Photo-induced Graft Reactions of 4-Methoxybenzophenone with Thermoplastic Polymers Designed for Reactive-Monolayer-Assisted Thermal Nanoimprint Lithography
The photo-induced graft reactions of 4-methoxybenzophenone (MBP) with thermoplastic polymers of poly(styrene) (PS), poly(vinyltoluene) (PVT), poly(benzyl methacrylate) (PBzMA), and poly(methyl methacrylate) (PMMA) in their thin film states were studied. The FT-IR analysis revealed that photochemical...
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| Veröffentlicht in: | Journal of Photopolymer Science and Technology 2009/06/30, Vol.22(2), pp.205-211 |
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| creator | Ohtake, Tomoyuki Oda, Hirokazu Takaoka, Toshiaki Nakagawa, Masaru |
| description | The photo-induced graft reactions of 4-methoxybenzophenone (MBP) with thermoplastic polymers of poly(styrene) (PS), poly(vinyltoluene) (PVT), poly(benzyl methacrylate) (PBzMA), and poly(methyl methacrylate) (PMMA) in their thin film states were studied. The FT-IR analysis revealed that photochemical decreases of MBP were more rapid in the order of PVT > PBzMA ? PMMA > PS. The calculation by Gaussian03 implied that a C-H bond with smaller dissociation energy showed a more rapid photochemical decrease of MBP due to hydrogen abstraction reactions. The correlation of the photochemical decreases with the dissociation energies revealed that the hydrogen abstraction reactions with the thermoplastic polymers occurred at the side chains rather than the main chains. The gel permeation chromatography (GPC) analysis revealed that the photo-induced graft reaction was more induced in the order of PVT > PS > PBzMA ? PMMA at an identical exposure dose of 3 J cm-2 monitored at 365 nm. It was led to the conclusion that PVT was a suitable thermoplastic polymer for reactive-monolayer-assisted thermal nanoimprint lithography. |
| doi_str_mv | 10.2494/photopolymer.22.205 |
| format | Article |
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The FT-IR analysis revealed that photochemical decreases of MBP were more rapid in the order of PVT > PBzMA ? PMMA > PS. The calculation by Gaussian03 implied that a C-H bond with smaller dissociation energy showed a more rapid photochemical decrease of MBP due to hydrogen abstraction reactions. The correlation of the photochemical decreases with the dissociation energies revealed that the hydrogen abstraction reactions with the thermoplastic polymers occurred at the side chains rather than the main chains. The gel permeation chromatography (GPC) analysis revealed that the photo-induced graft reaction was more induced in the order of PVT > PS > PBzMA ? PMMA at an identical exposure dose of 3 J cm-2 monitored at 365 nm. It was led to the conclusion that PVT was a suitable thermoplastic polymer for reactive-monolayer-assisted thermal nanoimprint lithography.</description><identifier>ISSN: 0914-9244</identifier><identifier>ISSN: 1349-6336</identifier><identifier>EISSN: 1349-6336</identifier><identifier>DOI: 10.2494/photopolymer.22.205</identifier><language>eng</language><publisher>Hiratsuka: The Society of Photopolymer Science and Technology(SPST)</publisher><subject>benzophenone ; Dissociation energy ; FT-IR ; GPC ; Lithography ; Nanomaterials ; Nanostructure ; Photochemical ; photochemical reaction ; polymer graft ; Polymethyl methacrylates ; Polystyrene resins ; Thermoplastic resins</subject><ispartof>Journal of Photopolymer Science and Technology, 2009/06/30, Vol.22(2), pp.205-211</ispartof><rights>2009 The Society of Photopolymer Science and Technology (SPST)</rights><rights>Copyright