Molecular Challenges of Immersion and Extreme Ultraviolet (EUV) Resists
This paper outlines the major challenges for the development of 193 nm immersion and extreme ultraviolet (EUV) resists. The major issues for the implementation of 193 nm immersion are developing high index immersion fluids and high index lens materials to enable 32 nm half-pitch imaging. For EUV res...
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| Veröffentlicht in: | Journal of Photopolymer Science and Technology 2006, Vol.19(4), pp.487-499 |
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| container_title | Journal of Photopolymer Science and Technology |
| container_volume | 19 |
| creator | Dean, Kim R. Stark, David |
| description | This paper outlines the major challenges for the development of 193 nm immersion and extreme ultraviolet (EUV) resists. The major issues for the implementation of 193 nm immersion are developing high index immersion fluids and high index lens materials to enable 32 nm half-pitch imaging. For EUV resists, reaction mechanisms are not well understood. In addition, the many constraints placed on EUV resists, such as needing low photospeed, low line width roughness, and low outgassing while achieving the desired resolution, make resist design very difficult. |
| doi_str_mv | 10.2494/photopolymer.19.487 |
| format | Article |
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Photopol. Sci. Technol.</addtitle><description>This paper outlines the major challenges for the development of 193 nm immersion and extreme ultraviolet (EUV) resists. The major issues for the implementation of 193 nm immersion are developing high index immersion fluids and high index lens materials to enable 32 nm half-pitch imaging. For EUV resists, reaction mechanisms are not well understood. In addition, the many constraints placed on EUV resists, such as needing low photospeed, low line width roughness, and low outgassing while achieving the desired resolution, make resist design very difficult.</description><subject>193 nm immersion</subject><subject>EUV resist</subject><subject>extreme ultraviolet (EUV)</subject><subject>Fluid dynamics</subject><subject>Fluid flow</subject><subject>Fluids</subject><subject>high index fluids</subject><subject>Immersion</subject><subject>immersion resist</subject><subject>Photopolymers</subject><subject>Resists</subject><subject>Roughness</subject><subject>Ultraviolet</subject><issn>0914-9244</issn><issn>1349-6336</issn><issn>1349-6336</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2006</creationdate><recordtype>article</recordtype><recordid>eNplkEFLwzAYhoMoOKe_wEvBg3roTJM0XY4y5jaYCOK8hjT7unWkzUxScf_eSEVEL997eZ6XjxehywyPCBPsbr-1we6tOTTgRpkYsXFxhAYZZSLllPJjNMAiY6kgjJ2iM-93GFOa52KAZo_WgO6Mcslkq4yBdgM-sVWyaGKXr22bqHadTD-CgwaSlQlOvdfRCcnNdPV6mzyDr33w5-ikUsbDxXcO0eph-jKZp8un2WJyv0x1zouQllhghjPMS0pIlZOxWJecEMwJqEIRlVPIyzXhVCldagZU0cjrta5KRnHB6BBd9717Z9868EE2tddgjGrBdl6OOaOCiQJH8uoPubOda-NzMmOMcTommESK9pR21nsHldy7ulHuIDMsv7aVv7eVmZBx22jNe2vng9rAj6NcqLWB_05_ovqD6K1yElr6CTCTiuc</recordid><startdate>20060101</startdate><enddate>20060101</enddate><creator>Dean, Kim R.</creator><creator>Stark, David</creator><general>The Society of Photopolymer Science and Technology(SPST)</general><general>Japan Science and Technology Agency</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7SR</scope><scope>7U5</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20060101</creationdate><title>Molecular Challenges of Immersion and Extreme Ultraviolet (EUV) Resists</title><author>Dean, Kim R. ; Stark, David</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c567t-b09040106b322f5289db622062ea7a2a53e5bd263aacbc4e3a3040cdcfb430743</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2006</creationdate><topic>193 nm immersion</topic><topic>EUV resist</topic><topic>extreme ultraviolet (EUV)</topic><topic>Fluid dynamics</topic><topic>Fluid flow</topic><topic>Fluids</topic><topic>high index fluids</topic><topic>Immersion</topic><topic>immersion resist</topic><topic>Photopolymers</topic><topic>Resists</topic><topic>Roughness</topic><topic>Ultraviolet</topic><toplevel>online_resources</toplevel><creatorcontrib>Dean, Kim R.</creatorcontrib><creatorcontrib>Stark, David</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of Photopolymer Science and Technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Dean, Kim R.</au><au>Stark, David</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Molecular Challenges of Immersion and Extreme Ultraviolet (EUV) Resists</atitle><jtitle>Journal of Photopolymer Science and Technology</jtitle><addtitle>J. Photopol. Sci. Technol.</addtitle><date>2006-01-01</date><risdate>2006</risdate><volume>19</volume><issue>4</issue><spage>487</spage><epage>499</epage><pages>487-499</pages><issn>0914-9244</issn><issn>1349-6336</issn><eissn>1349-6336</eissn><abstract>This paper outlines the major challenges for the development of 193 nm immersion and extreme ultraviolet (EUV) resists. The major issues for the implementation of 193 nm immersion are developing high index immersion fluids and high index lens materials to enable 32 nm half-pitch imaging. For EUV resists, reaction mechanisms are not well understood. In addition, the many constraints placed on EUV resists, such as needing low photospeed, low line width roughness, and low outgassing while achieving the desired resolution, make resist design very difficult.</abstract><cop>Hiratsuka</cop><pub>The Society of Photopolymer Science and Technology(SPST)</pub><doi>10.2494/photopolymer.19.487</doi><tpages>13</tpages><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| source | J-STAGE Free; EZB-FREE-00999 freely available EZB journals; Free Full-Text Journals in Chemistry |
| subjects | 193 nm immersion EUV resist extreme ultraviolet (EUV) Fluid dynamics Fluid flow Fluids high index fluids Immersion immersion resist Photopolymers Resists Roughness Ultraviolet |
| title | Molecular Challenges of Immersion and Extreme Ultraviolet (EUV) Resists |
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