Low-damage plasma processing of polymers for development of organic-inorganic flexible devices
Plasma generation and control technologies for processing of polymers have been developed with multiple low-inductance antenna (LIA) units, as a promising candidate for next-generation processing of hybrid flexible devices. Properties of argon–oxygen mixture plasmas sustained with multiple LIA units...
Gespeichert in:
| Veröffentlicht in: | Surface & coatings technology 2010-12, Vol.205, p.S355-S359 |
|---|---|
| Hauptverfasser: | , , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | S359 |
|---|---|
| container_issue | |
| container_start_page | S355 |
| container_title | Surface & coatings technology |
| container_volume | 205 |
| creator | Setsuhara, Yuichi Cho, Ken Takenaka, Kosuke Shiratani, Masaharu Sekine, Makoto Hori, Masaru |
| description | Plasma generation and control technologies for processing of polymers have been developed with multiple low-inductance antenna (LIA) units, as a promising candidate for next-generation processing of hybrid flexible devices. Properties of argon–oxygen mixture plasmas sustained with multiple LIA units have been investigated in terms of ion energies bombarding onto polymer surface. Ion energy distribution at the sheath edge of the argon–oxygen mixture plasmas showed considerable suppression of ion energies as small as or less than 10
eV. Effects of the plasma exposure onto polymers have been examined using hard x-ray photoelectron spectroscopy (HXPES) in terms of chemical bonding states of the polymer surface and the interface between polymer and silicon film. |
| doi_str_mv | 10.1016/j.surfcoat.2010.08.031 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_861535861</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0257897210006808</els_id><sourcerecordid>861535861</sourcerecordid><originalsourceid>FETCH-LOGICAL-c440t-130526c8a5071ed037d47642c02cceca2311d7f3d52f44dd978239a7e66a55b03</originalsourceid><addsrcrecordid>eNqFUMtO7DAMjRBIDI9fQN0gVp3rJG3T7kCIlzTS3Vy2RCFxRhmlTUk6PP6eVDOwvRvbso-Pjw8hFxSWFGjzZ7NM22h1UNOSQW5CuwROD8iCtqIrOa_EIVkAq0XZdoIdk5OUNgBARVctyMsqfJRG9WqNxehV6lUxxqAxJTesi2CLMfivHmMqbIiFwXf0YexxmOZZiGs1OF26YV8V1uOne_U4I11mOSNHVvmE5_t8Sp7v7_7dPparvw9PtzerUlcVTCXlULNGt6oGQdEAF6YSTcU0MK1RK8YpNcJyUzNbVcZ0omW8UwKbRtX1K_BTcrXjzeLftpgm2buk0Xs1YNgm2Ta05nWOGdnskDqGlCJaOUbXq_glKcjZT7mRP37K2U8Jrcx-5sXL_QmVtPI2qkG79Lud9eQXYJZyvcNh_vfdYZRJOxw0GhdRT9IE979T36X_kCM</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>861535861</pqid></control><display><type>article</type><title>Low-damage plasma processing of polymers for development of organic-inorganic flexible devices</title><source>Elsevier ScienceDirect Journals</source><creator>Setsuhara, Yuichi ; Cho, Ken ; Takenaka, Kosuke ; Shiratani, Masaharu ; Sekine, Makoto ; Hori, Masaru</creator><creatorcontrib>Setsuhara, Yuichi ; Cho, Ken ; Takenaka, Kosuke ; Shiratani, Masaharu ; Sekine, Makoto ; Hori, Masaru</creatorcontrib><description>Plasma generation and control technologies for processing of polymers have been developed with multiple low-inductance antenna (LIA) units, as a promising candidate for next-generation processing of hybrid flexible devices. Properties of argon–oxygen mixture plasmas sustained with multiple LIA units have been investigated in terms of ion energies bombarding onto polymer surface. Ion energy distribution at the sheath edge of the argon–oxygen mixture plasmas showed considerable suppression of ion energies as small as or less than 10
