Hydrophobic Surface Construction by Phase-Separation of Fluorinated Block Copolymer for Immersion Lithography
Newly designed topcoat-less resist for immersion lithography is described. Hydrophobic resist surface layer was constructed successfully in order to solve problems regarding immersion resist and improve lithographic performance. Fluorinated diblock copolymer synthesized via atom transfer radical pol...
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| Veröffentlicht in: | Journal of Photopolymer Science and Technology 2008/06/24, Vol.21(5), pp.679-684 |
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| container_end_page | 684 |
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| container_issue | 5 |
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| container_title | Journal of Photopolymer Science and Technology |
| container_volume | 21 |
| creator | Otake, Atsushi Miura, Masashi Tsuchiya, Kousuke Ogino, Kenji |
| description | Newly designed topcoat-less resist for immersion lithography is described. Hydrophobic resist surface layer was constructed successfully in order to solve problems regarding immersion resist and improve lithographic performance. Fluorinated diblock copolymer synthesized via atom transfer radical polymerization (ATRP) showed self-assembly surface segregation in resist films. In spite of low fluorine composition, hydrophobicity of the resist surface was remarkably enhanced. Newly designed topcoat-less resist is expected to be utilized in immersion lithography. |
| doi_str_mv | 10.2494/photopolymer.21.679 |
| format | Article |
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Photopol. Sci. Technol.</addtitle><description>Newly designed topcoat-less resist for immersion lithography is described. Hydrophobic resist surface layer was constructed successfully in order to solve problems regarding immersion resist and improve lithographic performance. Fluorinated diblock copolymer synthesized via atom transfer radical polymerization (ATRP) showed self-assembly surface segregation in resist films. In spite of low fluorine composition, hydrophobicity of the resist surface was remarkably enhanced. Newly designed topcoat-less resist is expected to be utilized in immersion lithography.</description><subject>Block Copolymer</subject><subject>Construction</subject><subject>Copolymers</subject><subject>Fluorination</subject><subject>Hydrophobicity</subject><subject>Immersion</subject><subject>immersion lithography</subject><subject>Lithography</subject><subject>Phase-Separation</subject><subject>Resists</subject><subject>Self assembly</subject><subject>topcoat-less resist</subject><issn>0914-9244</issn><issn>1349-6336</issn><issn>1349-6336</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2008</creationdate><recordtype>article</recordtype><recordid>eNplkc1L9DAQh4MouH78BV4KHjx1bT6bHH0XdYUFBfUc0nRqu7ZNTdJD_3u7rsiLXmaG4XmGgR9CFzhbEqbY9VC76AbXTh34JcFLkasDtMCUqVRQKg7RIlOYpYowdoxOQthmGaWcqwXq1lPp3ewXjU2eR18ZC8nK9SH60cbG9UkxJU-1CZA-w2C8-dq5KrlrR-eb3kQok3-ts--z9f1BUjmfPHTzFHbwpom1e_NmqKczdFSZNsD5dz9Fr3e3L6t1unm8f1jdbFLLRR5TpaiRKpdZbkrMbcWwtFgAt7lVwmQMeMUoYbgoSVkRWZRc2qIEIkEpLjmmp-hqf3fw7mOEEHXXBAtta3pwY9BSMEZyItRMXv4it270_fycxowxwTIpdxTdU9a7EDxUevBNZ_ykcaZ3Cej_E9AE6zmB2VrvrW2I5g1-HONjY1v44_B9mdUfxNbGa-jpJ6a9mnE</recordid><startdate>20080101</startdate><enddate>20080101</enddate><creator>Otake, Atsushi</creator><creator>Miura, Masashi</creator><creator>Tsuchiya, Kousuke</creator><creator>Ogino, Kenji</creator><general>The Society of Photopolymer Science and Technology(SPST)</general><general>Japan Science and Technology Agency</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7SR</scope><scope>7U5</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20080101</creationdate><title>Hydrophobic Surface Construction by Phase-Separation of Fluorinated Block Copolymer for Immersion Lithography</title><author>Otake, Atsushi ; Miura, Masashi ; Tsuchiya, Kousuke ; Ogino, Kenji</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c567t-993a897807ad15cf418c16e5c7c96a04e5f43241bd2df28bd58cbde28e9958513</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2008</creationdate><topic>Block Copolymer</topic><topic>Construction</topic><topic>Copolymers</topic><topic>Fluorination</topic><topic>Hydrophobicity</topic><topic>Immersion</topic><topic>immersion lithography</topic><topic>Lithography</topic><topic>Phase-Separation</topic><topic>Resists</topic><topic>Self assembly</topic><topic>topcoat-less resist</topic><toplevel>online_resources</toplevel><creatorcontrib>Otake, Atsushi</creatorcontrib><creatorcontrib>Miura, Masashi</creatorcontrib><creatorcontrib>Tsuchiya, Kousuke</creatorcontrib><creatorcontrib>Ogino, Kenji</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of Photopolymer Science and Technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Otake, Atsushi</au><au>Miura, Masashi</au><au>Tsuchiya, Kousuke</au><au>Ogino, Kenji</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Hydrophobic Surface Construction by Phase-Separation of Fluorinated Block Copolymer for Immersion Lithography</atitle><jtitle>Journal of Photopolymer Science and Technology</jtitle><addtitle>J. Photopol. Sci. Technol.</addtitle><date>2008-01-01</date><risdate>2008</risdate><volume>21</volume><issue>5</issue><spage>679</spage><epage>684</epage><pages>679-684</pages><issn>0914-9244</issn><issn>1349-6336</issn><eissn>1349-6336</eissn><abstract>Newly designed topcoat-less resist for immersion lithography is described. Hydrophobic resist surface layer was constructed successfully in order to solve problems regarding immersion resist and improve lithographic performance. Fluorinated diblock copolymer synthesized via atom transfer radical polymerization (ATRP) showed self-assembly surface segregation in resist films. In spite of low fluorine composition, hydrophobicity of the resist surface was remarkably enhanced. Newly designed topcoat-less resist is expected to be utilized in immersion lithography.</abstract><cop>Hiratsuka</cop><pub>The Society of Photopolymer Science and Technology(SPST)</pub><doi>10.2494/photopolymer.21.679</doi><tpages>6</tpages><oa>free_for_read</oa></addata></record> |
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| ispartof | Journal of Photopolymer Science and Technology, 2008/06/24, Vol.21(5), pp.679-684 |
| issn | 0914-9244 1349-6336 1349-6336 |
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| source | J-STAGE (Japan Science & Technology Information Aggregator, Electronic) Freely Available Titles - Japanese; Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals; Free Full-Text Journals in Chemistry |
| subjects | Block Copolymer Construction Copolymers Fluorination Hydrophobicity Immersion immersion lithography Lithography Phase-Separation Resists Self assembly topcoat-less resist |
| title | Hydrophobic Surface Construction by Phase-Separation of Fluorinated Block Copolymer for Immersion Lithography |
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