatments Surfaces and Interfaces Thin Films
Online-Zugang:	Volltext
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