A Comprehensive Study of the Corner Effects in Pi-Gate MOSFETs Including Quantum Effects

In this paper, simulation-based research on the electrostatics of Pi-gate silicon-on-insulator (SOI) MOSFETs is carried out. To do so, a 2-D self-consistent Schrodinger-Poisson solver has been implemented. The inclusion of the quantum effects has been demonstrated to be necessary for the accurate si...

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Veröffentlicht in:IEEE transactions on electron devices 2007-12, Vol.54 (12), p.3369-3377
Hauptverfasser: Garcia Ruiz, F.J., Godoy, A., Gamiz, F., Sampedro, C., Donetti, L.
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container_end_page 3377
container_issue 12
container_start_page 3369
container_title IEEE transactions on electron devices
container_volume 54
creator Garcia Ruiz, F.J.
Godoy, A.
Gamiz, F.
Sampedro, C.
Donetti, L.
description In this paper, simulation-based research on the electrostatics of Pi-gate silicon-on-insulator (SOI) MOSFETs is carried out. To do so, a 2-D self-consistent Schrodinger-Poisson solver has been implemented. The inclusion of the quantum effects has been demonstrated to be necessary for the accurate simulation of these devices in the nanometer range. Specifically, this paper is focused on the corner effects in multiple-gate SOI MOSFETs, defined as the formation of independent channels with different threshold voltages. Corner effects are studied as a function of different parameters, such as the doping density, silicon-fin dimensions, corner rounding, and gate oxide thickness. Finally, the relation between corner effects and the transition from a fully to a partially depleted body is analyzed.
doi_str_mv 10.1109/TED.2007.909206
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fullrecord <record><control><sourceid>proquest_RIE</sourceid><recordid>TN_cdi_proquest_miscellaneous_875089462</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>4383047</ieee_id><sourcerecordid>2332015221</sourcerecordid><originalsourceid>FETCH-LOGICAL-c449t-e34d65e4ac15a05b915d72edf3098b255d45a962a206aadc7db367e1822afa7b3</originalsourceid><addsrcrecordid>eNqFkT1LA0EQhhdRMH7UFjaLhVaX7PftliFGDUSiJILdsrmbMxeSu7h7J-TfuyFqYaHVMMzzDjM8CF1Q0qWUmN5seNtlhKRdQwwj6gB1qJRpYpRQh6hDCNWJ4Zofo5MQlrFVQrAOeu3jQb3eeFhAFcoPwNOmzbe4LnCzgDjyFXg8LArImoDLCj-Vyb1rAD9OpnfDWcCjKlu1eVm94efWVU27_obP0FHhVgHOv-opeomBwUMyntyPBv1xkglhmgS4yJUE4TIqHZFzQ2WeMsgLToyeMylzIZ1RzMWXnMuzNJ9zlQLVjLnCpXN-im72eze-fm8hNHZdhgxWK1dB3QZrCFfMcKn_JXUqiTZCsUhe_0lywU08lEbw6he4rFtfxX-tVlwTxsVuW28PZb4OwUNhN75cO7-1lNidOhvV2Z06u1cXE5f7RAkAP7SI9ohI-Se-Z5JT</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>863802342</pqid></control><display><type>article</type><title>A Comprehensive Study of the Corner Effects in Pi-Gate MOSFETs Including Quantum Effects</title><source>IEEE Electronic Library (IEL)</source><creator>Garcia Ruiz, F.J. ; Godoy, A. ; Gamiz, F. ; Sampedro, C. ; Donetti, L.</creator><creatorcontrib>Garcia Ruiz, F.J. ; Godoy, A. ; Gamiz, F. ; Sampedro, C. ; Donetti, L.</creatorcontrib><description>In this paper, simulation-based research on the electrostatics of Pi-gate silicon-on-insulator (SOI) MOSFETs is carried out. To do so, a 2-D self-consistent Schrodinger-Poisson solver has been implemented. The inclusion of the quantum effects has been demonstrated to be necessary for the accurate simulation of these devices in the nanometer range. Specifically, this paper is focused on the corner effects in multiple-gate SOI MOSFETs, defined as the formation of independent channels with different threshold voltages. Corner effects are studied as a function of different parameters, such as the doping density, silicon-fin dimensions, corner rounding, and gate oxide thickness. Finally, the relation between corner effects and the transition from a fully to a partially depleted body is analyzed.