Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresists
Poly(olefin sulfone)s, formed by the reaction of sulfur dioxide (SO 2) and an olefin, are known to be highly susceptible to degradation by radiation and thus have been identified as candidate materials for chain scission-based extreme ultraviolet lithography (EUVL) resist materials. In order to inve...
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| Veröffentlicht in: | Radiation physics and chemistry (Oxford, England : 1993) England : 1993), 2011-02, Vol.80 (2), p.236-241 |
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| container_title | Radiation physics and chemistry (Oxford, England : 1993) |
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| creator | Lawrie, Kirsten Blakey, Idriss Blinco, James Gronheid, Roel Jack, Kevin Pollentier, Ivan Leeson, Michael J. Younkin, Todd R. Whittaker, Andrew K. |
| description | Poly(olefin sulfone)s, formed by the reaction of sulfur dioxide (SO
2) and an olefin, are known to be highly susceptible to degradation by radiation and thus have been identified as candidate materials for chain scission-based extreme ultraviolet lithography (EUVL) resist materials. In order to investigate this further, the synthesis and characterisation of two poly(olefin sulfone)s namely poly(1-pentene sulfone) (PPS) and poly(2-methyl-1-pentene sulfone) (PMPS), was achieved and the two materials were evaluated for possible chain scission EUVL resist applications. It was found that both materials possess high sensitivities to EUV photons; however; the rates of outgassing were extremely high. The only observed degradation products were found to be SO
2 and the respective olefin suggesting that depolymerisation takes place under irradiation in a vacuum environment. In addition to depolymerisation, a concurrent conversion of SO
2 moieties to a sulfide phase was observed using XPS. |
| doi_str_mv | 10.1016/j.radphyschem.2010.07.038 |
| format | Article |
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2) and an olefin, are known to be highly susceptible to degradation by radiation and thus have been identified as candidate materials for chain scission-based extreme ultraviolet lithography (EUVL) resist materials. In order to investigate this further, the synthesis and characterisation of two poly(olefin sulfone)s namely poly(1-pentene sulfone) (PPS) and poly(2-methyl-1-pentene sulfone) (PMPS), was achieved and the two materials were evaluated for possible chain scission EUVL resist applications. It was found that both materials possess high sensitivities to EUV photons; however; the rates of outgassing were extremely high. The only observed degradation products were found to be SO
2 and the respective olefin suggesting that depolymerisation takes place under irradiation in a vacuum environment. In addition to depolymerisation, a concurrent conversion of SO
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2) and an olefin, are known to be highly susceptible to degradation by radiation and thus have been identified as candidate materials for chain scission-based extreme ultraviolet lithography (EUVL) resist materials. In order to investigate this further, the synthesis and characterisation of two poly(olefin sulfone)s namely poly(1-pentene sulfone) (PPS) and poly(2-methyl-1-pentene sulfone) (PMPS), was achieved and the two materials were evaluated for possible chain scission EUVL resist applications. It was found that both materials possess high sensitivities to EUV photons; however; the rates of outgassing were extremely high. The only observed degradation products were found to be SO
2 and the respective olefin suggesting that depolymerisation takes place under irradiation in a vacuum environment. In addition to depolymerisation, a concurrent conversion of SO
2 moieties to a sulfide phase was observed using XPS.</description><subject>Chain scission</subject><subject>Degradation</subject><subject>EUV</subject><subject>Lithography</subject><subject>Olefins</subject><subject>Photoresist</subject><subject>Poly(olefin sulfone)</subject><subject>Resists</subject><subject>Sulfones</subject><subject>Ultraviolet</subject><subject>X-ray photoelectron spectroscopy</subject><issn>0969-806X</issn><issn>1879-0895</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2011</creationdate><recordtype>article</recordtype><recordid>eNqNkDtvGzEQhAkjAazI-Q9MFbk4mdQ9SLoLBPkBCHCjBOkIHm8ZUTgdL1zKtv59KMtFSleL3Z35gBlCvnE254w3N7t5NN24PaLdwn6-YPnOxJyV8oJMuBSqYFLVn8iEqUYVkjW_L8kXxB1jTMi6nJDt6jVF2AM99CmaZx96SHS2-vnrmnbwJ7NN8mGgwdEx9MdZfjs_UDz0Lgxwjbd0E15M7JCacey9fVPnBWlG0HEbUoiAHhNekc_O9Ahf3-eUbO5Wm-VDsX66f1z-WBe2rMtUGOkENFwAV6VruDM1d2WlpG1N3bFFa9qKC7FoBa8s1KapeGurnKZtFrJWvJyS72fsGMPfA2DSe48W-t4MEA6oZVOVqhJCZaU6K20MiBGcHqPfm3jUnOlTt3qn_-tWn7rVTOjcbfYuz17ISZ49RI3Ww2Ch8xFs0l3wH6D8A8ncilA</recordid><startdate>20110201</startdate><enddate>20110201</enddate><creator>Lawrie, Kirsten</creator><creator>Blakey, Idriss</creator><creator>Blinco, James</creator><creator>Gronheid, Roel</creator><creator>Jack, Kevin</creator><creator>Pollentier, Ivan</creator><creator>Leeson, Michael J.