Ellipsometric study of nanostructured carbon films deposited by pulsed laser deposition

When depositing carbon films by plasma processes the resulting structure and bonding nature strongly depends on the plasma energy and background gas pressure. To produce different energy plasma, glassy carbon targets were ablated by laser pulses of different excimer lasers: KrF (248nm) and ArF (193n...

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Veröffentlicht in:	Thin solid films 2011-02, Vol.519 (9), p.2989-2993
Hauptverfasser:	Bereznai, M., Budai, J., Hanyecz, I., Kopniczky, J., Veres, M., Koós, M., Toth, Z.
Format:	Artikel
Sprache:	eng
Schlagworte:	Argon Bonding Carbon Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Deposition Ellipsometry Exact sciences and technology Laser deposition Lasers Materials science Methods of deposition of films and coatings film growth and epitaxy Nanoporous Nanoscale materials and structures: fabrication and characterization Nanostructure Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Optical properties of specific thin films Other topics in nanoscale materials and structures Physics Plumes Pulsed laser deposition Spectroscopic ellipsometry Structure and morphology thickness Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film Thin film structure and morphology
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