Binary amplitude holograms made from dyed photoresist

Binary amplitude holograms made from dyed photoresist

A method for fabricating binary amplitude holograms from a dyed photoresist is described. It is of particular interest for holograms that are used as null optics in the form metrology of aspheric surfaces and wavefronts. A pigment that strongly absorbs light near 633 nm was dissolved in a positive p...

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Veröffentlicht in:Optics letters 2011-05, Vol.36 (10), p.1899-1901
Hauptverfasser: QUANDOU WANG, GRIESMANN, Ulf, BURNETT, John H
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Exact sciences and technology
Fundamental areas of phenomenology (including applications)
Optics
Physics
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container_end_page 1901
container_issue 10
container_start_page 1899
container_title Optics letters
container_volume 36
creator QUANDOU WANG
GRIESMANN, Ulf
BURNETT, John H
description A method for fabricating binary amplitude holograms from a dyed photoresist is described. It is of particular interest for holograms that are used as null optics in the form metrology of aspheric surfaces and wavefronts. A pigment that strongly absorbs light near 633 nm was dissolved in a positive photoresist and the dyed resist was spun onto silica glass substrates. Stable resist layers were obtained that were essentially opaque at 633 nm with little effect on the transmittance of the resist in the UV. A Fresnel zone plate was fabricated from the dyed resist layer using contact lithography, and its performance was demonstrated at 633 nm.
doi_str_mv 10.1364/OL.36.001899
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subjects Exact sciences and technology
Fundamental areas of phenomenology (including applications)
Optics
Physics
title Binary amplitude holograms made from dyed photoresist
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