Enhanced Thermopower of Graphene Films with Oxygen Plasma Treatment
In this work, we show that the maximum thermopower of few layers graphene (FLG) films could be greatly enhanced up to ∼700 μV/K after oxygen plasma treatment. The electrical conductivities of these plasma treated FLG films remain high, for example, ∼104 S/m, which results in power factors as high as...
Gespeichert in:
Veröffentlicht in: | ACS nano 2011-04, Vol.5 (4), p.2749-2755 |
---|---|
Hauptverfasser: | , , , , , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | 2755 |
---|---|
container_issue | 4 |
container_start_page | 2749 |
container_title | ACS nano |
container_volume | 5 |
creator | Xiao, Ni Dong, Xiaochen Song, Li Liu, Dayong Tay, YeeYan Wu, Shixin Li, Lain-Jong Zhao, Yang Yu, Ting Zhang, Hua Huang, Wei Hng, Huey Hoon Ajayan, Pulickel M Yan, Qingyu |
description | In this work, we show that the maximum thermopower of few layers graphene (FLG) films could be greatly enhanced up to ∼700 μV/K after oxygen plasma treatment. The electrical conductivities of these plasma treated FLG films remain high, for example, ∼104 S/m, which results in power factors as high as ∼4.5 × 10−3 W K−2 m−1. In comparison, the pristine FLG films show a maximum thermopower of ∼80 μV/K with an electrical conductivity of ∼5 × 104 S/m. The proposed mechanism is due to generation of local disordered carbon that opens the band gap. Measured thermopowers of single-layer graphene (SLG) films and reduced graphene oxide (rGO) films were in the range of −40 to 50 and −10 to 20 μV/K, respectively. However, such oxygen plasma treatment is not suitable for SLG and rGO films. The SLG films were easily destroyed during the treatment while the electrical conductivity of rGO films is too low. |
doi_str_mv | 10.1021/nn2001849 |
format | Article |
fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_863766885</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>863766885</sourcerecordid><originalsourceid>FETCH-LOGICAL-a349t-30fd536eea1ffd5f3c328c011976d63855508a2a9995585757ab6a5c45a2dc1e3</originalsourceid><addsrcrecordid>eNptkMFLwzAUh4Mobk4P_gOSi4iHatI0aXqUsU1hMA8TvJW39NV2tGlNWub-eyvTnTy93-Hjg_cRcs3ZA2chf7Q2ZIzrKDkhY54IFTCt3k-PW_IRufB-y5iMdazOySjkEY8jFo3JdGYLsAYzui7Q1U3b7NDRJqcLB22BFum8rGpPd2VX0NXX_gMtfa3A10DXDqGr0XaX5CyHyuPV752Qt_lsPX0OlqvFy_RpGYCIki4QLM-kUIjA82HlwohQG8Z5EqtMCS2lZBpCSJJESi1jGcNGgTSRhDAzHMWE3B28rWs-e_RdWpfeYFWBxab3qVYiVkprOZD3B9K4xnuHedq6sga3TzlLf5Klx2QDe_Nr7Tc1Zkfyr9EA3B4AMD7dNr2zw5P_iL4Bxz5w_w</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>863766885</pqid></control><display><type>article</type><title>Enhanced Thermopower of Graphene Films with Oxygen Plasma Treatment</title><source>American Chemical Society Journals</source><creator>Xiao, Ni ; Dong, Xiaochen ; Song, Li ; Liu, Dayong ; Tay, YeeYan ; Wu, Shixin ; Li, Lain-Jong ; Zhao, Yang ; Yu, Ting ; Zhang, Hua ; Huang, Wei ; Hng, Huey Hoon ; Ajayan, Pulickel M ; Yan, Qingyu</creator><creatorcontrib>Xiao, Ni ; Dong, Xiaochen ; Song, Li ; Liu, Dayong ; Tay, YeeYan ; Wu, Shixin ; Li, Lain-Jong ; Zhao, Yang ; Yu, Ting ; Zhang, Hua ; Huang, Wei ; Hng, Huey Hoon ; Ajayan, Pulickel M ; Yan, Qingyu</creatorcontrib><description>In this work, we show that the maximum thermopower of few layers graphene (FLG) films could be greatly enhanced up to ∼700 μV/K after oxygen plasma treatment. The electrical conductivities of these plasma treated FLG films remain high, for example, ∼104 S/m, which results in power factors as high as ∼4.5 × 10−3 W K−2 m−1. In comparison, the pristine FLG films show a maximum thermopower of ∼80 μV/K with an electrical conductivity of ∼5 × 104 S/m. The proposed mechanism is due to generation of local disordered carbon that opens the band gap. Measured thermopowers of single-layer graphene (SLG) films and reduced graphene oxide (rGO) films were in the range of −40 to 50 and −10 to 20 μV/K, respectively. However, such oxygen plasma treatment is not suitable for SLG and rGO films. The SLG films were easily destroyed during the treatment while the electrical conductivity of rGO films is too low.