Three Litho-Process-Litho Approaches for 2D Double Patterning at the 32nm Half Pitch Node

Various material approaches for more cost-effective double patterning have been proposed during the past few years. Resolution capabilities of these approaches using dipole illumination are documented in literature. In this paper it is investigated whether these novel materials may also be applied f...

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Veröffentlicht in:	Journal of Photopolymer Science and Technology 2010/06/22, Vol.23(2), pp.185-191
Hauptverfasser:	Wong, Patrick, Gronheid, Roel, Wiaux, Vincent, Pret, Alessandro Vaglio, Verhaegen, Sta, Vandenbroeck, Nadia
Format:	Artikel
Sprache:	eng
Schlagworte:	Annular Dipoles double patterning Etching Feasibility Illumination line width roughness Patterning Printing resolution Stitching Two dimensional
Online-Zugang:	Volltext
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