</description><identifier>ISSN: 0018-9383</identifier><identifier>EISSN: 1557-9646</identifier><identifier>DOI: 10.1109/TED.2007.909206</identifier><identifier>CODEN: IETDAI</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>Channels ; Corner effects ; Corners ; Density ; Devices ; MOSFET ; MOSFETs ; multiple-gate (MuG) MOSFETs ; Oxides ; Quantum effects ; Semiconductor devices ; semiconductor-device modeling ; Silicon-on-insulator ; silicon-on-insulator (SOI) technology ; Simulation ; Solvers</subject><ispartof>IEEE transactions on electron devices, 2007-12, Vol.54 (12), p.3369-3377</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2007</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c449t-e34d65e4ac15a05b915d72edf3098b255d45a962a206aadc7db367e1822afa7b3</citedby><cites>FETCH-LOGICAL-c449t-e34d65e4ac15a05b915d72edf3098b255d45a962a206aadc7db367e1822afa7b3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/4383047$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,776,780,792,27901,27902,54733</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/4383047$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Garcia Ruiz, F.J.</creatorcontrib><creatorcontrib>Godoy, A.</creatorcontrib><creatorcontrib>Gamiz, F.</creatorcontrib><creatorcontrib>Sampedro, C.</creatorcontrib><creatorcontrib>Donetti, L.</creatorcontrib><title>A Comprehensive Study of the Corner Effects in Pi-Gate MOSFETs Including Quantum Effects</title><title>IEEE transactions on electron devices</title><addtitle>TED</addtitle><description>In this paper, simulation-based research on the electrostatics of Pi-gate silicon-on-insulator (SOI) MOSFETs is carried out. To do so, a 2-D self-consistent Schrodinger-Poisson solver has been implemented. The inclusion of the quantum effects has been demonstrated to be necessary for the accurate simulation of these devices in the nanometer range. Specifically, this paper is focused on the corner effects in multiple-gate SOI MOSFETs, defined as the formation of independent channels with different threshold voltages. Corner effects are studied as a function of different parameters, such as the doping density, silicon-fin dimensions, corner rounding, and gate oxide thickness. Finally, the relation between corner effects and the transition from a fully to a partially depleted body is analyzed.</description><subject>Channels</subject><subject>Corner effects</subject><subject>Corners</subject><subject>Density</subject><subject>Devices</subject><subject>MOSFET</subject><subject>MOSFETs</subject><subject>multiple-gate (MuG) MOSFETs</subject><subject>Oxides</subject><subject>Quantum effects</subject><subject>Semiconductor devices</subject><subject>semiconductor-device modeling</subject><subject>Silicon-on-insulator</subject><subject>silicon-on-insulator (SOI) technology</subject><subject>Simulation</subject><subject>Solvers</subject><issn>0018-9383</issn><issn>1557-9646</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2007</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNqFkT1LA0EQhhdRMH7UFjaLhVaX7PftliFGDUSiJILdsrmbMxeSu7h7J-TfuyFqYaHVMMzzDjM8CF1Q0qWUmN5seNtlhKRdQwwj6gB1qJRpYpRQh6hDCNWJ4Zofo5MQlrFVQrAOeu3jQb3eeFhAFcoPwNOmzbe4LnCzgDjyFXg8LArImoDLCj-Vyb1rAD9OpnfDWcCjKlu1eVm94efWVU27_obP0FHhVgHOv-opeomBwUMyntyPBv1xkglhmgS4yJUE4TIqHZFzQ2WeMsgLToyeMylzIZ1RzMWXnMuzNJ9zlQLVjLnCpXN-im72eze-fm8hNHZdhgxWK1dB3QZrCFfMcKn_JXUqiTZCsUhe_0lywU08lEbw6he4rFtfxX-tVlwTxsVuW28PZb4OwUNhN75cO7-1lNidOhvV2Z06u1cXE5f7RAkAP7SI9ohI-Se-Z5JT</recordid><startdate>20071201</startdate><enddate>20071201</enddate><creator>Garcia Ruiz, F.J.</creator><creator>Godoy, A.</creator><creator>Gamiz, F.</creator><creator>Sampedro, C.</creator><creator>Donetti, L.</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope><scope>F28</scope><scope>FR3</scope></search><sort><creationdate>20071201</creationdate><title>A Comprehensive Study of the Corner Effects in Pi-Gate MOSFETs Including Quantum Effects</title><author>Garcia Ruiz, F.J. ; Godoy, A. ; Gamiz, F. ; Sampedro, C. ; Donetti, L.