Removal of Ion Implanted Resists with Various Acceleration Energy using Wet Ozone

Removal of Ion Implanted Resists with Various Acceleration Energy using Wet Ozone

We investigated the removal of ion-implanted resists with various acceleration energy using wet ozone. The resist removal rate decreased with increasing acceleration energy in B- and P-ion-implanted resists. The hardness of ion-implanted resists increased with increasing acceleration energy as a res...

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Veröffentlicht in:Journal of Photopolymer Science and Technology 2009/06/30, Vol.22(3), pp.321-324
Hauptverfasser: Goto, Yousuke, Maruoka, Takeshi, Yamamoto, Masashi, Horibe, Hideo, Kusano, Eiji, Miura, Toshinori, Kekura, Mituru, Tagawa, Seiichi
Format: Artikel
Sprache:eng
Schlagworte:
Acceleration
acceleration energy
Computer programs
Energy use
environment
Hardness
Ozone
resist
Resists
Simulation
Software
wet ozone
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Zusammenfassung:We investigated the removal of ion-implanted resists with various acceleration energy using wet ozone. The resist removal rate decreased with increasing acceleration energy in B- and P-ion-implanted resists. The hardness of ion-implanted resists increased with increasing acceleration energy as a result of nanoindentation, and was simulated by Stopping and Range f Ions in Matter software (SRIM2008).
ISSN:0914-9244
1349-6336
1349-6336
DOI:10.2494/photopolymer.22.321