eV. Effects of the plasma exposure onto polymers have been examined using hard x-ray photoelectron spectroscopy (HXPES) in terms of chemical bonding states of the polymer surface and the interface between polymer and silicon film.</description><identifier>ISSN: 0257-8972</identifier><identifier>EISSN: 1879-3347</identifier><identifier>DOI: 10.1016/j.surfcoat.2010.08.031</identifier><identifier>CODEN: SCTEEJ</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Antennas ; Argon ; Bonding ; Coatings ; Cross-disciplinary physics: materials science; rheology ; Devices ; Energy distribution ; Exact sciences and technology ; Hard x-ray photoelectron spectroscopy ; Inductively-coupled plasma ; Low inductance antenna ; Low-damage process ; Materials science ; Organic-inorganic device ; Physics ; Polymers ; Silicon films ; Surface treatments ; X-rays</subject><ispartof>Surface & coatings technology, 2010-12, Vol.205, p.S355-S359</ispartof><rights>2010 Elsevier B.V.</rights><rights>2015 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c440t-130526c8a5071ed037d47642c02cceca2311d7f3d52f44dd978239a7e66a55b03</citedby><cites>FETCH-LOGICAL-c440t-130526c8a5071ed037d47642c02cceca2311d7f3d52f44dd978239a7e66a55b03</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.surfcoat.2010.08.031$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>309,310,314,777,781,786,787,3537,23911,23912,25121,27905,27906,45976</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=23952600$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Setsuhara, Yuichi</creatorcontrib><creatorcontrib>Cho, Ken</creatorcontrib><creatorcontrib>Takenaka, Kosuke</creatorcontrib><creatorcontrib>Shiratani, Masaharu</creatorcontrib><creatorcontrib>Sekine, Makoto</creatorcontrib><creatorcontrib>Hori, Masaru</creatorcontrib><title>Low-damage plasma processing of polymers for development of organic-inorganic flexible devices</title><title>Surface & coatings technology</title><description>Plasma generation and control technologies for processing of polymers have been developed with multiple low-inductance antenna (LIA) units, as a promising candidate for next-generation processing of hybrid flexible devices. Properties of argon–oxygen mixture plasmas sustained with multiple LIA units have been investigated in terms of ion energies bombarding onto polymer surface. Ion energy distribution at the sheath edge of the argon–oxygen mixture plasmas showed considerable suppression of ion energies as small as or less than 10
eV. Effects of the plasma exposure onto polymers have been examined using hard x-ray photoelectron spectroscopy (HXPES) in terms of chemical bonding states of the polymer surface and the interface between polymer and silicon film.</description><subject>Antennas</subject><subject>Argon</subject><subject>Bonding</subject><subject>Coatings</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Devices</subject><subject>Energy distribution</subject><subject>Exact sciences and technology</subject><subject>Hard x-ray photoelectron spectroscopy</subject><subject>Inductively-coupled plasma</subject><subject>Low inductance antenna</subject><subject>Low-damage process</subject><subject>Materials science</subject><subject>Organic-inorganic device</subject><subject>Physics</subject><subject>Polymers</subject><subject>Silicon films</subject><subject>Surface treatments</subject><subject>X-rays</subject><issn>0257-8972</issn><issn>1879-3347</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><recordid>eNqFUMtO7DAMjRBIDI9fQN0gVp3rJG3T7kCIlzTS3Vy2RCFxRhmlTUk6PP6eVDOwvRvbso-Pjw8hFxSWFGjzZ7NM22h1UNOSQW5CuwROD8iCtqIrOa_EIVkAq0XZdoIdk5OUNgBARVctyMsqfJRG9WqNxehV6lUxxqAxJTesi2CLMfivHmMqbIiFwXf0YexxmOZZiGs1OF26YV8V1uOne_U4I11mOSNHVvmE5_t8Sp7v7_7dPparvw9PtzerUlcVTCXlULNGt6oGQdEAF6YSTcU0MK1RK8YpNcJyUzNbVcZ0omW8UwKbRtX1K_BTcrXjzeLftpgm2buk0Xs1YNgm2Ta05nWOGdnskDqGlCJaOUbXq_glKcjZT7mRP37K2U8Jrcx-5sXL_QmVtPI2qkG79Lud9eQXYJZyvcNh_vfdYZRJOxw0GhdRT9IE979T36X_kCM</recordid><startdate>20101225</startdate><enddate>20101225</enddate><creator>Setsuhara, Yuichi</creator><creator>Cho, Ken</creator><creator>Takenaka, Kosuke</creator><creator>Shiratani, Masaharu</creator><creator>Sekine, Makoto</creator><creator>Hori, Masaru</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20101225</creationdate><title>Low-damage plasma processing of polymers for development of organic-inorganic flexible devices</title><author>Setsuhara, Yuichi ; Cho, Ken ; Takenaka, Kosuke ; Shiratani, Masaharu ; Sekine, Makoto ; Hori, Masaru</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c440t-130526c8a5071ed037d47642c02cceca2311d7f3d52f44dd978239a7e66a55b03</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2010</creationdate><topic>Antennas</topic><topic>Argon</topic><topic>Bonding</topic><topic>Coatings</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Devices</topic><topic>Energy distribution</topic><topic>Exact sciences and technology</topic><topic>Hard x-ray photoelectron spectroscopy</topic><topic>Inductively-coupled plasma</topic><topic>Low inductance antenna</topic><topic>Low-damage process</topic><topic>Materials science</topic><topic>Organic-inorganic device</topic><topic>Physics</topic><topic>Polymers</topic><topic>Silicon films</topic><topic>Surface treatments</topic><topic>X-rays</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Setsuhara, Yuichi</creatorcontrib><creatorcontrib>Cho, Ken</creatorcontrib><creatorcontrib>Takenaka, Kosuke</creatorcontrib><creatorcontrib>Shiratani, Masaharu</creatorcontrib><creatorcontrib>Sekine, Makoto</creatorcontrib><creatorcontrib>Hori, Masaru</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Surface & coatings technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Setsuhara, Yuichi</au><au>Cho, Ken</au><au>Takenaka, Kosuke</au><au>Shiratani, Masaharu</au><au>Sekine, Makoto</au><au>Hori, Masaru</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Low-damage plasma processing of polymers for development of organic-inorganic flexible devices</atitle><jtitle>Surface & coatings technology</jtitle><date>2010-12-25</date><risdate>2010</risdate><volume>205</volume><spage>S355</spage><epage>S359</epage><pages>S355-S359</pages><issn>0257-8972</issn><eissn>1879-3347</eissn><coden>SCTEEJ</coden><abstract>Plasma generation and control technologies for processing of polymers have been developed with multiple low-inductance antenna (LIA) units, as a promising candidate for next-generation processing of hybrid flexible devices. Properties of argon–oxygen mixture plasmas sustained with multiple LIA units have been investigated in terms of ion energies bombarding onto polymer surface. Ion energy distribution at the sheath edge of the argon–oxygen mixture plasmas showed considerable suppression of ion energies as small as or less than 10
eV. Effects of the plasma exposure onto polymers have been examined using hard x-ray photoelectron spectroscopy (HXPES) in terms of chemical bonding states of the polymer surface and the interface between polymer and silicon film.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.surfcoat.2010.08.031</doi></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0257-8972 |
| ispartof | Surface & coatings technology, 2010-12, Vol.205, p.S355-S359 |
| issn | 0257-8972 1879-3347 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_861535861 |
| source | Elsevier ScienceDirect Journals |
| subjects | Antennas Argon Bonding Coatings Cross-disciplinary physics: materials science rheology Devices Energy distribution Exact sciences and technology Hard x-ray photoelectron spectroscopy Inductively-coupled plasma Low inductance antenna Low-damage process Materials science Organic-inorganic device Physics Polymers Silicon films Surface treatments X-rays |
| title | Low-damage plasma processing of polymers for development of organic-inorganic flexible devices |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-19T19%3A27%3A48IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Low-damage%20plasma%20processing%20of%20polymers%20for%20development%20of%20organic-inorganic%20flexible%20devices&rft.jtitle=Surface%20&%20coatings%20technology&rft.au=Setsuhara,%20Yuichi&rft.date=2010-12-25&rft.volume=205&rft.spage=S355&rft.epage=S359&rft.pages=S355-S359&rft.issn=0257-8972&rft.eissn=1879-3347&rft.coden=SCTEEJ&rft_id=info:doi/10.1016/j.surfcoat.2010.08.031&rft_dat=%3Cproquest_cross%3E861535861%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=861535861&rft_id=info:pmid/&rft_els_id=S0257897210006808&rfr_iscdi=true |