Effect of Polymer Protection and Film Thickness on Acid Generator Distribution in Chemically Amplified Resists

Films of chemically amplified resists with different polymer polarity and film thickness were prepared to investigate their effect on acid generator distribution within the film. Poly(4-hydroxystyrene) (PHS) was used as a polymer, and its polarity was changed by partially protecting its hydroxyl gro...

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Veröffentlicht in:	Journal of Photopolymer Science and Technology 2009/06/30, Vol.22(1), pp.105-109
Hauptverfasser:	Fukuyam, Takehiro, Kozawa, Takahiro, Yamamoto, Hiroki, Tagawa, Seiichi, Irie, Makiko, Mimura, Takeyoshi, Iwai, Takeshi, Onodera, Junichi, Hirosawa, Ichiro, Koganesawa, Tomoyuki, Horie, Kazuyuki
Format:	Artikel
Sprache:	eng
Schlagworte:	acid generator Amplification chemically amplified resist Density EUV lithography Film thickness Generators Polarity Polymeric films Protective coatings Resists segregation X-ray reflectivity
Online-Zugang:	Volltext
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