Fabrication of Magnetic Nanodots Array Using UV Nanoimprint Lithography and Electrodeposition for High Density Patterned Media

A Magnetic nanodots array fabrication method using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition was developed. Since the photocurable resin patterned by UV-NIL was directly used for electrodeposition mask, simple and high throughput fabrication process was realized. The CoPt na...

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Veröffentlicht in:	Journal of Photopolymer Science and Technology 2008/06/24, Vol.21(4), pp.591-596
Hauptverfasser:	Shinohara, Hidetoshi, Fukuhara, Makoto, Hirasawa, Tamano, Mizuno, Jun, Shoji, Shuichi
Format:	Artikel
Sprache:	eng
Schlagworte:	Arrays chemical mechanical polishing Electrodeposition Lithography magnetic nanodots array Nanocomposites Nanomaterials Nanostructure Roughness Ultraviolet UV nanoimprint lithography
Online-Zugang:	Volltext
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