</description><identifier>ISSN: 1936-0851</identifier><identifier>EISSN: 1936-086X</identifier><identifier>DOI: 10.1021/nn2001849</identifier><identifier>PMID: 21417404</identifier><language>eng</language><publisher>United States: American Chemical Society</publisher><ispartof>ACS nano, 2011-04, Vol.5 (4), p.2749-2755</ispartof><rights>Copyright © 2011 American Chemical Society</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-a349t-30fd536eea1ffd5f3c328c011976d63855508a2a9995585757ab6a5c45a2dc1e3</citedby><cites>FETCH-LOGICAL-a349t-30fd536eea1ffd5f3c328c011976d63855508a2a9995585757ab6a5c45a2dc1e3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://pubs.acs.org/doi/pdf/10.1021/nn2001849$$EPDF$$P50$$Gacs$$H</linktopdf><linktohtml>$$Uhttps://pubs.acs.org/doi/10.1021/nn2001849$$EHTML$$P50$$Gacs$$H</linktohtml><link.rule.ids>314,780,784,2765,27076,27924,27925,56738,56788</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/21417404$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Xiao, Ni</creatorcontrib><creatorcontrib>Dong, Xiaochen</creatorcontrib><creatorcontrib>Song, Li</creatorcontrib><creatorcontrib>Liu, Dayong</creatorcontrib><creatorcontrib>Tay, YeeYan</creatorcontrib><creatorcontrib>Wu, Shixin</creatorcontrib><creatorcontrib>Li, Lain-Jong</creatorcontrib><creatorcontrib>Zhao, Yang</creatorcontrib><creatorcontrib>Yu, Ting</creatorcontrib><creatorcontrib>Zhang, Hua</creatorcontrib><creatorcontrib>Huang, Wei</creatorcontrib><creatorcontrib>Hng, Huey Hoon</creatorcontrib><creatorcontrib>Ajayan, Pulickel M</creatorcontrib><creatorcontrib>Yan, Qingyu</creatorcontrib><title>Enhanced Thermopower of Graphene Films with Oxygen Plasma Treatment</title><title>ACS nano</title><addtitle>ACS Nano</addtitle><description>In this work, we show that the maximum thermopower of few layers graphene (FLG) films could be greatly enhanced up to ∼700 μV/K after oxygen plasma treatment. The electrical conductivities of these plasma treated FLG films remain high, for example, ∼104 S/m, which results in power factors as high as ∼4.5 × 10−3 W K−2 m−1. In comparison, the pristine FLG films show a maximum thermopower of ∼80 μV/K with an electrical conductivity of ∼5 × 104 S/m. The proposed mechanism is due to generation of local disordered carbon that opens the band gap. Measured thermopowers of single-layer graphene (SLG) films and reduced graphene oxide (rGO) films were in the range of −40 to 50 and −10 to 20 μV/K, respectively. However, such oxygen plasma treatment is not suitable for SLG and rGO films. The SLG films were easily destroyed during the treatment while the electrical conductivity of rGO films is too low.</description><issn>1936-0851</issn><issn>1936-086X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2011</creationdate><recordtype>article</recordtype><recordid>eNptkMFLwzAUh4Mobk4P_gOSi4iHatI0aXqUsU1hMA8TvJW39NV2tGlNWub-eyvTnTy93-Hjg_cRcs3ZA2chf7Q2ZIzrKDkhY54IFTCt3k-PW_IRufB-y5iMdazOySjkEY8jFo3JdGYLsAYzui7Q1U3b7NDRJqcLB22BFum8rGpPd2VX0NXX_gMtfa3A10DXDqGr0XaX5CyHyuPV752Qt_lsPX0OlqvFy_RpGYCIki4QLM-kUIjA82HlwohQG8Z5EqtMCS2lZBpCSJJESi1jGcNGgTSRhDAzHMWE3B28rWs-e_RdWpfeYFWBxab3qVYiVkprOZD3B9K4xnuHedq6sga3TzlLf5Klx2QDe_Nr7Tc1Zkfyr9EA3B4AMD7dNr2zw5P_iL4Bxz5w_w</recordid><startdate>20110426</startdate><enddate>20110426</enddate><creator>Xiao, Ni</creator><creator>Dong, Xiaochen</creator><creator>Song, Li</creator><creator>Liu, Dayong</creator><creator>Tay, YeeYan</creator><creator>Wu, Shixin</creator><creator>Li, Lain-Jong</creator><creator>Zhao, Yang</creator><creator>Yu, Ting</creator><creator>Zhang, Hua</creator><creator>Huang, Wei</creator><creator>Hng, Huey Hoon</creator><creator>Ajayan, Pulickel M</creator><creator>Yan, Qingyu</creator><general>American Chemical