Positive-Working Photosensitive Alkaline-Developable Polyimide Precursor Based on Semi-Alicyclic Poly(amide acid), Vinyl Ether Crosslinker, and a Photoacid Generator
A positive-working photosensitive polyimide based on semi-alicyclic poly(amide acid) (PAA), 1,1,1-tris(4-[2-(vinyloxy)ethoxy]phenyl)ethane (TVPE) as a crosslinking dissolution inhibitor and a photoacid generator has been developed. PAA was prepared from pyromellitic dianhydride and alicyclic diamine...
Gespeichert in:
| Veröffentlicht in: | Journal of Photopolymer Science and Technology 2006, Vol.19(2), pp.277-280 |
|---|---|
| Hauptverfasser: | , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 280 |
|---|---|
| container_issue | 2 |
| container_start_page | 277 |
| container_title | Journal of Photopolymer Science and Technology |
| container_volume | 19 |
| creator | Okazaki, Masaki Onishi, Hitoshi Yamashita, Wataru Tamai, Shoji |
| description | A positive-working photosensitive polyimide based on semi-alicyclic poly(amide acid) (PAA), 1,1,1-tris(4-[2-(vinyloxy)ethoxy]phenyl)ethane (TVPE) as a crosslinking dissolution inhibitor and a photoacid generator has been developed. PAA was prepared from pyromellitic dianhydride and alicyclic diamine in N,N-dimethylacetamide (DMAc), which has excellent transparency above 365 nm and good solubility for 1 % sodium carbonate aqueous solution (aq.). The resist from the polymerization solution was formulated with photosensitive additives without isolation of PAA. A 23 μm thick film of the PSPI precursor system containing 25 wt% TVPE, 5 wt% PAG exhibited a sensitivity of 160 mJ/cm2 and contrast of 1.3 when it was exposed to broadband UV light followed by development in a 1 % sodium carbonate aq. at room temperature. A positive image featuring 40 μm line and space patterns was observed by the contact mode. |
| doi_str_mv | 10.2494/photopolymer.19.277 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_861562102</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>861562102</sourcerecordid><originalsourceid>FETCH-LOGICAL-c542t-13f15616bf629ddb6dda5bb7490263abedf62b4bc7ef28322e4166584aec54c33</originalsourceid><addsrcrecordid>eNplkd1uEzEQhS0EEqHwBNxY4gKQumH9s058GUJpkSoRib9Ly2vPNk689mJvKuWB-p51uqhCcDO2PN85ntFB6DWp55RL_mHYxjEO0R97SHMi53SxeIJmhHFZCcbEUzSrJeGVpJw_Ry9y3tU1Y00jZ-huE7Mb3S1Uv2Lau3CDNyevDGF6xiu_194FqD7BLfg46NYD3pSvXO9suSUwh5Rjwh91BotjwN-gd9XKO3M0pTyw7_QDrI2z78_xTxeOHl-MW0h4nWLOxX8P6RzrYLGeBjih-BICJD3G9BI967TP8OrPeYZ-fL74vr6qrr9eflmvrivTcDpWhHWkEUS0naDS2lZYq5u2XXBZU8F0C7Y0Wt6aBXR0ySgFToRollxDMTCMnaG3k--Q4u8D5FH1LhvwXgeIh6yWovhTUtNCvvmH3MVDCmU4RTjngi2p5IViE2VOaybo1JBcr9NRkVqdklN_J6eIVCW5orqaVLs86ht41Og0OuPhf81UivQRMVudFAR2D8lErnw</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1444638294</pqid></control><display><type>article</type><title>Positive-Working Photosensitive Alkaline-Developable Polyimide Precursor Based on Semi-Alicyclic Poly(amide acid), Vinyl Ether Crosslinker, and a Photoacid Generator</title><source>J-STAGE Free</source><source>Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals</source><source>Free Full-Text Journals in Chemistry</source><creator>Okazaki, Masaki ; Onishi, Hitoshi ; Yamashita, Wataru ; Tamai, Shoji</creator><creatorcontrib>Okazaki, Masaki ; Onishi, Hitoshi ; Yamashita, Wataru ; Tamai, Shoji</creatorcontrib><description>A positive-working photosensitive polyimide based on semi-alicyclic poly(amide acid) (PAA), 1,1,1-tris(4-[2-(vinyloxy)ethoxy]phenyl)ethane (TVPE) as a crosslinking dissolution inhibitor and a photoacid generator has been developed. PAA was prepared from pyromellitic dianhydride and alicyclic diamine in N,N-dimethylacetamide (DMAc), which has excellent transparency above 365 nm and good solubility for 1 % sodium carbonate aqueous solution (aq.). The resist from the polymerization solution was formulated with photosensitive additives without isolation of PAA. A 23 μm thick film of the PSPI precursor system containing 25 wt% TVPE, 5 wt% PAG exhibited a sensitivity of 160 mJ/cm2 and contrast of 1.3 when it was exposed to broadband UV light followed by development in a 1 % sodium carbonate aq. at room temperature. A positive image featuring 40 μm line and space patterns was observed by the contact mode.