New polishing method using water-based slurry under AC electric field for glass substrate

We proposed an AC electric field-assisted novel polishing method for borosilicate glass plate with water-based slurry. It has been found that the applied electric field operates effectively in positioning the slurry with abrasives in the polishing area. In-situ observations also confirmed that the A...

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Veröffentlicht in:	Journal of magnetism and magnetic materials 2011-05, Vol.323 (10), p.1394-1397
Hauptverfasser:	Kusumi, Takayuki, Sato, Yasuhiro, Akagami, Yoichi, Umehara, Noritsugu
Format:	Artikel
Sprache:	eng
Schlagworte:	Abrasive Abrasives AC electric field Alternating current Borosilicate glasses Cross-disciplinary physics: materials science rheology Electric fields Exact sciences and technology Magnetism Materials science Optimization Physics Polishing Productivity Slurries Slurry Surface treatments
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