Enhanced Thermopower of Graphene Films with Oxygen Plasma Treatment

In this work, we show that the maximum thermopower of few layers graphene (FLG) films could be greatly enhanced up to ∼700 μV/K after oxygen plasma treatment. The electrical conductivities of these plasma treated FLG films remain high, for example, ∼104 S/m, which results in power factors as high as...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:ACS nano 2011-04, Vol.5 (4), p.2749-2755
Hauptverfasser: Xiao, Ni, Dong, Xiaochen, Song, Li, Liu, Dayong, Tay, YeeYan, Wu, Shixin, Li, Lain-Jong, Zhao, Yang, Yu, Ting, Zhang, Hua, Huang, Wei, Hng, Huey Hoon, Ajayan, Pulickel M, Yan, Qingyu
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 2755
container_issue 4
container_start_page 2749
container_title ACS nano
container_volume 5
creator Xiao, Ni
Dong, Xiaochen
Song, Li
Liu, Dayong
Tay, YeeYan
Wu, Shixin
Li, Lain-Jong
Zhao, Yang
Yu, Ting
Zhang, Hua
Huang, Wei
Hng, Huey Hoon
Ajayan, Pulickel M
Yan, Qingyu
description In this work, we show that the maximum thermopower of few layers graphene (FLG) films could be greatly enhanced up to ∼700 μV/K after oxygen plasma treatment. The electrical conductivities of these plasma treated FLG films remain high, for example, ∼104 S/m, which results in power factors as high as ∼4.5 × 10−3 W K−2 m−1. In comparison, the pristine FLG films show a maximum thermopower of ∼80 μV/K with an electrical conductivity of ∼5 × 104 S/m. The proposed mechanism is due to generation of local disordered carbon that opens the band gap. Measured thermopowers of single-layer graphene (SLG) films and reduced graphene oxide (rGO) films were in the range of −40 to 50 and −10 to 20 μV/K, respectively. However, such oxygen plasma treatment is not suitable for SLG and rGO films. The SLG films were easily destroyed during the treatment while the electrical conductivity of rGO films is too low.
doi_str_mv 10.1021/nn2001849
format Article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_863766885</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>863766885</sourcerecordid><originalsourceid>FETCH-LOGICAL-a349t-30fd536eea1ffd5f3c328c011976d63855508a2a9995585757ab6a5c45a2dc1e3</originalsourceid><addsrcrecordid>eNptkMFLwzAUh4Mobk4P_gOSi4iHatI0aXqUsU1hMA8TvJW39NV2tGlNWub-eyvTnTy93-Hjg_cRcs3ZA2chf7Q2ZIzrKDkhY54IFTCt3k-PW_IRufB-y5iMdazOySjkEY8jFo3JdGYLsAYzui7Q1U3b7NDRJqcLB22BFum8rGpPd2VX0NXX_gMtfa3A10DXDqGr0XaX5CyHyuPV752Qt_lsPX0OlqvFy_RpGYCIki4QLM-kUIjA82HlwohQG8Z5EqtMCS2lZBpCSJJESi1jGcNGgTSRhDAzHMWE3B28rWs-e_RdWpfeYFWBxab3qVYiVkprOZD3B9K4xnuHedq6sga3TzlLf5Klx2QDe_Nr7Tc1Zkfyr9EA3B4AMD7dNr2zw5P_iL4Bxz5w_w</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>863766885</pqid></control><display><type>article</type><title>Enhanced Thermopower of Graphene Films with Oxygen Plasma Treatment</title><source>American Chemical Society Journals</source><creator>Xiao, Ni ; Dong, Xiaochen ; Song, Li ; Liu, Dayong ; Tay, YeeYan ; Wu, Shixin ; Li, Lain-Jong ; Zhao, Yang ; Yu, Ting ; Zhang, Hua ; Huang, Wei ; Hng, Huey Hoon ; Ajayan, Pulickel M ; Yan, Qingyu</creator><creatorcontrib>Xiao, Ni ; Dong, Xiaochen ; Song, Li ; Liu, Dayong ; Tay, YeeYan ; Wu, Shixin ; Li, Lain-Jong ; Zhao, Yang ; Yu, Ting ; Zhang, Hua ; Huang, Wei ; Hng, Huey Hoon ; Ajayan, Pulickel M ; Yan, Qingyu</creatorcontrib><description>In this work, we show that the maximum thermopower of few layers graphene (FLG) films could be greatly enhanced up to ∼700 μV/K after oxygen plasma treatment. The electrical conductivities of these plasma treated FLG films remain high, for example, ∼104 S/m, which results in power factors as high as ∼4.5 × 10−3 W K−2 m−1. In comparison, the pristine FLG films show a maximum thermopower of ∼80 μV/K with an electrical conductivity of ∼5 × 104 S/m. The proposed mechanism is due to generation of local disordered carbon that opens the band gap. Measured thermopowers of single-layer graphene (SLG) films and reduced graphene oxide (rGO) films were in the range of −40 to 50 and −10 to 20 μV/K, respectively. However, such oxygen plasma treatment is not suitable for SLG and rGO films. The SLG films were easily destroyed during the treatment while the electrical conductivity of rGO films is too low.