</creator><creator>Younkin, Todd R.</creator><creator>Whittaker, Andrew K.</creator><general>Elsevier Ltd</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>FR3</scope><scope>JG9</scope><scope>KR7</scope><scope>L7M</scope></search><sort><creationdate>20110201</creationdate><title>Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresists</title><author>Lawrie, Kirsten ; Blakey, Idriss ; Blinco, James ; Gronheid, Roel ; Jack, Kevin ; Pollentier, Ivan ; Leeson, Michael J. ; Younkin, Todd R. ; Whittaker, Andrew K.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c353t-a8f7e617e193f61fa51f3498cba5d02bab41772b714ce5a641bc4000b6285913</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2011</creationdate><topic>Chain scission</topic><topic>Degradation</topic><topic>EUV</topic><topic>Lithography</topic><topic>Olefins</topic><topic>Photoresist</topic><topic>Poly(olefin sulfone)</topic><topic>Resists</topic><topic>Sulfones</topic><topic>Ultraviolet</topic><topic>X-ray photoelectron spectroscopy</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Lawrie, Kirsten</creatorcontrib><creatorcontrib>Blakey, Idriss</creatorcontrib><creatorcontrib>Blinco, James</creatorcontrib><creatorcontrib>Gronheid, Roel</creatorcontrib><creatorcontrib>Jack, Kevin</creatorcontrib><creatorcontrib>Pollentier, Ivan</creatorcontrib><creatorcontrib>Leeson, Michael J.</creatorcontrib><creatorcontrib>Younkin, Todd R.</creatorcontrib><creatorcontrib>Whittaker, Andrew K.</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Engineering Research Database</collection><collection>Materials Research Database</collection><collection>Civil Engineering Abstracts</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Radiation physics and chemistry (Oxford, England : 1993)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Lawrie, Kirsten</au><au>Blakey, Idriss</au><au>Blinco, James</au><au>Gronheid, Roel</au><au>Jack, Kevin</au><au>Pollentier, Ivan</au><au>Leeson, Michael J.</au><au>Younkin, Todd R.</au><au>Whittaker, Andrew K.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresists</atitle><jtitle>Radiation physics and chemistry (Oxford, England : 1993)</jtitle><date>2011-02-01</date><risdate>2011</risdate><volume>80</volume><issue>2</issue><spage>236</spage><epage>241</epage><pages>236-241</pages><issn>0969-806X</issn><eissn>1879-0895</eissn><abstract>Poly(olefin sulfone)s, formed by the reaction of sulfur dioxide (SO
2) and an olefin, are known to be highly susceptible to degradation by radiation and thus have been identified as candidate materials for chain scission-based extreme ultraviolet lithography (EUVL) resist materials. In order to investigate this further, the synthesis and characterisation of two poly(olefin sulfone)s namely poly(1-pentene sulfone) (PPS) and poly(2-methyl-1-pentene sulfone) (PMPS), was achieved and the two materials were evaluated for possible chain scission EUVL resist applications. It was found that both materials possess high sensitivities to EUV photons; however; the rates of outgassing were extremely high. The only observed degradation products were found to be SO
2 and the respective olefin suggesting that depolymerisation takes place under irradiation in a vacuum environment. In addition to depolymerisation, a concurrent conversion of SO
2 moieties to a sulfide phase was observed using XPS.</abstract><pub>Elsevier Ltd</pub><doi>10.1016/j.radphyschem.2010.07.038</doi><tpages>6</tpages></addata></record> |
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| identifier | ISSN: 0969-806X |
| ispartof | Radiation physics and chemistry (Oxford, England : 1993), 2011-02, Vol.80 (2), p.236-241 |
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| source | Elsevier ScienceDirect Journals Complete |
| subjects | Chain scission Degradation EUV Lithography Olefins Photoresist Poly(olefin sulfone) Resists Sulfones Ultraviolet X-ray photoelectron spectroscopy |
| title | Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresists |
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