Understanding Ultra-Thin Film Resist and Underlayer Performance through Physical Characterization

The physical characterization of extreme ultraviolet (EUV) ultra-thin underlayers (ULs) and their effects on photoresist EUV lithographic performance was investigated. UL polymer compositions were modeled to identify polymer compositions that would encompass a range of glass transition temperatures...

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Veröffentlicht in:	Journal of Photopolymer Science and Technology 2010/06/22, Vol.23(5), pp.699-707
Hauptverfasser:	Higgins, Craig, Kruger, Seth, Kamineni, Vimal, Matyi, Richard, Georger, Jacque, Brainard, Robert
Format:	Artikel
Sprache:	eng
Schlagworte:	Adhesion ARC Crosslinking EUVL Film thickness Freeware Glass transition temperature Photopolymers Photoresists Polarity resist adhesion Resists Thin films underlayer properties
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