</description><identifier>ISSN: 1936-0851</identifier><identifier>EISSN: 1936-086X</identifier><identifier>DOI: 10.1021/nn2001849</identifier><identifier>PMID: 21417404</identifier><language>eng</language><publisher>United States: American Chemical Society</publisher><ispartof>ACS nano, 2011-04, Vol.5 (4), p.2749-2755</ispartof><rights>Copyright © 2011 American Chemical Society</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-a349t-30fd536eea1ffd5f3c328c011976d63855508a2a9995585757ab6a5c45a2dc1e3</citedby><cites>FETCH-LOGICAL-a349t-30fd536eea1ffd5f3c328c011976d63855508a2a9995585757ab6a5c45a2dc1e3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://pubs.acs.org/doi/pdf/10.1021/nn2001849$$EPDF$$P50$$Gacs$$H</linktopdf><linktohtml>$$Uhttps://pubs.acs.org/doi/10.1021/nn2001849$$EHTML$$P50$$Gacs$$H</linktohtml><link.rule.ids>314,780,784,2765,27076,27924,27925,56738,56788</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/21417404$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Xiao, Ni</creatorcontrib><creatorcontrib>Dong, Xiaochen</creatorcontrib><creatorcontrib>Song, Li</creatorcontrib><creatorcontrib>Liu, Dayong</creatorcontrib><creatorcontrib>Tay, YeeYan</creatorcontrib><creatorcontrib>Wu, Shixin</creatorcontrib><creatorcontrib>Li, Lain-Jong</creatorcontrib><creatorcontrib>Zhao, Yang</creatorcontrib><creatorcontrib>Yu, Ting</creatorcontrib><creatorcontrib>Zhang, Hua</creatorcontrib><creatorcontrib>Huang, Wei</creatorcontrib><creatorcontrib>Hng, Huey Hoon</creatorcontrib><creatorcontrib>Ajayan, Pulickel M</creatorcontrib><creatorcontrib>Yan, Qingyu</creatorcontrib><title>Enhanced Thermopower of Graphene Films with Oxygen Plasma Treatment</title><title>ACS nano</title><addtitle>ACS Nano</addtitle><description>In this work, we show that the maximum thermopower of few layers graphene (FLG) films could be greatly enhanced up to ∼700 μV/K after oxygen plasma treatment. The electrical conductivities of these plasma treated FLG films remain high, for example, ∼104 S/m, which results in power factors as high as ∼4.5 × 10−3 W K−2 m−1. In comparison, the pristine FLG films show a maximum thermopower of ∼80 μV/K with an electrical conductivity of ∼5 × 104 S/m. The proposed mechanism is due to generation of local disordered carbon that opens the band gap. Measured thermopowers of single-layer graphene (SLG) films and reduced graphene oxide (rGO) films were in the range of −40 to 50 and −10 to 20 μV/K, respectively. However, such oxygen plasma treatment is not suitable for SLG and rGO films. The SLG films were easily destroyed during the treatment while the electrical conductivity of rGO films is too low.</description><issn>1936-0851</issn><issn>1936-086X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2011</creationdate><recordtype>article</recordtype><recordid>eNptkMFLwzAUh4Mobk4P_gOSi4iHatI0aXqUsU1hMA8TvJW39NV2tGlNWub-eyvTnTy93-Hjg_cRcs3ZA2chf7Q2ZIzrKDkhY54IFTCt3k-PW_IRufB-y5iMdazOySjkEY8jFo3JdGYLsAYzui7Q1U3b7NDRJqcLB22BFum8rGpPd2VX0NXX_gMtfa3A10DXDqGr0XaX5CyHyuPV752Qt_lsPX0OlqvFy_RpGYCIki4QLM-kUIjA82HlwohQG8Z5EqtMCS2lZBpCSJJESi1jGcNGgTSRhDAzHMWE3B28rWs-e_RdWpfeYFWBxab3qVYiVkprOZD3B9K4xnuHedq6sga3TzlLf5Klx2QDe_Nr7Tc1Zkfyr9EA3B4AMD7dNr2zw5P_iL4Bxz5w_w</recordid><startdate>20110426</startdate><enddate>20110426</enddate><creator>Xiao, Ni</creator><creator>Dong, Xiaochen</creator><creator>Song, Li</creator><creator>Liu, Dayong</creator><creator>Tay, YeeYan</creator><creator>Wu, Shixin</creator><creator>Li, Lain-Jong</creator><creator>Zhao, Yang</creator><creator>Yu, Ting</creator><creator>Zhang, Hua</creator><creator>Huang, Wei</creator><creator>Hng, Huey Hoon</creator><creator>Ajayan, Pulickel M</creator><creator>Yan, Qingyu</creator><general>American