Impact of De-molding Force on Exposure Dosage in UV-Nanoimprint Process
Mold releasing forces are experimentally measured in various exposure dosages for UV nanoimprint resist. PAK01 resist is examined to evaluate the chemical conversion by FTIR. Time dependent conversion ratio is measured under UV exposure and the conversion ratio of the UV resin versus exposed dosages...
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| Veröffentlicht in: | Journal of Photopolymer Science and Technology 2009/06/30, Vol.22(2), pp.181-184 |
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| container_end_page | 184 |
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| container_issue | 2 |
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| container_title | Journal of Photopolymer Science and Technology |
| container_volume | 22 |
| creator | Fujii, Noriyoshi Tanabe, Toshiaki Hirasawa, Tamano Kawata, Hiroaki Sakai, Nobuji Hirai, Yoshihiko |
| description | Mold releasing forces are experimentally measured in various exposure dosages for UV nanoimprint resist. PAK01 resist is examined to evaluate the chemical conversion by FTIR. Time dependent conversion ratio is measured under UV exposure and the conversion ratio of the UV resin versus exposed dosages is verified. Also, releasing forces for various exposure dosages are mechanically measured for flat mold. The results show the measured releasing force is not stabilized until the conversion is completed up to over around 90 %. Based on these results, the minimums exposure dosage is known for successful releasing. |
| doi_str_mv | 10.2494/photopolymer.22.181 |
| format | Article |
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PAK01 resist is examined to evaluate the chemical conversion by FTIR. Time dependent conversion ratio is measured under UV exposure and the conversion ratio of the UV resin versus exposed dosages is verified. Also, releasing forces for various exposure dosages are mechanically measured for flat mold. The results show the measured releasing force is not stabilized until the conversion is completed up to over around 90 %. 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Based on these results, the minimums exposure dosage is known for successful releasing.</description><subject>Conversion</subject><subject>Conversion ratio</subject><subject>Dosage</subject><subject>durability</subject><subject>Molds</subject><subject>Nanocomposites</subject><subject>Nanoimprint</subject><subject>Nanostructure</subject><subject>photo-curable resin</subject><subject>release agent</subject><subject>Releasing</subject><subject>Resists</subject><issn>0914-9244</issn><issn>1349-6336</issn><issn>1349-6336</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2009</creationdate><recordtype>article</recordtype><recordid>eNplkMtOwzAQRS0EEqXwBWwssWCVEj8TL1HfUgUsKFvLtZ02VWIHO5Xo3xMIqhBsZjbnXM1cAG5ROsJU0Idm51vf-OpY2zDCeIRydAYGiFCRcEL4ORikAtFEYEovwVWM-zQlhDExAPNl3SjdQl_AiU1qX5nSbeHMB22hd3D60fh4CBZOfFRbC0sH12_Jk3K-rJtQuha-BK9tjNfgolBVtDc_ewjWs-nreJGsnufL8eMq0YznbaK5zjKDuWHGFIRpoQlPaYayTFhGtMGoEEakJGebQiCeW7PhVCmhucDW0JwMwX2f2wT_frCxlXUZta0q5aw_RJlzSoQQhHfk3R9y7w_BdcdJRCnllLMcdRTpKR18jMEWsnurVuEoUSq_upW_u5UYS_RtLXprH9uulpOjQlvqyv5zcD869YTonQrSOvIJBJ6K1A</recordid><startdate>20090101</startdate><enddate>20090101</enddate><creator>Fujii, Noriyoshi</creator><creator>Tanabe, Toshiaki</creator><creator>Hirasawa, Tamano</creator><creator>Kawata, Hiroaki</creator><creator>Sakai, Nobuji</creator><creator>Hirai, Yoshihiko</creator><general>The Society of Photopolymer Science and Technology(SPST)</general><general>Japan Science and Technology Agency</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7SR</scope><scope>7U5</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20090101</creationdate><title>Impact of De-molding Force on Exposure Dosage in UV-Nanoimprint Process</title><author>Fujii, Noriyoshi ; Tanabe, Toshiaki ; Hirasawa, Tamano ; Kawata, Hiroaki ; Sakai, Nobuji ; Hirai, Yoshihiko</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c568t-c6c77d26d5ddf35c9c360471779e53cd21f9d90385bf9168edb64aa9c692ed483</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2009</creationdate><topic>Conversion</topic><topic>Conversion ratio</topic><topic>Dosage</topic><topic>durability</topic><topic>Molds</topic><topic>Nanocomposites</topic><topic>Nanoimprint</topic><topic>Nanostructure</topic><topic>photo-curable resin</topic><topic>release agent</topic><topic>Releasing</topic><topic>Resists</topic><toplevel>online_resources</toplevel><creatorcontrib>Fujii, Noriyoshi</creatorcontrib><creatorcontrib>Tanabe, Toshiaki</creatorcontrib><creatorcontrib>Hirasawa, Tamano</creatorcontrib><creatorcontrib>Kawata, Hiroaki</creatorcontrib><creatorcontrib>Sakai, Nobuji</creatorcontrib><creatorcontrib>Hirai, Yoshihiko</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of Photopolymer Science and Technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Fujii, Noriyoshi</au><au>Tanabe, Toshiaki</au><au>Hirasawa, Tamano</au><au>Kawata, Hiroaki</au><au>Sakai, Nobuji</au><au>Hirai, Yoshihiko</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Impact of De-molding Force on Exposure Dosage in UV-Nanoimprint Process</atitle><jtitle>Journal of Photopolymer Science and Technology</jtitle><addtitle>J. Photopol. Sci. Technol.</addtitle><date>2009-01-01</date><risdate>2009</risdate><volume>22</volume><issue>2</issue><spage>181</spage><epage>184</epage><pages>181-184</pages><issn>0914-9244</issn><issn>1349-6336</issn><eissn>1349-6336</eissn><abstract>Mold releasing forces are experimentally measured in various exposure dosages for UV nanoimprint resist. PAK01 resist is examined to evaluate the chemical conversion by FTIR. Time dependent conversion ratio is measured under UV exposure and the conversion ratio of the UV resin versus exposed dosages is verified. Also, releasing forces for various exposure dosages are mechanically measured for flat mold. The results show the measured releasing force is not stabilized until the conversion is completed up to over around 90 %. Based on these results, the minimums exposure dosage is known for successful releasing.</abstract><cop>Hiratsuka</cop><pub>The Society of Photopolymer Science and Technology(SPST)</pub><doi>10.2494/photopolymer.22.181</doi><tpages>4</tpages><oa>free_for_read</oa></addata></record> |
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| ispartof | Journal of Photopolymer Science and Technology, 2009/06/30, Vol.22(2), pp.181-184 |
| issn | 0914-9244 1349-6336 1349-6336 |
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| source | J-STAGE Free; EZB-FREE-00999 freely available EZB journals; Free Full-Text Journals in Chemistry |
| subjects | Conversion Conversion ratio Dosage durability Molds Nanocomposites Nanoimprint Nanostructure photo-curable resin release agent Releasing Resists |
| title | Impact of De-molding Force on Exposure Dosage in UV-Nanoimprint Process |
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