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c449t-e34d65e4ac15a05b915d72edf3098b255d45a962a206aadc7db367e1822afa7b3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2007</creationdate><topic>Channels</topic><topic>Corner effects</topic><topic>Corners</topic><topic>Density</topic><topic>Devices</topic><topic>MOSFET</topic><topic>MOSFETs</topic><topic>multiple-gate (MuG) MOSFETs</topic><topic>Oxides</topic><topic>Quantum effects</topic><topic>Semiconductor devices</topic><topic>semiconductor-device modeling</topic><topic>Silicon-on-insulator</topic><topic>silicon-on-insulator (SOI) technology</topic><topic>Simulation</topic><topic>Solvers</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Garcia Ruiz, F.J.</creatorcontrib><creatorcontrib>Godoy, A.</creatorcontrib><creatorcontrib>Gamiz, F.</creatorcontrib><creatorcontrib>Sampedro, C.</creatorcontrib><creatorcontrib>Donetti, L.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>CrossRef</collection><collection>Electronics &amp; Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>ANTE: Abstracts in New Technology &amp; Engineering</collection><collection>Engineering Research Database</collection><jtitle>IEEE transactions on electron devices</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Garcia Ruiz, F.J.</au><au>Godoy, A.</au><au>Gamiz, F.</au><au>Sampedro, C.</au><au>Donetti, L.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>A Comprehensive Study of the Corner Effects in Pi-Gate MOSFETs Including Quantum Effects</atitle><jtitle>IEEE transactions on electron devices</jtitle><stitle>TED</stitle><date>2007-12-01</date><risdate>2007</risdate><volume>54</volume><issue>12</issue><spage>3369</spage><epage>3377</epage><pages>3369-3377</pages><issn>0018-9383</issn><eissn>1557-9646</eissn><coden>IETDAI</coden><abstract>In this paper, simulation-based research on the electrostatics of Pi-gate silicon-on-insulator (SOI) MOSFETs is carried out. To do so, a 2-D self-consistent Schrodinger-Poisson solver has been implemented. The inclusion of the quantum effects has been demonstrated to be necessary for the accurate simulation of these devices in the nanometer range. Specifically, this paper is focused on the corner effects in multiple-gate SOI MOSFETs, defined as the formation of independent channels with different threshold voltages. Corner effects are studied as a function of different parameters, such as the doping density, silicon-fin dimensions, corner rounding, and gate oxide thickness. Finally, the relation between corner effects and the transition from a fully to a partially depleted body is analyzed.</abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/TED.2007.909206</doi><tpages>9</tpages></addata></record>
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subjects Channels
Corner effects
Corners
Density
Devices
MOSFET
MOSFETs
multiple-gate (MuG) MOSFETs
Oxides
Quantum effects
Semiconductor devices
semiconductor-device modeling
Silicon-on-insulator
silicon-on-insulator (SOI) technology
Simulation
Solvers
title A Comprehensive Study of the Corner Effects in Pi-Gate MOSFETs Including Quantum Effects
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-05T07%3A47%3A36IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_RIE&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=A%20Comprehensive%20Study%20of%20the%20Corner%20Effects%20in%20Pi-Gate%20MOSFETs%20Including%20Quantum%20Effects&rft.jtitle=IEEE%20transactions%20on%20electron%20devices&rft.au=Garcia%20Ruiz,%20F.J.&rft.date=2007-12-01&rft.volume=54&rft.issue=12&rft.spage=3369&rft.epage=3377&rft.pages=3369-3377&rft.issn=0018-9383&rft.eissn=1557-9646&rft.coden=IETDAI&rft_id=info:doi/10.1109/TED.2007.909206&rft_dat=%3Cproquest_RIE%3E2332015221%3C/proquest_RIE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=863802342&rft_id=info:pmid/&rft_ieee_id=4383047&rfr_iscdi=true