Chemical Society</general><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope></search><sort><creationdate>20110426</creationdate><title>Enhanced Thermopower of Graphene Films with Oxygen Plasma Treatment</title><author>Xiao, Ni ; Dong, Xiaochen ; Song, Li ; Liu, Dayong ; Tay, YeeYan ; Wu, Shixin ; Li, Lain-Jong ; Zhao, Yang ; Yu, Ting ; Zhang, Hua ; Huang, Wei ; Hng, Huey Hoon ; Ajayan, Pulickel M ; Yan, Qingyu</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-a349t-30fd536eea1ffd5f3c328c011976d63855508a2a9995585757ab6a5c45a2dc1e3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2011</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Xiao, Ni</creatorcontrib><creatorcontrib>Dong, Xiaochen</creatorcontrib><creatorcontrib>Song, Li</creatorcontrib><creatorcontrib>Liu, Dayong</creatorcontrib><creatorcontrib>Tay, YeeYan</creatorcontrib><creatorcontrib>Wu, Shixin</creatorcontrib><creatorcontrib>Li, Lain-Jong</creatorcontrib><creatorcontrib>Zhao, Yang</creatorcontrib><creatorcontrib>Yu, Ting</creatorcontrib><creatorcontrib>Zhang, Hua</creatorcontrib><creatorcontrib>Huang, Wei</creatorcontrib><creatorcontrib>Hng, Huey Hoon</creatorcontrib><creatorcontrib>Ajayan, Pulickel M</creatorcontrib><creatorcontrib>Yan, Qingyu</creatorcontrib><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><jtitle>ACS nano</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Xiao, Ni</au><au>Dong, Xiaochen</au><au>Song, Li</au><au>Liu, Dayong</au><au>Tay, YeeYan</au><au>Wu, Shixin</au><au>Li, Lain-Jong</au><au>Zhao, Yang</au><au>Yu, Ting</au><au>Zhang, Hua</au><au>Huang, Wei</au><au>Hng, Huey Hoon</au><au>Ajayan, Pulickel M</au><au>Yan, Qingyu</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Enhanced Thermopower of Graphene Films with Oxygen Plasma Treatment</atitle><jtitle>ACS nano</jtitle><addtitle>ACS Nano</addtitle><date>2011-04-26</date><risdate>2011</risdate><volume>5</volume><issue>4</issue><spage>2749</spage><epage>2755</epage><pages>2749-2755</pages><issn>1936-0851</issn><eissn>1936-086X</eissn><abstract>In this work, we show that the maximum thermopower of few layers graphene (FLG) films could be greatly enhanced up to ∼700 μV/K after oxygen plasma treatment. The electrical conductivities of these plasma treated FLG films remain high, for example, ∼104 S/m, which results in power factors as high as ∼4.5 × 10−3 W K−2 m−1. In comparison, the pristine FLG films show a maximum thermopower of ∼80 μV/K with an electrical conductivity of ∼5 × 104 S/m. The proposed mechanism is due to generation of local disordered carbon that opens the band gap. Measured thermopowers of single-layer graphene (SLG) films and reduced graphene oxide (rGO) films were in the range of −40 to 50 and −10 to 20 μV/K, respectively. However, such oxygen plasma treatment is not suitable for SLG and rGO films. The SLG films were easily destroyed during the treatment while the electrical conductivity of rGO films is too low.</abstract><cop>United States</cop><pub>American Chemical Society</pub><pmid>21417404</pmid><doi>10.1021/nn2001849</doi><tpages>7</tpages><oa>free_for_read</oa></addata></record>
fulltext fulltext
identifier ISSN: 1936-0851
ispartof ACS nano, 2011-04, Vol.5 (4), p.2749-2755
issn 1936-0851
1936-086X
language eng
recordid cdi_proquest_miscellaneous_863766885
source American Chemical Society Journals
title Enhanced Thermopower of Graphene Films with Oxygen Plasma Treatment
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-01T20%3A29%3A35IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Enhanced%20Thermopower%20of%20Graphene%20Films%20with%20Oxygen%20Plasma%20Treatment&rft.jtitle=ACS%20nano&rft.au=Xiao,%20Ni&rft.date=2011-04-26&rft.volume=5&rft.issue=4&rft.spage=2749&rft.epage=2755&rft.pages=2749-2755&rft.issn=1936-0851&rft.eissn=1936-086X&rft_id=info:doi/10.1021/nn2001849&rft_dat=%3Cproquest_cross%3E863766885%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=863766885&rft_id=info:pmid/21417404&rfr_iscdi=true