Society</general><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope></search><sort><creationdate>20110426</creationdate><title>Enhanced Thermopower of Graphene Films with Oxygen Plasma Treatment</title><author>Xiao, Ni ; Dong, Xiaochen ; Song, Li ; Liu, Dayong ; Tay, YeeYan ; Wu, Shixin ; Li, Lain-Jong ; Zhao, Yang ; Yu, Ting ; Zhang, Hua ; Huang, Wei ; Hng, Huey Hoon ; Ajayan, Pulickel M ; Yan, Qingyu</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-a349t-30fd536eea1ffd5f3c328c011976d63855508a2a9995585757ab6a5c45a2dc1e3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2011</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Xiao, Ni</creatorcontrib><creatorcontrib>Dong, Xiaochen</creatorcontrib><creatorcontrib>Song, Li</creatorcontrib><creatorcontrib>Liu, Dayong</creatorcontrib><creatorcontrib>Tay, YeeYan</creatorcontrib><creatorcontrib>Wu, Shixin</creatorcontrib><creatorcontrib>Li, Lain-Jong</creatorcontrib><creatorcontrib>Zhao, Yang</creatorcontrib><creatorcontrib>Yu, Ting</creatorcontrib><creatorcontrib>Zhang, Hua</creatorcontrib><creatorcontrib>Huang, Wei</creatorcontrib><creatorcontrib>Hng, Huey Hoon</creatorcontrib><creatorcontrib>Ajayan, Pulickel M</creatorcontrib><creatorcontrib>Yan, Qingyu</creatorcontrib><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><jtitle>ACS nano</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Xiao, Ni</au><au>Dong, Xiaochen</au><au>Song, Li</au><au>Liu, Dayong</au><au>Tay, YeeYan</au><au>Wu, Shixin</au><au>Li, Lain-Jong</au><au>Zhao, Yang</au><au>Yu, Ting</au><au>Zhang, Hua</au><au>Huang, Wei</au><au>Hng, Huey Hoon</au><au>Ajayan, Pulickel M</au><au>Yan, Qingyu</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Enhanced Thermopower of Graphene Films with Oxygen Plasma Treatment</atitle><jtitle>ACS nano</jtitle><addtitle>ACS Nano</addtitle><date>2011-04-26</date><risdate>2011</risdate><volume>5</volume><issue>4</issue><spage>2749</spage><epage>2755</epage><pages>2749-2755</pages><issn>1936-0851</issn><eissn>1936-086X</eissn><abstract>In this work, we show that the maximum thermopower of few layers graphene (FLG) films could be greatly enhanced up to ∼700 μV/K after oxygen plasma treatment. The electrical conductivities of these plasma treated FLG films remain high, for example, ∼104 S/m, which results in power factors as high as ∼4.5 × 10−3 W K−2 m−1. In comparison, the pristine FLG films show a maximum thermopower of ∼80 μV/K with an electrical conductivity of ∼5 × 104 S/m. The proposed mechanism is due to generation of local disordered carbon that opens the band gap. Measured thermopowers of single-layer graphene (SLG) films and reduced graphene oxide (rGO) films were in the range of −40 to 50 and −10 to 20 μV/K, respectively. However, such oxygen plasma treatment is not suitable for SLG and rGO films. The SLG films were easily destroyed during the treatment while the electrical conductivity of rGO films is too low.</abstract><cop>United States</cop><pub>American Chemical Society</pub><pmid>21417404</pmid><doi>10.1021/nn2001849</doi><tpages>7</tpages><oa>free_for_read</oa></addata></record> |
fulltext | fulltext |
identifier | ISSN: 1936-0851 |
ispartof | ACS nano, 2011-04, Vol.5 (4), p.2749-2755 |
issn | 1936-0851 1936-086X |
language | eng |
recordid | cdi_proquest_miscellaneous_863766885 |
source | American Chemical Society Journals |
title | Enhanced Thermopower of Graphene Films with Oxygen Plasma Treatment |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-01T20%3A29%3A35IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Enhanced%20Thermopower%20of%20Graphene%20Films%20with%20Oxygen%20Plasma%20Treatment&rft.jtitle=ACS%20nano&rft.au=Xiao,%20Ni&rft.date=2011-04-26&rft.volume=5&rft.issue=4&rft.spage=2749&rft.epage=2755&rft.pages=2749-2755&rft.issn=1936-0851&rft.eissn=1936-086X&rft_id=info:doi/10.1021/nn2001849&rft_dat=%3Cproquest_cross%3E863766885%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=863766885&rft_id=info:pmid/21417404&rfr_iscdi=true |