Novel Wafer Bevel Treatment for Water Immersion Lithography

In this study, we focus on the controllability of a wafer bevel from adhesion and hydrophobicity viewpoints in order to solve the problems of film peeling and microdroplet formation around wafer bevels, which can result in pattern defects and degrading of the overlay and focus accuracy because of lo...

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Veröffentlicht in:	Journal of Photopolymer Science and Technology 2008/06/24, Vol.21(5), pp.665-672
Hauptverfasser:	Terai, Mamoru, Ishibashi, Takeo, Hagiwara, Takuya, Hanna, Tetsuro, Kumada, Teruhiko, Takebe, Yoko, Yokokoji, Osamu, Fujiwara, Tomoharu, Jiang, Jianhai, Niwa, Takafumi, Wakamizu, Shinya, Kyouda, Hideharu
Format:	Artikel
Sprache:	eng
Schlagworte:	Adhesion Bevels Coating film peeling Hydrophobicity immersion lithography Lithography Stability Vaporization wafer bevel Wafers
Online-Zugang:	Volltext
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