High Refractive Index Fluid for Next Generation ArF Immersion Lithography

ArF immersion lithography using a high-refractive-index fluid (HIF) is considered to be one of the most promising candidates for hp38nm or below. We have developed JSR HIL-001 and HIL-002 as new immersion fluids, the refractive index and transmittance of which are 1.64, >98%/mm and 1.65, >99%/...

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Veröffentlicht in:	Journal of Photopolymer Science and Technology 2006, Vol.19(5), pp.641-646
Hauptverfasser:	Furukawa, Taiichi, Hieda, Katsuhiko, Wang, Yong, Miyamatsu, Takashi, Yamada, Kinji, Tominaga, Tetsuo, Makita, Yutaka, Nakagawa, Hiroki, Nakamura, Atshushi, Shima, Motoyuki, Shimokawa, Tsutomu
Format:	Artikel
Sprache:	eng
Schlagworte:	ArF immersion lithography Fluid dynamics Fluid flow Fluids high-refractive-index fluid Immersion Lithography photo-decomposition Photochemical photoresist defects Refractive index Refractivity UV absorption
Online-Zugang:	Volltext
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