Optimization of parameters for deposition of Ga-doped ZnO films by DC reactive magnetron sputtering using Taguchi method

► ZnO:Ga thin films are prepared by DC reactive magnetron sputtering. ► The Taguchi method is applied to find the optimal growth conditions. ► ZnO:Ga films have acceptable structural, electrical, and optical properties. Ga-doped ZnO (ZnO:Ga) transparent conductive films were deposited on glass subst...

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Veröffentlicht in:	Applied surface science 2011-05, Vol.257 (14), p.6125-6128
Hauptverfasser:	Bie, Xun, Lu, Jianguo, Wang, Yuping, Gong, Li, Ma, Quanbao, Ye, Zhizhen
Format:	Artikel
Sprache:	eng
Schlagworte:	Argon Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Deposition Direct current Electrical properties Exact sciences and technology Magnetron sputtering Optimization Partial pressure Physics Taguchi method Taguchi methods Transparent conductive films Zinc oxide ZnO:Ga
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