</description><identifier>ISSN: 0914-9244</identifier><identifier>ISSN: 1349-6336</identifier><identifier>EISSN: 1349-6336</identifier><identifier>DOI: 10.2494/photopolymer.19.277</identifier><language>eng</language><publisher>Hiratsuka: The Society of Photopolymer Science and Technology(SPST)</publisher><subject>chemical amplification ; Crosslinking ; Generators ; Inhibitors ; Polyimide resins ; Polymerization ; positive-working ; Precursors ; semi-alicyclic poly(amide acid) ; Sodium carbonate</subject><ispartof>Journal of Photopolymer Science and Technology, 2006, Vol.19(2), pp.277-280</ispartof><rights>2006 The Society of Photopolymer Science and Technology (SPST)</rights><rights>Copyright Japan Science and Technology Agency 2006</rights><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c542t-13f15616bf629ddb6dda5bb7490263abedf62b4bc7ef28322e4166584aec54c33</citedby><cites>FETCH-LOGICAL-c542t-13f15616bf629ddb6dda5bb7490263abedf62b4bc7ef28322e4166584aec54c33</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>315,781,785,1884,27928,27929</link.rule.ids></links><search><creatorcontrib>Okazaki, Masaki</creatorcontrib><creatorcontrib>Onishi, Hitoshi</creatorcontrib><creatorcontrib>Yamashita, Wataru</creatorcontrib><creatorcontrib>Tamai, Shoji</creatorcontrib><title>Positive-Working Photosensitive Alkaline-Developable Polyimide Precursor Based on Semi-Alicyclic Poly(amide acid), Vinyl Ether Crosslinker, and a Photoacid Generator</title><title>Journal of Photopolymer Science and Technology</title><addtitle>J. Photopol. Sci. Technol.</addtitle><description>A positive-working photosensitive polyimide based on semi-alicyclic poly(amide acid) (PAA), 1,1,1-tris(4-[2-(vinyloxy)ethoxy]phenyl)ethane (TVPE) as a crosslinking dissolution inhibitor and a photoacid generator has been developed. PAA was prepared from pyromellitic dianhydride and alicyclic diamine in N,N-dimethylacetamide (DMAc), which has excellent transparency above 365 nm and good solubility for 1 % sodium carbonate aqueous solution (aq.). The resist from the polymerization solution was formulated with photosensitive additives without isolation of PAA. A 23 μm thick film of the PSPI precursor system containing 25 wt% TVPE, 5 wt% PAG exhibited a sensitivity of 160 mJ/cm2 and contrast of 1.3 when it was exposed to broadband UV light followed by development in a 1 % sodium carbonate aq. at room temperature. A positive image featuring 40 μm line and space patterns was observed by the contact mode.</description><subject>chemical amplification</subject><subject>Crosslinking</subject><subject>Generators</subject><subject>Inhibitors</subject><subject>Polyimide resins</subject><subject>Polymerization</subject><subject>positive-working</subject><subject>Precursors</subject><subject>semi-alicyclic poly(amide acid)</subject><subject>Sodium carbonate</subject><issn>0914-9244</issn><issn>1349-6336</issn><issn>1349-6336</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2006</creationdate><recordtype>article</recordtype><recordid>eNplkd1uEzEQhS0EEqHwBNxY4gKQumH9s058GUJpkSoRib9Ly2vPNk689mJvKuWB-p51uqhCcDO2PN85ntFB6DWp55RL_mHYxjEO0R97SHMi53SxeIJmhHFZCcbEUzSrJeGVpJw_Ry9y3tU1Y00jZ-huE7Mb3S1Uv2Lau3CDNyevDGF6xiu_194FqD7BLfg46NYD3pSvXO9suSUwh5Rjwh91BotjwN-gd9XKO3M0pTyw7_QDrI2z78_xTxeOHl-MW0h4nWLOxX8P6RzrYLGeBjih-BICJD3G9BI967TP8OrPeYZ-fL74vr6qrr9eflmvrivTcDpWhHWkEUS0naDS2lZYq5u2XXBZU8F0C7Y0Wt6aBXR0ySgFToRollxDMTCMnaG3k--Q4u8D5FH1LhvwXgeIh6yWovhTUtNCvvmH3MVDCmU4RTjngi2p5IViE2VOaybo1JBcr9NRkVqdklN_J6eIVCW5orqaVLs86ht41Og0OuPhf81UivQRMVudFAR2D8lErnw</recordid><startdate>20060101</startdate><enddate>20060101</enddate><creator>Okazaki, Masaki</creator><creator>Onishi, Hitoshi</creator><creator>Yamashita, Wataru</creator><creator>Tamai, Shoji</creator><general>The Society of Photopolymer Science and Technology(SPST)</general><general>Japan Science and Technology Agency</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7SR</scope><scope>7U5</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20060101</creationdate><title>Positive-Working Photosensitive Alkaline-Developable Polyimide Precursor Based on Semi-Alicyclic