Reactive-monolayer-assisted Thermal Nanoimprint Lithography with a Benzophenone-containing Trimethoxysilane Derivative for patterning Thin Chromium and Copper Films

Reactive-monolayer-assisted thermal nanoimprint lithography was applied for patterning thin films of chromium (Cr) and copper (Cu). The metal surfaces with the oxide layer were modified with a benzophenone-containing trimethoxysilane derivative to induce a surface graft reaction of the benzophenone...

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Veröffentlicht in:	Journal of Photopolymer Science and Technology 2010/06/22, Vol.23(1), pp.83-86
Hauptverfasser:	Kubo, Shoichi, Ohtake, Tomoyuki, Kang, Eui-Chul, Nakagawa, Masaru
Format:	Artikel
Sprache:	eng
Schlagworte:	benzophenone-containing trimethoxysilane Chromium Copper Lithography Nanocomposites Nanomaterials Nanostructure patterned metal film Polystyrene resins reactive-monolayer-assisted thermal nanoimprint lithography Resists Thin films wet etching
Online-Zugang:	Volltext
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