Simulation and Design of AlGaAs/InGaAs CCDs Based on pHEMT Technology

This paper describes the modeling, design, and fabrication of quarter-micrometer double delta-doped AlGaAs/InGaAs charge-coupled devices (CCDs) whose epitaxial layers and geometry were based around the device structure of commercial pHEMTs. A quasi-2-D physical model has been developed to investigat...

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Veröffentlicht in:IEEE transactions on electron devices 2007-07, Vol.54 (7), p.1597-1604
Hauptverfasser: Tan, Hiang Teik, Hunter, Ian C., Snowden, Christopher M.
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Hunter, Ian C.
Snowden, Christopher M.
description This paper describes the modeling, design, and fabrication of quarter-micrometer double delta-doped AlGaAs/InGaAs charge-coupled devices (CCDs) whose epitaxial layers and geometry were based around the device structure of commercial pHEMTs. A quasi-2-D physical model has been developed to investigate the properties of this novel 2-D electron gas CCD. This physical model allows the characteristics of the InGaAs transport channel as well as the dc characteristics of the device to be predicted within a reasonable amount of time. This model also shows how "individual" charge packets can be controllably transferred through the device when appropriate clocking voltages are applied to the gates of the CCD. This capacitive gate structure device is then shown to be successfully fabricated using established GaAs heterostructure fabrication techniques to ensure good repeatability. The dc characteristics of the fabricated CCD delay line are included.
doi_str_mv 10.1109/TED.2007.898459
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A quasi-2-D physical model has been developed to investigate the properties of this novel 2-D electron gas CCD. This physical model allows the characteristics of the InGaAs transport channel as well as the dc characteristics of the device to be predicted within a reasonable amount of time. This model also shows how "individual" charge packets can be controllably transferred through the device when appropriate clocking voltages are applied to the gates of the CCD. This capacitive gate structure device is then shown to be successfully fabricated using established GaAs heterostructure fabrication techniques to ensure good repeatability. 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Solid state devices</topic><topic>Semiconductor process modeling</topic><topic>simulated charge transfer</topic><topic>Transistors</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Tan, Hiang Teik</creatorcontrib><creatorcontrib>Hunter, Ian C.</creatorcontrib><creatorcontrib>Snowden, Christopher M.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Xplore</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics &amp; Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Aluminium Industry Abstracts</collection><collection>Ceramic Abstracts</collection><collection>ANTE: Abstracts in New Technology &amp; Engineering</collection><collection>Engineering Research Database</collection><collection>Materials Research Database</collection><jtitle>IEEE transactions on electron devices</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Tan, Hiang Teik</au><au>Hunter, Ian C.</au><au>Snowden, Christopher M.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Simulation and Design of AlGaAs/InGaAs CCDs Based on pHEMT Technology</atitle><jtitle>IEEE transactions on electron devices</jtitle><stitle>TED</stitle><date>2007-07-01</date><risdate>2007</risdate><volume>54</volume><issue>7</issue><spage>1597</spage><epage>1604</epage><pages>1597-1604</pages><issn>0018-9383</issn><eissn>1557-9646</eissn><coden>IETDAI</coden><abstract>This paper describes the modeling, design, and fabrication of quarter-micrometer double delta-doped AlGaAs/InGaAs charge-coupled devices (CCDs) whose epitaxial layers and geometry were based around the device structure of commercial pHEMTs. 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subjects 2-D electron gas charge-coupled device (2DEG-CCDs)
Aluminum gallium arsenides
Applied sciences
Charge coupled devices
Charge transfer
Charge transfer devices
Circuit properties
Circuits of signal characteristics conditioning (including delay circuits)
Compound structure devices
Delay line
Devices
Direct current
Electric potential
Electric, optical and optoelectronic circuits
Electronic circuits
Electronics
Exact sciences and technology
Gallium arsenide
Gates
Indium gallium arsenides
Logic gates
Mathematical model
Mathematical models
PHEMTs
quasi-2-D physical modeling
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Semiconductor process modeling
simulated charge transfer
Transistors
title Simulation and Design of AlGaAs/InGaAs CCDs Based on pHEMT Technology
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