Poly(amide acid), Vinyl Ether Crosslinker, and a Photoacid Generator</title><author>Okazaki, Masaki ; Onishi, Hitoshi ; Yamashita, Wataru ; Tamai, Shoji</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c542t-13f15616bf629ddb6dda5bb7490263abedf62b4bc7ef28322e4166584aec54c33</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2006</creationdate><topic>chemical amplification</topic><topic>Crosslinking</topic><topic>Generators</topic><topic>Inhibitors</topic><topic>Polyimide resins</topic><topic>Polymerization</topic><topic>positive-working</topic><topic>Precursors</topic><topic>semi-alicyclic poly(amide acid)</topic><topic>Sodium carbonate</topic><toplevel>online_resources</toplevel><creatorcontrib>Okazaki, Masaki</creatorcontrib><creatorcontrib>Onishi, Hitoshi</creatorcontrib><creatorcontrib>Yamashita, Wataru</creatorcontrib><creatorcontrib>Tamai, Shoji</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of Photopolymer Science and Technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Okazaki, Masaki</au><au>Onishi, Hitoshi</au><au>Yamashita, Wataru</au><au>Tamai, Shoji</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Positive-Working Photosensitive Alkaline-Developable Polyimide Precursor Based on Semi-Alicyclic Poly(amide acid), Vinyl Ether Crosslinker, and a Photoacid Generator</atitle><jtitle>Journal of Photopolymer Science and Technology</jtitle><addtitle>J. Photopol. Sci. Technol.</addtitle><date>2006-01-01</date><risdate>2006</risdate><volume>19</volume><issue>2</issue><spage>277</spage><epage>280</epage><pages>277-280</pages><issn>0914-9244</issn><issn>1349-6336</issn><eissn>1349-6336</eissn><abstract>A positive-working photosensitive polyimide based on semi-alicyclic poly(amide acid) (PAA), 1,1,1-tris(4-[2-(vinyloxy)ethoxy]phenyl)ethane (TVPE) as a crosslinking dissolution inhibitor and a photoacid generator has been developed. PAA was prepared from pyromellitic dianhydride and alicyclic diamine in N,N-dimethylacetamide (DMAc), which has excellent transparency above 365 nm and good solubility for 1 % sodium carbonate aqueous solution (aq.). The resist from the polymerization solution was formulated with photosensitive additives without isolation of PAA. A 23 μm thick film of the PSPI precursor system containing 25 wt% TVPE, 5 wt% PAG exhibited a sensitivity of 160 mJ/cm2 and contrast of 1.3 when it was exposed to broadband UV light followed by development in a 1 % sodium carbonate aq. at room temperature. A positive image featuring 40 μm line and space patterns was observed by the contact mode.</abstract><cop>Hiratsuka</cop><pub>The Society of Photopolymer Science and Technology(SPST)</pub><doi>10.2494/photopolymer.19.277</doi><tpages>4</tpages><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0914-9244 |
| ispartof | Journal of Photopolymer Science and Technology, 2006, Vol.19(2), pp.277-280 |
| issn | 0914-9244 1349-6336 1349-6336 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_861562102 |
| source | J-STAGE Free; Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals; Free Full-Text Journals in Chemistry |
| subjects | chemical amplification Crosslinking Generators Inhibitors Polyimide resins Polymerization positive-working Precursors semi-alicyclic poly(amide acid) Sodium carbonate |
| title | Positive-Working Photosensitive Alkaline-Developable Polyimide Precursor Based on Semi-Alicyclic Poly(amide acid), Vinyl Ether Crosslinker, and a Photoacid Generator |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-16T19%3A08%3A29IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Positive-Working%20Photosensitive%20Alkaline-Developable%20Polyimide%20Precursor%20Based%20on%20Semi-Alicyclic%20Poly(amide%20acid),%20Vinyl%20Ether%20Crosslinker,%20and%20a%20Photoacid%20Generator&rft.jtitle=Journal%20of%20Photopolymer%20Science%20and%20Technology&rft.au=Okazaki,%20Masaki&rft.date=2006-01-01&rft.volume=19&rft.issue=2&rft.spage=277&rft.epage=280&rft.pages=277-280&rft.issn=0914-9244&rft.eissn=1349-6336&rft_id=info:doi/10.2494/photopolymer.19.277&rft_dat=%3Cproquest_cross%3E861562102%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1444638294&rft_id=info:pmid/&rfr_iscdi=true |