Japan Science and Technology Agency 2009</rights><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c485t-7555a30011176b0cd403a2ab50282d8a15e433ec66be27580f753408e90ad0dc3</citedby><cites>FETCH-LOGICAL-c485t-7555a30011176b0cd403a2ab50282d8a15e433ec66be27580f753408e90ad0dc3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,1883,27924,27925</link.rule.ids></links><search><creatorcontrib>Ohtake, Tomoyuki</creatorcontrib><creatorcontrib>Oda, Hirokazu</creatorcontrib><creatorcontrib>Takaoka, Toshiaki</creatorcontrib><creatorcontrib>Nakagawa, Masaru</creatorcontrib><title>Photo-induced Graft Reactions of 4-Methoxybenzophenone with Thermoplastic Polymers Designed for Reactive-Monolayer-Assisted Thermal Nanoimprint Lithography</title><title>Journal of Photopolymer Science and Technology</title><addtitle>J. Photopol. Sci. Technol.</addtitle><description>The photo-induced graft reactions of 4-methoxybenzophenone (MBP) with thermoplastic polymers of poly(styrene) (PS), poly(vinyltoluene) (PVT), poly(benzyl methacrylate) (PBzMA), and poly(methyl methacrylate) (PMMA) in their thin film states were studied. The FT-IR analysis revealed that photochemical decreases of MBP were more rapid in the order of PVT > PBzMA ? PMMA > PS. The calculation by Gaussian03 implied that a C-H bond with smaller dissociation energy showed a more rapid photochemical decrease of MBP due to hydrogen abstraction reactions. The correlation of the photochemical decreases with the dissociation energies revealed that the hydrogen abstraction reactions with the thermoplastic polymers occurred at the side chains rather than the main chains. The gel permeation chromatography (GPC) analysis revealed that the photo-induced graft reaction was more induced in the order of PVT > PS > PBzMA ? PMMA at an identical exposure dose of 3 J cm-2 monitored at 365 nm. It was led to the conclusion that PVT was a suitable thermoplastic polymer for reactive-monolayer-assisted thermal nanoimprint lithography.</description><subject>benzophenone</subject><subject>Dissociation energy</subject><subject>FT-IR</subject><subject>GPC</subject><subject>Lithography</subject><subject>Nanomaterials</subject><subject>Nanostructure</subject><subject>Photochemical</subject><subject>photochemical reaction</subject><subject>polymer graft</subject><subject>Polymethyl methacrylates</subject><subject>Polystyrene resins</subject><subject>Thermoplastic resins</subject><issn>0914-9244</issn><issn>1349-6336</issn><issn>1349-6336</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2009</creationdate><recordtype>article</recordtype><recordid>eNplkc1uEzEUhS0EEiHlCdhYYsHKwb-TmWVVoEVKaYXK2nI8dzKOZuzBdmiHV-FlcUlUIdhcL-75ju1zEHrD6IrLRr6f-pDDFIZ5hLjifMWpeoYWTMiGVEJUz9GCNkyShkv5Er1KaU-pEEo1C_Tr9hElzrcHCy2-jKbL-CsYm13wCYcOS3INuQ8P8xb8zzD14IMHfO9yj-96iGOYBpOys_j2eH_CHyC5nS9uXYgnrx9AroMPg5khkvOUXMpl_4c3A_5ifHDjFJ3PeFOMwy6aqZ_P0IvODAlen84l-vbp493FFdncXH6-ON8QK2uVyVopZQSljLF1taW2lVQYbraK8pq3tWEKpBBgq2oLfK1q2q2VkLSGhpqWtlYs0buj7xTD9wOkrEeXLAyD8RAOSdeVlJQ1JcklevuPch8O0ZfHaSalrGSlal5U4qiyMaQUodPla6OJs2ZUP_al_-5Lc65LX4W6OlL7lM0OnhgTS7gD_M-cBlVPEtubqMGL3x4dqx8</recordid><startdate>20090101</startdate><enddate>20090101</enddate><creator>Ohtake, Tomoyuki</creator><creator>Oda, Hirokazu</creator><creator>Takaoka, Toshiaki</creator><creator>Nakagawa, Masaru</creator><general>The Society of Photopolymer Science and Technology(SPST)</general><general>Japan Science and Technology Agency</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7SR</scope><scope>7U5</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20090101</creationdate><title>Photo-induced Graft Reactions of 4-Methoxybenzophenone with Thermoplastic Polymers Designed for Reactive-Monolayer-Assisted Thermal Nanoimprint Lithography</title><author>Ohtake, Tomoyuki ; Oda, Hirokazu ; Takaoka, Toshiaki ; Nakagawa, Masaru</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c485t-7555a30011176b0cd403a2ab50282d8a15e433ec66be27580f753408e90ad0dc3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2009</creationdate><topic>benzophenone</topic><topic>Dissociation energy</topic><topic>FT-IR</topic><topic>GPC</topic><topic>Lithography</topic><topic>Nanomaterials</topic><topic>Nanostructure</topic><topic>Photochemical</topic><topic>photochemical reaction</topic><topic>polymer graft</topic><topic>Polymethyl methacrylates</topic><topic>Polystyrene resins</topic><topic>Thermoplastic resins</topic><toplevel>online_resources</toplevel><creatorcontrib>Ohtake, Tomoyuki</creatorcontrib><creatorcontrib>Oda, Hirokazu</creatorcontrib><creatorcontrib>Takaoka, Toshiaki</creatorcontrib><creatorcontrib>Nakagawa, Masaru</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of Photopolymer Science and Technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Ohtake, Tomoyuki</au><au>Oda, Hirokazu</au><au>Takaoka, Toshiaki</au><au>Nakagawa, Masaru</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Photo-induced Graft Reactions of 4-Methoxybenzophenone with Thermoplastic Polymers Designed for Reactive-Monolayer-Assisted Thermal Nanoimprint Lithography</atitle><jtitle>Journal of Photopolymer Science and Technology</jtitle><addtitle>J. Photopol. Sci. Technol.</addtitle><date>2009-01-01</date><risdate>2009</risdate><volume>22</volume><issue>2</issue><spage>205</spage><epage>211</epage><pages>205-211</pages><issn>0914-9244</issn><issn>1349-6336</issn><eissn>1349-6336</eissn><abstract>The photo-induced graft reactions of 4-methoxybenzophenone (MBP) with thermoplastic polymers of poly(styrene) (PS), poly(vinyltoluene) (PVT), poly(benzyl methacrylate) (PBzMA), and poly(methyl methacrylate) (PMMA) in their thin film states were studied. The FT-IR analysis revealed that photochemical decreases of MBP were more rapid in the order of PVT > PBzMA ? PMMA > PS. The calculation by Gaussian03 implied that a C-H bond with smaller dissociation energy showed a more rapid photochemical decrease of MBP due to hydrogen abstraction reactions. The correlation of the photochemical decreases with the dissociation energies revealed that the hydrogen abstraction reactions with the thermoplastic polymers occurred at the side chains rather than the main chains. The gel permeation chromatography (GPC) analysis revealed that the photo-induced graft reaction was more induced in the order of PVT > PS > PBzMA ? PMMA at an identical exposure dose of 3 J cm-2 monitored at 365 nm. It was led to the conclusion that PVT was a suitable thermoplastic polymer for reactive-monolayer-assisted thermal nanoimprint lithography.</abstract><cop>Hiratsuka</cop><pub>The Society of Photopolymer Science and Technology(SPST)</pub><doi>10.2494/photopolymer.22.205</doi><tpages>7</tpages><oa>free_for_read</oa></addata></record> |
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| subjects | benzophenone Dissociation energy FT-IR GPC Lithography Nanomaterials Nanostructure Photochemical photochemical reaction polymer graft Polymethyl methacrylates Polystyrene resins Thermoplastic resins |
| title | Photo-induced Graft Reactions of 4-Methoxybenzophenone with Thermoplastic Polymers Designed for Reactive-Monolayer-Assisted Thermal Nanoimprint Lithography |
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